Low haze transparent conductive electrodes and method of making the same
A transparent conductive electrode comprising metal nanowires and method of making is described, wherein the transparent conductive electrode has a pencil hardness more than 1H, nanoporous surface having pore sizes less than 25 nm and surface roughness less than 50 nm. The transparent conductive electrode further comprises an index matching layer, having a refractive index between 1.1-1.5 and a thickness between 100-200 nm.
1. A conductive film, comprising:
a substrate;
metal nanowires in a network, deposited above the substrate; and
an isotropic layer comprising organic or inorganic materials, situated above the substrate,
an index matching layer in direct contact with the metal nanowires, wherein
the metal nanowire network is embedded in the isotropic layer, and said conductive film has a nanoporous surface, characterized in that the nanoporous surface has pore sizes less than 25 nm,
the index matching layer comprises anisotropic material of metal oxide or non-metallic oxide having an average surface roughness less than 50 nm and a thickness of between 100-200 nm.
2. The conductive film of claim 1 , has a pencil hardness more than 1H.
3. The conductive film of claim 1 , has a pencil hardness more than 3H.
4. The conductive film of claim 1 , having a haze less than 2%.
5. The conductive film of claim 1 , having a haze less than 1%.
6. The conductive film of claim 5 , wherein the nanowire network comprises
a nanowire at a first length and a first diameter, and
a second nanowire at a second length and a second diameter, wherein
the first length of the first nanowire is about 50-100 micrometers and the second diameter of the second nanowire is less than 50 nm.
7. The conductive film of claim 1 , having a light transmittance more than 80% in the wavelength between 200-1000 nm.
8. The conductive film of claim 7 , having a light transmittance more than 90% in the wavelength between 400-800 nm.
9. The conductive film of claim 1 , having a sheet resistance less than 100 ohms/square.
10. The conductive film of claim 6 , wherein the second diameter is less than 30 nm.
11. The conductive film of claim 6 , where the second length is about 50-100 micrometers.
12. The conductive film of claim 1 , wherein the index-matching layer comprises conductive materials, semi-conductive materials or nonconductive materials.
13. The conductive film of claim 1 , wherein the substrate is selected from polyethylene terephthalate (PET), polyethylene naphathalate (PEN), polycarbonate, and cyclo olefin polymer (COP) or copolymer, (COC).
14. The conductive film of claim 1 , wherein the index matching layer further comprises conductive or semiconducting metal oxides selected from fluorine doped tin oxide (FTO), indium tin oxide (ITO), aluminum doped zinc oxide (AZO), gallium doped zinc oxide (GZO), and boron doped zinc oxide (BZO).
15. The conductive film of claim 1 , wherein the substrate is a glass.
16. A touch screen device comprising:
a conductive electrode, comprising:
a substrate;
metal nanowires in a network, deposited above the substrate; and
an isotropic layer comprising organic or inorganic materials, situated above the substrate,
an index matching layer in direct contact with the metal nanowires, wherein
the metal nanowire network is embedded in the isotropic layer, and said conductive film has a nanoporous surface, characterized in that the nanoporous surface has pore sizes less than 25 nm and average roughness of 10-50 nm,
the index matching layer comprises anisotropic material of metal oxide or non-metallic oxide having an average surface roughness less than 50 nm and a thickness of between 100-200 nm.
17. The touch screen device of claim 16 , wherein the electrode has a pencil toughness of more than 1H.