Deposition source
View Patent ↗A deposition source with uniform deposition characteristics includes a crucible in which a deposition material is disposed; a heat transfer member disposed on upper portions of the deposition material in the crucible; and an accommodation member for accommodating the heat transfer member and including a mesh plate.
1. A method of performing deposition by using a crucible, the crucible having an opening, the method comprising:
placing a housing in the crucible between the opening of the crucible and an upper surface of a deposition material in the crucible, the housing being movable with respect to the crucible during the deposition, having a plurality of openings, and an outer perimeter of the housing having a size that corresponds to an inner circumferential surface of the crucible, the housing accommodating a heat transfer member, the heat transfer member comprising particles having a diameter greater than a size of each of the plurality of openings in the housing, the particles being non-reactive with the deposition material; and
heating the crucible and the particles such that the particles heat the upper surface of the deposition material to transform the deposition material into a gas which passes through the particles and the plurality of openings to a substrate.
2. The method of claim 1 , wherein the housing comprises a bottom portion, a top portion, and a side portion extending between the top portion and the bottom portion, and
wherein the method further comprises:
placing the particles in the housing; and
closing the housing by welding the top portion to the side portion.
3. The method of claim 1 , wherein the heating comprises electron beam heating or resistive heating.
4. The method of claim 1 , wherein the particles comprise a silicon powder.
5. The method of claim 1 , wherein the crucible is inside of a vacuum chamber.
6. The method of claim 1 , wherein the outer perimeter of the housing continuously contacts the inner circumferential surface of the crucible.