Fine droplet atomization for liquid precursor vaporization
View Patent ↗A method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
1. A method for atomizing a precursor liquid in a gas to form a droplet aerosol, the method comprising:
drawing a gas from a compressed gas source;
drawing a liquid from a liquid source;
the liquid and gas conjoined in a radial flow atomizing head wherein direction of the gas flow in the radial flow atomizing head is radial and perpendicular to the direction of liquid flow in the radial flow atomizing head; and
wherein the gas impinges on the liquid flow to form droplets for vaporization and thin film deposition on the substrate.
2. The method of claim 1 wherein the gas flow is at least approximately 0.1 of the speed of sound.
3. The method of claim 1 wherein the gas engages the liquid in a substantially perpendicular orientation.
4. A method for atomizing a precursor liquid in a gas to form a droplet aerosol, the method comprising:
drawing a gas from a compressed gas source;
drawing a liquid from a liquid source;
the liquid and gas conjoined in an angular flow atomizing head wherein the gas impinges on the liquid in an angular flow in the angular flow atomizing head, such that the direction of the gas flow in the atomizing head is in an angular relation to direction of the liquid flow, the angular relation between approximately 0° and 180° with respect to horizontal.
5. The method of claim 4 wherein the gas flow is at least approximately 0.1 of the speed of sound.