SUBSTRATE PROCESSING APPARATUS
A platform section has an upper platform chamber and a lower platform chamber. Platform units are provided in the upper platform chamber and the lower platform chamber, respectively. A plurality of local arms corresponding to coating processing chambers are provided in the upper platform chamber and the lower platform chamber, respectively. Further, in the upper platform chamber and the lower platform chamber, a plurality of local arms respectively corresponding to a plurality of thermal processing units, a plurality of local arms respectively corresponding to a plurality of adhesion reinforcement processing units and a plurality of local arms respectively corresponding to a plurality of cooling units are provided.
1 . A substrate processing apparatus comprising:
a processing section; and
a carry-in/carry-out section for carrying in/out a substrate to/from the processing section, wherein
the processing section and the carry-in/carry-out section are arranged in one direction,
the processing section includes
a liquid processing section for performing liquid processing using a processing liquid on the substrate,
a thermal processing section for performing thermal processing on the substrate,
a platform section for temporarily placing the substrate,
a first transport mechanism configured to transport the substrate between the platform section and the liquid processing section and
a second transport mechanism configured to transport the substrate between the platform section and the thermal processing section, and
the liquid processing section is arranged on one side of the platform section and the thermal processing section is arranged on another side of the platform section in the one direction, and the liquid processing section, the platform section and the thermal processing section are arranged in the one direction, and
the carry-in/carry-out section includes
a container platform on which a storing container storing the substrate is placed, and
a third transport mechanism configured to transport the substrate between the storing container placed on the container platform and the platform section in the processing section.
2 . The substrate processing apparatus according to claim 1 , wherein
the platform section is configured such that the plurality of substrates can be placed one above the other in a vertical direction.
3 . The substrate processing apparatus according to claim 1 , wherein
the liquid processing section includes a plurality of liquid processing units arranged one above the other in a vertical direction.
4 . The substrate processing apparatus according to claim 3 , wherein
the first transport mechanism includes one or a plurality of first transport units, and
each first transport unit corresponds to at least one of the plurality of liquid processing units and is configured to transport the substrate between the corresponding liquid processing unit and the platform section.
5 . The substrate processing apparatus according to claim 4 , wherein
at least the one first transport unit is configured to be vertically movable.
6 . The substrate processing apparatus according to claim 1 , wherein
the thermal processing section includes a plurality of thermal processing units arranged one above the other in a vertical direction.
7 . The substrate processing apparatus according to claim 6 , wherein
the second transport mechanism includes one or a plurality of second transport units, and
each second transport unit corresponds to at least one of the plurality of thermal processing units and is configured to transport the substrate between the corresponding thermal processing unit and the platform section.
8 . The substrate processing apparatus according to claim 7 , wherein
at least the one second transport unit is configured to be vertically movable.
9 . The substrate processing apparatus according to claim 1 , further comprising:
a lifting/lowering mechanism configured to vertically move the substrate placed in the platform section.