IP Library Granted Patent US 9,246,022
Granted Patent B2
US 9,246,022 · App. 13/963,221 · Granted Jan 26, 2016

Varactors including interconnect layers

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Quick Facts
Patent No.
US 9,246,022
App. No.
13/963,221
Granted
Jan 26, 2016
Kind
B2
Abstract

In an embodiment of the present invention is provided a varactor comprising a substrate, a plurality of bottom electrodes positioned on a surface of the substrate separated to form a gap therein, a tunable dielectric material positioned on the surface of the substrate and within the gap, the tunable dielectric at least partially overlaying the plurality of electrodes, and a top electrode in contact with the tunable dielectric.

Claims (20)

1. A device, comprising:

a bottom electrode;

a tunable dielectric in contact with the bottom electrode and in contact with first and second top electrodes;

an encapsulation layer positioned in a gap between the first and second top electrodes;

a first interconnect in contact with the first top electrode; and

a second interconnect in contact with the second top electrode, wherein the first and second interconnects are connectable with a voltage source so that the device provides first and second capacitors in series, and wherein the encapsulation layer is formed over top surfaces of each of the first and second interconnects.

2. The device of claim 1 , wherein the first top electrode, the second top electrode or the bottom electrode comprises one of: gold, aluminum, copper, nickel, palladium, platinum, platinum-rhodium, ruthenium oxide, or indium tin oxide.

3. The device of claim 1 , wherein the tunable dielectric includes material selected from the group comprising barium strontium titanate, barium calcium titanate, lead zirconium titanate, lead lanthanum zirconium titanate, lead titanate, barium calcium zirconium titanate, sodium nitrate, KNbO 3 , LiNbO 3 , LiTaO 3 , PbNb 2 O 6 , PbTa 2 O 6 , KSr(NbO 3 ), NaBa 2 (NbO 3 ) 5 , KH 2 PO 4 , or composites thereof.

4. The device of claim 1 , wherein the tunable dielectric includes a barium strontium titanate (BSTO) composite selected from the group comprising BSTO—MgO, BSTO—MgAl 2 O 4 , BSTO—CaTiO 3 , BSTO—MgTiO 3 , BSTO—MgSrZrTiO 6 , or combinations thereof.

5. The device of claim 1 , further comprising a substrate that supports the bottom electrode, wherein the substrate includes a material selected from the group comprising MgO, Alumina (Al 2 O 3 ), LaAlO 3 , glass, sapphire, quartz, silicon, gallium arsenide or a low temperature co-fired ceramic (LTCC).

6. The device of claim 1 , wherein the device is symmetrical.

7. A device, comprising:

a bottom electrode;

a tunable dielectric in contact with the bottom electrode and in contact with first and second top electrodes;

an encapsulation layer positioned in a gap between the first and second top electrodes;

a first interconnect in contact with the first top electrode;

a second interconnect in contact with the second top electrode, wherein the first and second interconnects are connectable with a voltage source so that the device provides first and second capacitors in series, and wherein the encapsulation layer is formed over top surfaces of each of the first and second interconnects; and

an adhesion layer positioned between the bottom electrode and the tunable dielectric, or positioned between the tunable dielectric and the first and second top electrodes.

8. The device of claim 7 , wherein the tunable dielectric includes material selected from the group comprising barium strontium titanate, barium calcium titanate, lead zirconium titanate, lead lanthanum zirconium titanate, lead titanate, barium calcium zirconium titanate, sodium nitrate, KNbO 3 , LiNbO 3 , LiTaO 3 , PbNb 2 O 6 , PbTa 2 O 6 , KSr(NbO 3 ), NaBa 2 (NbO 3 ) 5 , KH 2 PO 4 , or composites thereof.

9. The device of claim 7 , wherein the tunable dielectric includes a barium strontium titanate (BSTO) composite selected from the group comprising BSTO—MgO, BSTO—MgAl 2 O 4 , BSTO—CaTiO 3 , BSTO—MgTiO 3 , BSTO—MgSrZrTiO 6 , or combinations thereof.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 5, 2020
From: BLACKBERRY LIMITED
To: NXP USA, INC.
Reel/Frame 052095/0443 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 16, 2015
From: RESEARCH IN MOTION RF, INC.
To: RESEARCH IN MOTION CORPORATION
Reel/Frame 034775/0693 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 16, 2015
From: RESEARCH IN MOTION CORPORATION
To: BLACKBERRY LIMITED
Reel/Frame 034775/0744 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 11, 2013
From: ZHANG, XUBAI; SENGUPTA, LOUISE C.; SUN, JASON; DUTOIT, NICOLAAS
To: PARATEK MICROWAVE, INC.
Reel/Frame 031184/0981 →
CHANGE OF NAME Recorded Sep 11, 2013
From: PARATEK MICROWAVE, INC.
To: RESEARCH IN MOTION RF, INC.
Reel/Frame 031206/0906 →