Semiconductor device having improved heat dissipation
View Patent ↗A semiconductor device having improved heat dissipation is disclosed. The semiconductor device includes a semi-insulating substrate and epitaxial layers disposed on the semi-insulating substrate wherein the epitaxial layers include a plurality of heat conductive vias that are disposed through the epitaxial layers with the plurality of heat conductive vias being spaced along a plurality of finger axes that are aligned generally parallel across a surface of the epitaxial layers. The semiconductor device further includes an electrode having a plurality of electrically conductive fingers that are disposed along the plurality of finger axes such that the electrically conductive fingers are in contact with the first plurality of heat conductive vias.
1. A semiconductor device having improved heat dissipation comprising:
a semi-insulating substrate;
epitaxial layers disposed on the semi-insulating substrate wherein the epitaxial layers comprise a plurality of heat conductive vias that are disposed through the epitaxial layers with the plurality of heat conductive vias being arranged in rows that are aligned parallel to a plurality of finger axes that are aligned generally parallel across a surface of the epitaxial layers; and
an electrode having a plurality of electrically conductive fingers that are disposed along the plurality of finger axes such that individual ones of the plurality of electrically conductive fingers extend directly over corresponding rows of the plurality of heat conductive vias and are in contact with the plurality of heat conductive vias.
2. The semiconductor device of claim 1 wherein the plurality of heat conductive vias extend into the semi-insulating substrate.
3. The semiconductor device of claim 1 wherein the epitaxial layers further comprise a second plurality of heat conductive vias that are disposed through the epitaxial layers with the second plurality of heat conductive vias being arranged in rows that are aligned parallel to a second plurality of finger axes that are interdigitated with the plurality of finger axes, and a second electrode having a plurality of electrically conductive fingers that are disposed along the second plurality of finger axes such that individual rows of the second plurality of electrically conductive fingers extend directly over corresponding rows of the second plurality of heat conductive vias and are in contact with the second plurality of heat conductive vias.
4. The semiconductor device of claim 1 wherein the plurality of heat conductive vias are filled with an electrically conductive material.
5. The semiconductor device of claim 4 further including a through-hole via that electrically and thermally couples the plurality of heat conductive vias to a back metal.
6. The semiconductor device of claim 1 wherein the semi-insulating substrate is made of silicon carbide (SiC) polytypes.
7. The semiconductor device of claim 6 where the SiC polytypes have a bulk thermal conductivity that ranges from around about 3.6 W/cm·K to around about 4.9 W/cm·K.
8. The semiconductor device of claim 1 wherein a bulk electrical resistivity of the semi-insulating substrate ranges from around about 10 7 ohm-cm to around about 10 12 ohm-cm.
9. The semiconductor device of claim 8 wherein material making up the semi-insulating substrate is selected from at least one member of the group consisting of SiC, silicon (Si), gallium nitride (GaN), zinc oxide (ZnO), aluminum oxide (Al 2 O 3 ), and gallium oxide (Ga 2 O 3 ).
10. The semiconductor device of claim 1 wherein the semiconductor device is a GaN high electron mobility transistor (HEMT).