IP Library Granted Patent US 9,079,131
Granted Patent B2
US 9,079,131 · App. 13/992,822 · Granted Jul 14, 2015

Wet scrubber and a method of cleaning a process gas

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Quick Facts
Patent No.
US 9,079,131
App. No.
13/992,822
Granted
Jul 14, 2015
Kind
B2
Abstract

A wet scrubber ( 1 ) useful for cleaning a process gas comprises at least a first spray level system ( 20 ) and a second spray level system ( 26 ) arranged vertically above the first spray level system ( 20 ) in a wet scrubber tower ( 2 ). The first spray level system ( 20 ) comprises at least one gas-liquid contacting plate ( 38 ) which is operative for deflecting absorption liquid, that has been atomized by means of the second spray level system ( 26 ) and flowing downward in the wet scrubber tower ( 2 ), so deflected absorption liquid (AL) may contact process gas (F) contacted by absorption liquid atomized by the first spray level system ( 20 ).

Claims (15)

1. A wet scrubber useful for cleaning a process gas, the wet scrubber comprising:

at least a first spray level system supplied an absorption liquid for atomization by nozzles comprised in the first spray level system,

a second spray level system arranged vertically above the first spray level system supplied an absorption liquid for atomization by nozzles comprised in the second spray level system, and

a wet scrubber tower housing the first and second spray level systems comprising

a process gas inlet located at a base portion of the tower, and

a process gas outlet located at an upper portion of the tower,

wherein the first spray level system comprises at least one gas-liquid contacting plate located vertically above at least one nozzle of the first spray level system, the at least one gas-liquid contacting plate operative for deflecting absorption liquid atomized by nozzles of the second spray level system flowing downward in the wet scrubber tower to contact process gas already contacted by absorption liquid atomized by the at least one nozzle of the first spray level system, and at least one adjustable damper located adjacent to the at least one gas-liquid contacting plate for controlling vertical velocity of process gas contacted by deflected absorption liquid.

2. A wet scrubber according to claim 1 , wherein the first spray level system comprises individual gas-liquid contacting plates arranged vertically above each of at least half the nozzles of the first spray level system.

3. A wet scrubber according to claim 1 , wherein a total horizontal surface area of all gas-liquid contacting plates of the first spray level system cover, in total, 30-75% of an internal wet scrubber horizontal cross-sectional area of the wet scrubber tower, as measured at a level of at least one gas-liquid contacting plate of the first spray level system.

4. A wet scrubber according to claim 1 , wherein a vertical distance from a nozzle spray opening to a closest point on a bottom surface of the corresponding gas-liquid contacting plate is 0.1 to 0.9 m.

5. A wet scrubber according to claim 1 , wherein the first spray level system comprises at least one damper arranged between at least two adjacent gas-liquid contacting plates, and in substantially a same horizontal plane as the at least two adjacent gas-liquid contacting plates.

6. A wet scrubber according to claim 1 , wherein a third spray level system supplied an absorption liquid for atomization by nozzles comprised in the third spray level system, is arranged vertically above the second spray level system, the second spray level system comprising at least one gas-liquid contacting plate located vertically above at least one of the nozzles of the second spray level system, the at least one gas-liquid contacting plate operative for deflecting absorption liquid atomized by nozzles of the third spray level system flowing downward in the wet scrubber tower to contact process gas already contacted by absorption liquid atomized by the at least one nozzle of the second spray level system.

7. A wet scrubber according to claim 1 , wherein a total combined top surface area of all gas-liquid contacting plates of one spray level system is smaller than a total combined top surface area of all gas-liquid contacting plates of another spray level system arranged above the first-mentioned spray level system within the same wet scrubber tower.

8. A wet scrubber according to claim 1 , wherein at least the first spray level system nozzles spray at least half of the absorption liquid supplied thereto in a downward direction.

9. A wet scrubber according to claim 1 , wherein at least 75% of all of the nozzles of each spray level system, except for an uppermost spray level system, are equipped with single, corresponding gas-liquid contacting plates thereabove.

Assignments (4)
CORRECTIVE ASSIGNMENT TO CORRECT THE RECEIVING PARTY'S ADDRESS PREVIOUSLY RECORDED ON REEL 71474 FRAME 283. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jun 30, 2025
From: GENERAL ELECTRIC TECHNOLOGY GMBH
To: GE VERNOVA INFRASTRUCTURE TECHNOLOGY LLC
Reel/Frame 071771/0479 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 3, 2025
From: GENERAL ELECTRIC TECHNOLOGY GMBH
To: GE VERNOVA INFRASTRUCTURE TECHNOLOGY LLC
Reel/Frame 071474/0283 →
CHANGE OF NAME Recorded Aug 17, 2016
From: ALSTOM TECHNOLOGY LTD
To: GENERAL ELECTRIC TECHNOLOGY GMBH
Reel/Frame 039714/0578 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 14, 2013
From: HAKANSSON, RIKARD
To: ALSTOM TECHNOLOGY LTD
Reel/Frame 031006/0461 →