Optoelectronic device and method for manufacturing the same

1. An optoelectronic device, comprising:

a substrate having a first surface and a normal direction perpendicular to the first surface;

a first semiconductor formed on the first surface of the substrate, comprising a plurality of hollow components formed in the first semiconductor layer;

a first protection layer formed on a sidewall and a bottom wall of the plurality of the hollow components, and the bottom wall comprises a portion of the first surface; and

a buffer layer formed on the first semiconductor layer wherein the buffer layer comprises a first surface and a second surface opposite to the first surface.

2. The optoelectronic device of claim 1 , wherein two of the hollow components link into a mesh.

3. The optoelectronic device of claim 2 , wherein the plurality of the hollow components is formed as a regular array and an average distance between any two of the hollow components is 10 nm-1.5 μm and the porosity of the hollow components is 5-90%.

4. The optoelectronic device of claim 1 , further comprising a second semiconductor layer, an active layer, and a third semiconductor layer formed on the second surface of the buffer layer.

5. The optoelectronic device of claim 4 , wherein the material of the first semiconductor layer, the second semiconductor layer, the active layer, or the third semiconductor layer contains at least one element selected from the group consisting of Al, Ga, In, As, P, and N.

6. The optoelectronic device of claim 1 , wherein the buffer layer comprises an unintentional doped layer, an undoped layer, or an n-type doped layer.

7. The optoelectronic device of claim 1 , wherein the material of the first protection layer comprises SiO2, HSQ (Hydrogen silesquioxane), MSQ (Methylsequioxane), and Polymer of silsequioxane.

8. A method of fabricating an optoelectronic device, comprising:

providing a substrate having a first surface and a normal direction perpendicular to the first surface;

forming a first semiconductor layer on the first surface of the substrate;

forming a plurality of hollow components by patterning the first semiconductor layer;

providing a first protection layer to cover a sidewall of the plurality of the hollow components; and

forming a buffer layer on the first semiconductor layer wherein the buffer layer comprise a first surface and a second surface opposite to the first surface;

wherein the method of patterning the first semiconductor layer comprises:

forming an anti-etching layer on the first semiconductor laver;

forming a thin-film metal layer on the anti-etching layer;

forming a plurality of nanoscale metal particles by treating the thin-film metal layer with thermal treatment;

using the plurality of nanoscale metal particles as a mask to pattern the anti-etching layer by anisotropic etching method;

removing the plurality of nanoscale metal particles; and

using the patterned anti-etching layer as a mask to anisotropically etch the first semiconductor layer.

9. The method of fabricating an optoelectronic device of claim 8 , wherein two of the hollow components can link into a mesh or porous structure.

10. The method of fabricating an optoelectronic device of claim 8 , wherein the plurality of the hollow components is formed as a regular array and an average distance between any two of the hollow components is 10 nm-1.5 μm and the porosity of the hollow components is 5-90%.

11. The method of fabricating an optoelectronic device of claim 8 , further comprising a second semiconductor layer, an active layer, and a third semiconductor layer formed on the second surface of the buffer layer.

12. The method of fabricating an optoelectronic device of claim 11 , wherein the material of the first semiconductor layer, second semiconductor layer, the active layer, or the third semiconductor layer contains at least one element selected from the group consisting of Al, Ga, In, As, P, and N.

13. The method of fabricating an optoelectronic device of claim 8 , wherein the buffer layer comprises an unintentional doped layer, an undoped layer, or an n-type doped layer.

14. The method of fabricating an optoelectronic device of claim 8 , wherein the first protection layer is formed by the method of spin on glass coating.

15. The method of fabricating an optoelectronic device of claim 8 , wherein the material of the first protection layer comprises SiO2, HSQ (Hydrogen silesquioxane), MSQ (Methylsequioxane), and Polymer of silsequioxane.

16. The optoelectronic device of claim 1 , wherein the plurality of hollow components is sandwiched between the first surface of the substrate and the first surface of the buffer layer.

17. The method of fabricating an optoelectronic device of claim 8 , wherein the plurality of hollow components is sandwiched between the first surface of the substrate and the first surface of the buffer layer.

18. The optoelectronic device of claim 1 , wherein two of the hollow components link into a porous structure.