Laser produced plasma EUV light source
View Patent ↗Methods and apparatus for producing EUV from plasma are disclosed. The apparatus includes a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region. The plasma produces EUV radiation, wherein the droplet source comprises a nozzle having an orifice configured for ejecting a fluid and a sub-system having an electro-actuable element producing a disturbance in the fluid to cause at least some of the droplets to coalesce prior to being irradiated. The electro-actuable element is coupled to nozzle using an adhesive that has a high modulus at the nozzle operating temperature. Improvements also include tuning the nozzle assembly to more closely match the modulation waveform frequency with one of the resonance frequencies of the nozzle assembly by optimizing one of a mass, a shape, or material composition of at least one component in the nozzle assembly.
1. A method for tuning the frequency response of a nozzle assembly of a plasma generating system, the nozzle assembly configured for ejecting target material droplets, the plasma generating system comprising said nozzle assembly and a laser producing a beam irradiating the droplets at an irradiation region, a plasma producing EUV radiation, wherein the nozzle assembly comprises a nozzle having an orifice configured for ejecting a fluid and a sub-system having an electro-actuable element producing a modulation waveform having a modulation frequency to cause disturbance in the fluid to cause at least some of the droplets to coalesce prior to being irradiated, comprising:
ascertaining the frequency response of the nozzle assembly, including at least one resonance frequency;
modifying said nozzle assembly to cause said at least one resonance frequency to more closely match with said modulation frequency, wherein the modifying including optimizing one of a mass, a shape, or material composition of at least one component in said nozzle assembly.
2. The method of claim 1 wherein said frequency response comprises a plurality of resonance frequencies, said at least one resonance frequency represents a resonance frequency having the lowest frequency among said plurality of resonance frequencies.
3. The method of claim 1 wherein said modifying represents optimizing said mass.
4. The method of claim 1 wherein said modifying represents optimizing said shape.
5. The method of claim 1 wherein said modifying represents optimizing said material composition.
6. The method of claim 1 wherein said at least one component represents said nozzle.
7. The method of claim 1 wherein said at least one component represents said electro-actuable element.
8. The method of claim 1 wherein said electro-actuable element represents a piezoelectric modulator.
9. The plasma generating system of claim 1 wherein the disturbance comprises a frequency-modulated waveform.
10. The plasma generating system of claim 1 wherein the disturbance comprises an amplitude-modulated waveform.
11. The plasma generating system of claim 1 wherein the disturbance comprises a series of pulsed disturbances, with each pulsed disturbance of the series of pulsed disturbances having at least one of a sufficiently short rise-time and sufficiently short fall-time to generate a fundamental frequency and at least one harmonic of the fundamental frequency.