Acoustic wave device with reduced higher order transverse modes
View Patent ↗In an acoustic wave device, a high-order transverse mode wave which is an unnecessary wave is suppressed. The acoustic wave device includes: a piezoelectric substrate; at least one pair of IDT electrodes formed on the piezoelectric substrate; and a dielectric film which covers at least a part of the piezoelectric substrate and the IDT electrodes, and the IDT electrodes each has a plurality of electrode fingers. The dielectric film covers at least an area in which the electrode fingers are arranged interleaved with each other. An acoustic velocity of an acoustic wave in an intersection area, within the region, which is a portion from ends of the electrode fingers to a predetermined length or more inward from the ends, is greater than an acoustic velocity of an acoustic wave in an edge area including end portions of the electrode fingers.
1. An acoustic wave device comprising:
a piezoelectric substrate;
a pair of IDT electrodes formed on the piezoelectric substrate, a first IDT electrode of the pair of IDT electrodes including a first bus bar and a first plurality of electrode fingers extending from the first bus bar, a second IDT electrode of the pair of IDT electrodes including a second bus bar and a second plurality of electrode fingers extending from the second bus bar, the first plurality of electrode fingers interleaved with the second plurality of electrode fingers; and
a first dielectric film covering at least a part of the piezoelectric substrate and the pair of IDT electrodes, the first dielectric film covering an intersection area in which the first plurality and second plurality of electrode fingers are arranged interleaved with each other and edge areas adjacent to the intersection area, an acoustic velocity of an acoustic wave in the intersection area being greater than the acoustic velocity of the acoustic wave in the edge areas, the first dielectric film including a first area covering the intersection area and/or one of the edge areas and having a first thickness, a second area adjacent the intersection area and/or the one of the edge areas and having a second thickness, and a tapered area formed at an intersection of the first area and the second area, a thickness of the first dielectric film continuously changing in the tapered area.
2. The acoustic wave device of claim 1 wherein each of the pair of IDT electrodes includes a plurality of dummy electrode fingers.
3. The acoustic wave device of claim 1 wherein the acoustic velocity of the acoustic wave in each of a pair of gap areas defined in the acoustic wave device is greater than the acoustic velocity of the acoustic wave in each edge area of the acoustic wave device.
4. The acoustic wave device of claim 2 wherein the acoustic velocity of the acoustic wave in each of a pair of gap areas defined in the acoustic wave device is greater than the acoustic velocity of the acoustic wave in each edge area of the acoustic wave device.
5. The acoustic wave device of claim 1 wherein a film thickness of the first dielectric film in the intersection area is thinner than a film thickness of the first dielectric film in the edge areas.
6. The acoustic wave device of claim 1 wherein the first dielectric film has one of a lamination structure including two kinds of silicon dioxide films and a lamination structure including a silicon dioxide film and a dielectric film that further covers the silicon dioxide film.
7. The acoustic wave device of claim 1 further comprising a second dielectric film formed on the first dielectric film and further covering the intersection area, the acoustic velocity of the acoustic wave in the second dielectric film being greater than the acoustic velocity of the acoustic wave in the first dielectric film.
8. The acoustic wave device of claim 7 wherein the first dielectric film includes silicon dioxide and the second dielectric film includes one of silicon nitride, silicon oxynitride, and aluminium nitride.
9. The acoustic wave device of claim 1 further comprising a second dielectric film formed on the first dielectric film and further covering the edge areas, the acoustic velocity of the acoustic wave in the second dielectric film being less than the acoustic velocity of the acoustic wave in the first dielectric film.
10. The acoustic wave device of claim 9 wherein the first dielectric film includes silicon dioxide and of the third dielectric film includes tantalum(V) oxide.
11. The acoustic wave device of claim 1 wherein a portion of the first dielectric film covering the intersection area is covered with a passivation film having a moisture resistance higher than a moisture resistance of the first dielectric film.
12. The acoustic wave device of claim 1 wherein the dielectric film is covered with a passivation film having a moisture resistance higher than a moisture resistance of the dielectric film, a film thickness of the passivation film covering the intersection area being thicker than a film thickness of the passivation film in areas other than the intersection area.
13. The acoustic wave device of claim 1 wherein at least a part of an electrode film thickness of the first bus bar is thicker than an electrode film thickness of the first plurality of electrode fingers.
14. The acoustic wave device of claim 2 wherein the first dielectric film covers the plurality of dummy electrode fingers.
15. The acoustic wave device of claim 1 wherein the piezoelectric substrate has a cut angle of between 36 degrees and 41 degrees.
16. The acoustic wave device of claim 1 wherein the IDT electrode has a lamination structure including a first metal layer including one of platinum, tungsten, and molybdenum and a second metal layer laminated on the first metal layer and having a higher conductivity than the first metal layer.
17. The acoustic wave device of claim 1 further comprising two reflectors formed on the piezoelectric substrate, a plurality of pairs of the IDT electrodes formed between the two reflectors, the two reflectors and the plurality of pairs of the IDT electrodes arranged along a propagating direction of a main acoustic wave and forming a longitudinally coupled filter.
18. An acoustic wave device comprising:
a piezoelectric substrate;
a pair of IDT electrodes formed on the piezoelectric substrate, a first IDT electrode of the pair of IDT electrodes including a first plurality of electrode fingers, a second IDT electrode of the pair of IDT electrodes including a second plurality of electrode fingers, the first plurality of electrode fingers interleaved with the second plurality of electrode fingers; and
a dielectric film covering at least a part of the piezoelectric substrate and the pair of IDT electrodes, the dielectric film covering an intersection area in which the first plurality of electrode fingers and the second plurality of electrode fingers are interleaved with each other and edge areas adjacent to the intersection area, an acoustic velocity of an acoustic wave in the intersection area being greater than the acoustic velocity of the acoustic wave in the edge areas, the dielectric film including a first area covering the intersection area and/or one of the edge areas and having a first thickness, a second area adjacent the intersection area and/or the one of the edge areas and having a second thickness, and a tapered area formed at an intersection of the first area and the second area, a thickness of the dielectric film continuously changing in the tapered area.
19. The acoustic wave device of claim 18 further comprising a gap area adjacent one of the edge areas, the dielectric film covering the gap area, the acoustic velocity of the acoustic wave in the gap area being greater than the acoustic velocity of the acoustic wave in the one of the edge areas.
20. The acoustic wave device of claim 19 wherein the pair of IDT electrodes each includes a bus bar covered by the dielectric film and bus bar areas defined above the bus bars, the acoustic velocity of the acoustic wave in each of the bus bar areas being less than the acoustic velocity of the acoustic wave in the one of the edge areas.