IP Library Granted Patent US 8,987,536
Granted Patent B2
US 8,987,536 · App. 13/911,444 · Granted Mar 24, 2015

Process for the reduction of RfCCX impurities in fluoroolefins

Inventors: Xuehui Sun (Swedesboro, NJ); Mario Joseph Nappa (Newark, DE)
Assignee: E I du Pont de Nemours and Company
C07C17/25C07C17/38C07C17/206C07B63/00
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Quick Facts
Patent No.
US 8,987,536
App. No.
13/911,444
Granted
Mar 24, 2015
Kind
B2
Abstract

The present disclosure relates to processes for reducing the concentration of R f C≡CX impurities in fluoroolefins. The process involves: contacting a mixture comprising at least one fluoroolefin and at least one R f C≡CX impurity with at least one amine to reduce the concentration of the at least one R f C≡CX impurity in the mixture; wherein R f is a perfluorinated alkyl group, and X is H, F, Cl, Br or I. The present disclosure also relates to processes for making at least one hydrotetrafluoropropene product selected from the group consisting of CF 3 CF═CH 2 , CF 3 CH═CHF, and mixtures thereof and reducing the concentration of CF 3 C═CH impurity generated during the process. The present disclosure also relates to processes for making at least one hydrochlorotrifluoropropene product selected from the group consisting of CF 3 CCl═CH 2 , CF 3 CH═CHCl, and mixtures thereof and reducing the concentration of CF 3 C≡CH impurity generated during the process.

Claims (37)

1. A process comprising: contacting a mixture comprising at least one fluoroolefin and at least one R f C≡CX impurity with at least one amine to reduce the concentration of said at least one R f C≡CX impurity in said mixture; wherein R f is a perfluorinated alkyl group, and X is H, F, Cl, Br or I.

2. The process of claim 1 wherein the amount of said at least one fluoroolefin in said mixture is at least 90 wt % based on the total weight of said mixture.

3. The process of claim 1 wherein said at least one fluoroolefin is selected from the group consisting of CF 3 CF═CH 2 , CF 3 CH═CHF, CF 3 CH═CH 2 , CF 3 CCl═CH 2 , CF 3 CH═CHCl, CF 3 CH═CFCl, CF 3 CH═CF 2 , CF 3 CCl═CHF, CF 3 CF═CHF, CF 3 CF═CHCl, CF 3 CH═CCl 2 , CF 3 CCl═CHCl, and mixtures thereof, and wherein said at least one R f C≡CX impurity is selected from the group consisting of CF 3 C≡CH, CF 3 C≡CCl, CF 3 C≡CF, and mixtures thereof.

4. The process of claim 1 wherein said at least one fluoroolefin is selected from the group consisting of CF 3 CF═CH 2 , CF 3 CH═CHF, CF 3 CH═CH 2 , CF 3 CCl═CH 2 , CF 3 CH═CHCl, CF 3 CF═CHCl, and mixtures thereof, and wherein said at least one R f C≡CX impurity is selected from the group consisting of CF 3 C≡CH, CF 3 C≡CCl, CF 3 C≡CF, and mixtures thereof.

5. The process of claim 1 wherein said at least one fluoroolefin is selected from the group consisting of CF 3 CF═CH 2 , CF 3 CH═CHF, CF 3 CCl═CH 2 , CF 3 CH═CHCl, and mixtures thereof, and wherein said at least one R f C≡CX impurity is selected from the group consisting of CF 3 C≡CH, CF 3 C≡CCl, and mixtures thereof.

6. The process of claim 1 wherein said at least one fluoroolefin is CF 3 CF═CH 2 , and wherein said at least one R f C≡CX impurity is selected from the group consisting of CF 3 C≡CH, CF 3 C≡CCl, and mixtures thereof.

7. The process of claim 1 wherein said at least one fluoroolefin is CF 3 CF═CH 2 , and wherein said at least one R f C≡CX impurity is CF 3 C≡CH.

8. The process of claim 1 wherein said at least one fluoroolefin is CF 3 CH═CHF, and wherein said at least one R f C≡CX impurity is CF 3 C≡CH.

9. The process of claim 1 wherein said at least one fluoroolefin is a mixture of CF 3 CF═CH 2 and CF 3 CH═CHF, and wherein said at least one R f C≡CX impurity is CF 3 C≡CH.

10. The process of claim 1 wherein said at least one fluoroolefin is CF 3 CH═CHCl, and wherein said at least one R f C≡CX impurity is CF 3 C≡CH.

11. The process of claim 1 wherein said at least one amine is selected from the group consisting of amine of the formula R 3 N, heterocyclic amines, hydrazine and its derivatives, and mixtures thereof, wherein each R is independently a hydrogen, an alkyl group, a heteroalkyl group, an aryl group, or an aralkyl group.

12. The process of claim 1 wherein said at least one amine is selected from the group consisting of amine of the formula R 3 N, heterocyclic amines, and mixtures thereof, wherein each R is independently a hydrogen, an alkyl group, a heteroalkyl group, or an aralkyl group.

13. The process of claim 12 wherein said at least one amine is a polyamine.

14. The process of claim 12 wherein said at least one amine is a heterocyclic amine.

15. The process of claim 1 wherein said at least one amine is in a solution with a suitable solvent during said contacting step.

