Bulk acoustic wave structure with aluminum copper nitride piezoelectric layer and related method
View Patent ↗According to an exemplary embodiment, a bulk acoustic wave structure includes a lower electrode situated over a substrate. The bulk acoustic wave structure further includes a piezoelectric layer situated over the lower electrode, where the piezoelectric layer comprises aluminum copper nitride. The bulk acoustic wave structure further includes an upper electrode situated over the lower electrode. The bulk acoustic wave structure can further include a bond pad connected to the upper electrode, where the bond pad comprises aluminum copper. The lower electrode can include a high density metal situated adjacent to the piezoelectric layer and a high conductivity metal layer underlying the high density metal layer.
1. A bulk acoustic wave (BAW) structure comprising:
a lower electrode situated over a substrate;
a piezoelectric layer situated over the lower electrode, the piezoelectric layer comprising aluminum copper nitride; and
an upper electrode situated over the lower electrode.
2. The BAW structure of claim 1 further comprising a bond pad connected to the upper electrode, wherein the bond pad comprises aluminum copper.
3. The BAW structure of claim 1 , wherein the lower electrode comprises a high density metal layer situated adjacent to the piezoelectric layer and a high conductivity metal layer underlying the high density metal layer.
4. The BAW structure of claim 3 , wherein the high conductivity metal layer comprises aluminum copper.
5. The BAW structure of claim 1 , wherein the upper electrode comprises a high density metal layer situated adjacent to the piezoelectric layer and a high conductivity metal layer overlying the high density metal layer.
6. The BAW structure of claim 5 , wherein the high conductivity metal layer comprises aluminum copper.
7. The BAW structure of claim 1 , wherein the piezoelectric layer has a thickness of between 0.7 microns and 2.0 microns.
8. A film bulk acoustic resonator (FBAR), comprising:
a substrate comprising an air cavity;
a lower electrode disposed over the substrate;
a piezoelectric layer disposed over the tower electrode, the piezoelectric layer including aluminum copper nitride;
an upper electrode disposed over the piezoelectric layer, wherein at least one of the lower electrode and the upper electrode comprises an AlCu layer.
9. The FBAR of claim 8 , wherein the upper electrode comprises the AlCu layer.
10. The FBAR of claim 8 , wherein the lower electrode comprises the AlCu layer.
11. The FBAR of claim 8 , wherein both the lower and upper electrodes comprises the AlCu layer.
12. The FBAR of claim 8 , further comprising a bond pad connected to the upper electrode, wherein the bond pad comprises another AlCu layer also formed in the same process chamber.
13. A BAW resonator structure, comprising:
a lower electrode disposed over a substrate, the lower electrode including a first high density metal layer over a first high conductivity metal layer;
a piezoelectric layer disposed over the lower electrode, the piezoelectric layer comprising aluminum copper nitride;
an upper electrode disposed over the piezoelectric layer, the upper electrode comprising a second high conductivity metal layer over a second high density metal layer; and
forming a bond pad over the piezoelectric layer and the upper electrode, wherein the first and second high conductivity metal layers and the bond pad are AlCu layers formed in a same process chamber as the piezoelectric layer using an AlCu target.
14. A film bulk acoustic wave resonator (FBAR) as claimed in claim 13 , further comprising an air cavity in the substrate.