IP Library Granted Patent US 9,062,142
Granted Patent B2
US 9,062,142 · App. 13/976,263 · Granted Jun 23, 2015

Active energy ray-curable resin composition, product having the uneven microstructure, and method for producing product having the uneven microstructure

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Quick Facts
Patent No.
US 9,062,142
App. No.
13/976,263
Granted
Jun 23, 2015
Kind
B2
Abstract

The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.

Claims (22)

1. An active energy ray-curable resin composition comprising

a multifunctional monomer (A); and

a mono(meth)acrylate (B) having a polyethylene glycol structure having a number of repeating ethylene glycol units of 9 or more,

wherein the content of the multifunctional monomer (A) is 70 to 95 parts by mass, and the content of the mono(meth)acrylate (B) is 5 to 30 parts by mass, here the total content of all monomers contained in the resin composition is 100 parts by mass,

wherein the multifunctional monomer (A) is at least one selected from the group consisting of urethane (meth)acrylate, epoxy (meth)acrylate, polyester (meth)acrylate, ethoxylated trimethylolpropane triacrylate and ethoxylated pentaerythritol tetraacrylate, and contains three or more radical polymerizable functional groups, and has a value obtained by dividing molecular weight of the multifunctional monomer (A) by the number of radical polymerizable functional groups (molecular weight per functional group) of 110 to 200.

2. The active energy ray-curable resin composition according to claim 1 , wherein no solvent is present.

3. The active energy ray-curable resin composition according to claim 1 , further comprising a monomer (C) containing one or more radical polymerizable functional groups, excluding the multifunctional monomer (A) and the mono(meth)acrylate (B), in a range of 0 to 20 parts by mass based on the total content of all monomers contained in the resin composition being 100 parts by mass.

4. The active energy ray-curable resin composition according to claim 1 , further comprising a slip agent (D).

5. A material for imprint, comprising an active energy ray-curable resin composition according to claim 1 .

6. The material for imprint according to claim 5 , wherein the material is used for forming an uneven microstructure.

7. A molded article consisting of a cured product of an active energy ray-curable resin composition according to claim 1 or comprising a cured resin layer of an active energy ray-curable resin composition according to claim 1 .

8. The molded article according to claim 7 , wherein the molded article has an uneven microstructure on the surface.

9. The molded article according to claim 8 , wherein the molded article is a display member.

10. A method for producing a product having the uneven microstructure having a cured resin layer having an uneven microstructure on the surface, wherein the method comprises at least following steps:

1) disposing an active energy ray-curable resin composition according to claim 1 between a stamper having an inverse structure of the uneven microstructure and a base material;

2) irradiating the active energy ray-curable resin composition with an active energy ray to cure the active energy ray-curable resin composition, and

3) removing the stamper.

11. A product having the uneven microstructure having an uneven microstructure on the surface,

wherein the product having the uneven microstructure is formed by contacting an active energy ray-curable resin composition according to claim 1 with a stamper having an inverse structure of the uneven microstructure on the surface, and curing the active energy ray-curable resin composition.

12. The product having the uneven microstructure according to claim 11 , wherein the product having the uneven microstructure is an anti-reflective article.

13. The active energy ray-curable resin composition according to claim 2 , further comprising

a monomer (C) containing one or more radical polymerizable functional groups, excluding the multifunctional monomer (A) and the mono(meth)acrylate (B), in a range of 0 to 20 parts by mass based on the total content of all monomers contained in the resin composition being 100 parts by mass.

Assignments (2)
CHANGE OF NAME Recorded Sep 5, 2017
From: MITSUBISHI RAYON CO., LTD.
To: MITSUBISHI CHEMICAL CORPORATION
Reel/Frame 043750/0834 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 26, 2013
From: TAKIHARA, TSUYOSHI; OKAMOTO, EIKO; OTANI, GO; NAKAI, YUSUKE
To: MITSUBISHI RAYON CO., LTD.
Reel/Frame 030691/0850 →