16. The process of claim 1 wherein the temperature during said contacting step is from about 0° C. to about 60° C.

17. The process of claim 1 wherein the concentration of said at least one R f C≡CX impurity in said mixture is reduced to 200 ppm or less.

18. The process of claim 1 wherein the concentration of said at least one R f C≡CX impurity in said mixture is reduced to 50 ppm or less.

19. The process of claim 1 wherein the concentration of said at least one R f C≡CX impurity in said mixture is reduced to 2 ppm or less.

20. The process of claim 1 further comprising recovering said at least one fluoroolefin having reduced concentration of said at least one R f C≡CX impurity.

21. A process for making at least one hydrotetrafluoropropene product selected from the group consisting of CF 3 CF═CH 2 , CF 3 CH═CHF, and mixtures thereof, comprising:

(a) dehydrohalogenating at least one starting material selected from the group consisting of CF 3 CFClCH 3 , CF 3 CHFCH 2 Cl, CF 3 CHClCH 2 F, CF 3 CH 2 CHFCl, CF 3 CHFCH 2 F, CF 3 CH 2 CF 2 H, CF 3 CF 2 CH 3 , and mixtures thereof to produce a product mixture comprising CF 3 C≡CH impurity and said at least one hydrotetrafluoropropene product;

(b) contacting said product mixture with at least one amine to reduce the concentration of said CF 3 C≡CH impurity in said product mixture; and

(c) recovering said at least one hydrotetrafluoropropene product having reduced concentration of said CF 3 C≡CH impurity.

22. The process of claim 21 wherein said at least one hydrotetrafluoropropene product is CF 3 CF═CH 2 , and said at least one starting material is selected from the group consisting of CF 3 CFClCH 3 , CF 3 CHFCH 2 Cl, CF 3 CHFCH 2 F, CF 3 CF 2 CH 3 , and mixtures thereof.

23. The process of claim 22 wherein said at least one starting material is CF 3 CFClCH 3 .

24. The process of claim 22 wherein said at least one starting material is CF 3 CHFCH 2 F.

25. The process of claim 21 wherein said at least one hydrotetrafluoropropene product is CF 3 CH═CHF, and said at least one starting material is selected from the group consisting of CF 3 CH 2 CHF 2 , CF 3 CH 2 CHFCl, CF 3 CHClCH 2 F, and mixtures thereof.

26. The process of claim 21 , wherein the concentration of said CF 3 C≡CH impurity in said product mixture is reduced to 200 ppm or less in the contacting step (b).

27. A process for making at least one hydrochlorotrifluoropropene product selected from the group consisting of CF 3 CCl═CH 2 , CF 3 CH═CHCl, and mixtures thereof, comprising:

(a) dehydrohalogenating at least one starting material selected from the group consisting of CF 3 CCl 2 CH 3 , CF 3 CHClCH 2 Cl, CF 3 CHClCH 2 F, CF 3 CH 2 CHCl 2 , CF 3 CHFCH 2 Cl, CF 3 CFClCH 3 , CF 3 CH 2 CHFCl, and mixtures thereof to produce a product mixture comprising CF 3 C≡CH impurity and said at least one hydrochlorotrifluoropropene product;

(b) contacting said product mixture with at least one amine to reduce the concentration of said CF 3 C≡CH impurity in said product mixture; and

(c) recovering said at least one hydrochlorotrifluoropropene product having reduced concentration of said CF 3 C≡CH impurity.

28. The process of claim 27 wherein at least one hydrochlorotrifluoropropene product is CF 3 CH═CHCl, and said at least one starting material is selected from the group consisting of CF 3 CHClCH 2 Cl, CF 3 CH 2 CHCl 2 , and mixtures thereof.

29. The process of claim 27 wherein at least one hydrochlorotrifluoropropene product is CF 3 CHCl═CH 2 , and said at least one starting material is selected from the group consisting of CF 3 CHClCH 2 Cl, CF 3 CCl 2 CH 3 , and mixtures thereof.

30. The process of claim 27 , wherein the concentration of said CF 3 C≡CH impurity in said product mixture is reduced to 200 ppm or less in the contacting step (b).

31. The process of claim 21 , wherein said at least one amine is selected from the group consisting of amine of the formula R 3 N, heterocyclic amines, and mixtures thereof, wherein each R is independently a hydrogen, an alkyl group, a heteroalkyl group, or an aralkyl group.

Assignments (5)
SECURITY INTEREST Recorded Apr 4, 2018
From: THE CHEMOURS COMPANY FC, LLC
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 045846/0011 →
RELEASE OF SECURITY INTEREST Recorded Apr 4, 2018
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: THE CHEMOURS COMPANY FC, LLC
Reel/Frame 045845/0913 →
SECURITY AGREEMENT Recorded Jun 10, 2015
From: THE CHEMOURS COMPANY FC LLC; THE CHEMOURS COMPANY TT, LLC
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 035839/0675 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 15, 2015
From: E. I. DU PONT DE NEMOURS AND COMPANY
To: THE CHEMOURS COMPANY FC, LLC
Reel/Frame 035432/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 16, 2013
From: SUN, XUEHUI; NAPPA, MARIO JOSEPH
To: E I DU PONT DE NEMOURS AND COMPANY
Reel/Frame 031418/0334 →
Continuity (2)
Provisional Application 61656125 · Jun 6, 2012
Related Publication 20140018582A1 · Jan 16, 2014