Semiconductor device and manufacturing method of the same
View Patent ↗According to one embodiment a method is provided including positioning and bonding a plurality of first semiconductor chips in a coplanar relation on a first substrate, laminating at least a plurality of second semiconductor chips on the first semiconductor chips, cutting the first substrate for separation into a discrete chip lamination, aligning an electrode pad provided on a surface of the discrete lamination with an electrode pad on a second substrate, and temporarily connecting the electrode pads on the lamination and the second substrate in an opposing relation to the first substrate, providing electrical connection between the electrode pads by a reflow process, flowing a liquid resin from the side of the first substrate towards the second substrate to seal the chip lamination and spaces between the chip lamination and the first and second substrate, and cutting the chip lamination to form a discrete device.
1. A manufacturing method of a laminated semiconductor device, comprising:
positioning a plurality of first semiconductor chips in a layer in the same plane on a first substrate, and bonding the first semiconductor chips to the first substrate;
stacking at least one layer of second semiconductor chips on respective first semiconductor chips leaving a space therebetween;
cutting the first substrate into a discrete lamination;
aligning a first electrode pad provided on a surface of the lamination with a second electrode pad on a second substrate, and temporarily connecting the electrode pads on the lamination and the second substrate in an opposing relation to the first substrate;
providing electrical connections between the first and second electrode pads by a reflow process;
flowing a liquid resin from the side of the first substrate to seal the spaces between the respective semiconductor chips and between the lamination and the second substrate; and
cutting edges of the resin, the first substrate and the second substrate to separate the lamination into a discrete device.
2. The method according to claim 1 , wherein the first substrate comprises a resin material.
3. The method according to claim 1 , wherein the lamination is cut by a dicing blade from the side of the first substrate towards the second substrate for separating the lamination into the discrete device.
4. The method according to claim 3 , wherein the first substrate comprises a resin material.
5. The method according to claim 1 , further comprising:
flowing a sealing resin containing fillers and sealing the periphery of the lamination with the resin prior to the cutting the edges of the resin.
6. The method according to claim 5 , wherein the lamination is cut by a dicing blade from the side of the second substrate towards the first substrate for separating the lamination into the discrete device.
7. The method according to claim 5 , wherein the first substrate comprises a resin material.
8. A manufacturing method of a laminated semiconductor device, comprising:
positioning a plurality of first semiconductor chips in the same plane on a first resin-containing substrate, and bonding the first semiconductor chips to the first substrate;
aligning a plurality of second semiconductor chips with front surfaces or rear surfaces of the first semiconductor chips using a photosensitive bonding film patterned into a desired pattern, and heating the aligned semiconductor chips to laminate at least one layer of second semiconductor chips on the respective first semiconductor chips and forming a flow path for a liquid resin;
cutting the first substrate for separation into a plurality of discrete laminations;
aligning an electrode pad provided on a surface of one the plurality of discrete laminations with an electrode pad on a second substrate, and temporarily connecting the electrode pads on the discrete lamination and the second substrate in an opposing relation to the first substrate;
providing electrical connections between each of the electrode pads by a reflow process;
flowing the liquid resin from the side of the first substrate toward the second substrate to seal spaces between the first and second semiconductor chips and between the second semiconductor chips and the second substrate with the liquid resin; and
cutting the discrete lamination by a dicing blade to form a discrete device.
9. The method according to claim 8 , wherein the discrete lamination is cut by the dicing blade from the side of the first substrate towards the second substrate to form the discrete device.
10. The method according to claim 8 , wherein the discrete lamination is cut by the dicing blade from the side of the second substrate towards the first substrate to form the discrete device.
11. The method according to claim 8 , wherein the dicing blade cuts edges of the resin, and the first and second substrate to form the discrete device.
12. The method according to claim 11 , wherein the discrete lamination is cut by the dicing blade from the side of the first substrate towards the second substrate to form the discrete device.
13. The method according to claim 11 , wherein the discrete lamination is cut by the dicing blade from the side of the second substrate towards the first substrate to form the discrete device.
14. The method according to claim 8 , further comprising:
flowing a sealing resin containing fillers and sealing the periphery of the discrete lamination with the sealing resin prior to the cutting the discrete lamination.
15. The method according to claim 14 , wherein the discrete lamination is cut by the dicing blade from the side of the first substrate towards the second substrate to form the discrete device.
16. The method according to claim 14 , wherein the discrete lamination is cut by the dicing blade from the side of the second substrate towards the first substrate to form the discrete device.