IP Library Granted Patent US 9,318,659
Granted Patent B2
US 9,318,659 · App. 13/974,211 · Granted Apr 19, 2016

Nitride semiconductor light emitting element having light emitting layer including INxGa1-xN well layer and LED system

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Quick Facts
Patent No.
US 9,318,659
App. No.
13/974,211
Granted
Apr 19, 2016
Kind
B2
Abstract

A nitride semiconductor light emitting element includes a light emitting layer. The light emitting layer includes an In x Ga 1-x N well layer (0<x≦1) having a principal surface that is an m-plane. A profile in a depth direction (depth profile) of an In composition ratio x in the In x Ga 1-x N well layer has a plurality of peaks. Values of the In composition ratios x at the respective plurality of peaks are different from one another.

Claims (110)

1. A nitride semiconductor light emitting element comprising a light emitting layer, wherein:

the light emitting layer includes an In x Ga 1-x N well layer, where 0<x≦1, having a principal surface that is an m-plane;

a depth profile of an In composition ratio x in the In x Ga 1-x N well layer has a plurality of peaks;

values of the In composition ratios x at the respective plurality of peaks are different from one another;

a temperature coefficient of a wavelength of light generated in the light emitting layer is zero at any one of temperatures from 243 K to 353 K; and

a difference between a shorter one of the wavelength at 243 K and the wavelength at 353 K, and the wavelength at a temperature at which the temperature coefficient is zero is 2 nm or less.

2. An LED system comprising a plurality of the nitride semiconductor light emitting elements of claim 1 , wherein:

the plurality of the nitride semiconductor light emitting elements are connected in parallel; and

a thickness W of the In x Ga 1-x N well layer is the same throughout the plurality of the nitride semiconductor light emitting elements, W is 7 nm or more, and LED system is operated under a state in which the following relational expression is satisfied, [Math. 29 ]

10.42

×

W

[

nm

]

-

81.3

I_total

S_well

_total

[

A

/

cm

2

]

10.42

×

W

[

nm

]

-

61.3

where W is the thickness of the In x Ga 1-x N well layer, I_total is an operating current value of the entire plurality of the nitride semiconductor light emitting elements that are connected in parallel, S_well_total is a total of areas of the In x Ga 1-x N well layers in the top view of the respective plurality of the nitride semiconductor light emitting elements.

3. An LED system comprising N nitride semiconductor light emitting elements of claim 1 , where N is an integer of 2 or more, wherein:

the N nitride semiconductor light emitting elements are connected in parallel; and

a thickness W and an area S_well are the same throughout the N nitride semiconductor light emitting elements, W is 7 nm or more, and the LED system is operated under a state in which the following relational expression is satisfied, [Math. 30 ]

10.42

×

W

[

nm

]

-

81.3

I_total

N

×

S_well

[

A

/

cm

2

]

10.42

×

W

[

nm

]

-

61.3

where W is the thickness of the In x Ga 1-x N well layer, S_well is the area of the In x Ga 1-x N well layer in the top view of the N nitride semiconductor light emitting elements, and I_total is an operating current value of the entire N nitride semiconductor light emitting elements that are connected in parallel.

4. An LED system comprising:

one or a plurality of the nitride semiconductor light emitting elements of claim 1 ; and

a current supply portion for supplying current to the one or a plurality of the nitride semiconductor light emitting elements so that a temperature coefficient of a wavelength of light generated in the light emitting layer is zero at any one of temperatures from 243 K to 353 K, and so that a difference between a shorter one of the wavelength at 243 K and the wavelength at 353 K, and the wavelength at a temperature at which the temperature coefficient is zero is 2 nm or less.

