Photo-patterning using a translucent cylindrical master to form microscopic conductive lines on a flexible substrate
View Patent ↗A method includes forming a master embossing roller to have a predetermined pattern, coating a flexible unpatterned substrate with a catalyst coating layer and forming a corresponding pattern in the coated substrate using the master embossing roller to thereby form a patterned substrate. The method may also include electrolessly plating the patterned substrate.
1. A method, comprising:
forming a master embossing roller comprising a predetermined pattern, wherein forming the master embossing roller comprises coating at least a portion of the roller with aluminum between an outer resist coating and a cylindrical substrate and photoetching portions of the aluminum not covered by the outer resist coating;
coating a flexible unpatterned substrate with a catalyst coating layer;
forming a corresponding pattern in the coated substrate using the master embossing roller to thereby form a patterned substrate; and
electrolessly plating the patterned substrate.
2. The method of claim 1 wherein forming the corresponding pattern comprises rolling the master embossing roller relative to the flexible unpatterned substrate.
3. The method of claim 1 wherein forming the master embossing roller comprises etching away a portion of the outer resist coating from the cylindrical substrate.
4. The method of claim 3 wherein forming the master embossing roller comprises etching a portion of the outer resist layer using a laser.
5. The method of claim 1 wherein the catalyst coating layer comprises any one or more of acrylics, urethane and polymers.
6. The method of claim 1 wherein forming the master embossing roller comprises forming grooves in an outer resist layer that extend lengthwise the roller.
7. The method of claim 1 wherein forming the master embossing roller comprises forming grooves circumferentially in an outer resist layer on the roller.
8. The method of claim 1 wherein forming the master embossing roller comprises removing the outer resist coating thereby leaving those portions of the aluminum not photoetched away.
9. The method of claim 1 wherein the substrate comprises any one or more of polyethylene terephthalate (PET) film, metal, paper, and glass.
10. The method of claim 1 wherein electrolessly plating the patterned substrate comprises applying ultraviolet light to the substrate to selectively cause only some areas of the substrate to attract electroless metal.
11. A method, comprising:
forming a master embossing roller comprising a predetermined pattern, wherein forming the master embossing roller comprises coating at least a portion of the roller with aluminum between an outer resist coating and a cylindrical substrate, photoetching portions of the aluminum not covered by the outer resist coating, and wherein forming the master embossing roller comprises removing the outer resist coating thereby leaving those portions of the aluminum not photoetched away;
laser etching a plurality of grooves in the coating to form a master embossing roller having a predetermined pattern of grooves and raised lines;
coating a cylindrical structure with an ultraviolet light-opaque coating;
coating a flexible unpatterned substrate with a catalyst coating layer;
embossing the predetermined pattern in the flexible unpatterned substrate by rotating the master embossing roller against the catalyst coating layer; and
electrolessly plating the patterned substrate.
12. The method of claim 11 wherein laser etching comprises forming the grooves in a direction that extends along a long dimension of the cylindrical structure.
13. The method of claim 11 wherein laser etching comprises forming the grooves in a circumferential orientation on the cylindrical structure.