5. A nitride semiconductor light emitting element comprising a light emitting layer, wherein:

the light emitting layer includes an In x Ga 1-x N well layer 0<x≦1, having a principal surface that is an m-plane;

a depth profile of an In composition ratio x in the In x Ga 1-x N well layer has a plurality of peaks;

values of the In composition ratios x at the respective plurality of peaks are different from one another;

a temperature coefficient of a wavelength of light generated in the light emitting layer is zero at any one of temperatures from 233 K to 393 K; and

a difference between a shorter one of the wavelength at 233 K and the wavelength at 393 K, and the wavelength at a temperature at which the temperature coefficient is zero is 5 nm or less.

6. An LED system comprising:

one or a plurality of the nitride semiconductor light emitting elements of claim 5 ; and

a current supply portion for supplying current to the one or a plurality of the nitride semiconductor light emitting elements so that a temperature coefficient of a wavelength of light generated in the light emitting layer is zero at any one of temperatures from 233 K to 393 K, and so that a difference between a shorter one of the wavelength at 233 K and the wavelength at 393 K, and the wavelength at a temperature at which the temperature coefficient is zero is 5 nm or less.

7. A nitride semiconductor light emitting element comprising a light emitting layer, wherein:

the light layer includes an In x Ga 1-x N well layer, where 0<x≦1, having a principal surface that is an m-plane;

a depth profile of an In composition ratio x in the In x Ga 1-x N well layer has a plurality of peaks;

values of the In composition ratios x at the respective plurality of peaks are different from one another;

the nitride semiconductor light emitting element further comprises a p-type layer and an n-type layer that are provided on the principal surface side and a rear surface side, respectively, of the light emitting layer;

the plurality of peaks include three or more peaks, and the values of the In composition ratios x at the three or more peaks become smaller or larger in a direction from the p-type layer toward the n-type layer.

8. A nitride semiconductor light emitting element comprising a light emitting layer, wherein:

the light emitting layer includes an In x Ga 1-x N well layer, where 0<x≦1, having a principal surface that is an m-plane;

a depth profile of an In composition ratio x in the In x Ga 1-x N well layer has a plurality of peaks;

values of the In composition ratios x at the respective plurality of peaks are different from one another;

the nitride semiconductor light emitting element further comprises a p-type layer and an n-type layer that are provided on the principal surface side and a rear surface side, respectively, of the light emitting layer;

the plurality of peaks include four or more peaks, and the values of the In composition ratios x at the four or more peaks are arranged so as to be V-shaped or inverted V-shaped in a direction from the p-type layer toward the n-type layer.

9. A nitride semiconductor light emitting element comprising a light emitting layer, wherein:

the light layer includes an In x Ga 1-x N well layer, where 0<x≦1, having a principal surface that is an m-plane;

a depth profile of an In composition ratio x in the In x Ga 1-x N well layer has a plurality of peaks;

values of the In composition ratios x at the respective plurality of peaks are different from one another; and

an absolute value of a temperature coefficient of a wavelength of light generated in the light emitting layer is 0.03 or less.

10. A nitride semiconductor light emitting element comprising a light emitting layer, wherein:

the light emitting layer includes an In x Ga 1-x N well layer 0<x≦1, having a principal surface that is an m-plane;

a depth profile of an In composition ratio x in the In x Ga 1-x N well layer has a plurality of peaks;

values of the In composition ratios x at the respective plurality of peaks are different from one another; and

a temperature coefficient of a wavelength of light generated in the light emitting layer is a negative value.

Assignments (3)
CORRECTIVE ASSIGNMENT TO CORRECT THE ERRONEOUSLY FILED APPLICATION NUMBERS 13/384239, 13/498734, 14/116681 AND 14/301144 PREVIOUSLY RECORDED ON REEL 034194 FRAME 0143. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Dec 24, 2020
From: PANASONIC CORPORATION
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 056788/0362 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 10, 2014
From: PANASONIC CORPORATION
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 034194/0143 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 30, 2014
From: INOUE, AKIRA; YOSHIDA, SHUNJI; YOKOGAWA, TOSHIYA
To: PANASONIC CORPORATION
Reel/Frame 032099/0772 →