Manufacturing method for semiconductor device
View Patent ↗According to one embodiment, a first adhesive layer is formed on one major surface of a first substrate. The first substrate and a second substrate are adhered using a second adhesive layer that has thermosetting properties and covers the first adhesive layer, wherein a bonding strength between the second substrate is greater than a bonding strength between the second substrate and the first adhesive layer. The other major surface of the first substrate is polished, and the first substrate is thinned. A physical force is then applied to peripheral parts of the second adhesive layer, and a circular notched part is formed along the outer perimeter of the second adhesive layer to separate the first substrate and the second substrate at the interface between the first adhesive layer and the second adhesive layer.
1. A manufacturing method for a semiconductor device comprising:
applying a first adhesive layer and a second adhesive layer between a first major surface of a first substrate and a second substrate to adhere the first substrate to the second substrate, wherein the first adhesive layer has a bonding strength that is different than a bonding strength of the second adhesive layer;
thinning a second major surface of the first substrate; and
applying physical force to a peripheral portion of the second adhesive layer to form a circumferential notched part along an outer perimeter of the second adhesive layer.
2. The method of claim 1 , wherein the first adhesive layer is applied to an area of the first substrate that is less than the total surface area of the first major surface of the first substrate.
3. The method of claim 2 , wherein second adhesive layer is provided on the first major surface of the second substrate.
4. The method of claim 3 , wherein the second adhesive layer covers the first adhesive layer.
5. The method of claim 3 , wherein second adhesive layer includes a bond strength that is less than a bond strength between the first adhesive layer and the first substrate.
6. The method of claim 1 , wherein the notched part is formed in a region including an interface between the first substrate and the second adhesive layer.
7. The method of claim 6 , wherein the notched part is formed without removing the second adhesive layer between the notched part and the second substrate.
8. The method of claim 1 , wherein the notched part comprises a groove having an outer perimeter positioned inside of the outer perimeter of the second adhesive layer.
9. The method of claim 8 , wherein the notched part is formed without removing the second adhesive layer between the notched part and the second substrate.
10. The method of claim 1 , wherein the notched part comprises a groove having an inner perimeter positioned inside of an outer perimeter of the first adhesive layer.
11. The method of claim 10 , wherein the notched part is formed without removing the second adhesive layer between the notched part and the second substrate.
12. A manufacturing method for a semiconductor device comprising:
applying a first adhesive layer to a first major surface of a first substrate;
applying a second adhesive layer between a first major surface of a second substrate;
adhering the first adhesive layer to the second adhesive layer to adhere the first substrate to the second substrate, wherein the first adhesive layer has a bonding strength that is different than a bonding strength of the second adhesive layer;
thinning a second major surface of the first substrate; and
applying physical force to a peripheral portion of the second adhesive layer to form a circumferential notched part along an outer perimeter of the second adhesive layer.
13. The method of claim 12 , wherein the first adhesive layer is applied to an area of the first substrate that is less than the total surface area of the first major surface of the first substrate.
14. The method of claim 13 , wherein the second adhesive layer covers the first adhesive layer.
15. The method of claim 13 , wherein second adhesive layer includes a bond strength that is less than a bond strength between the first adhesive layer and the first substrate.
16. The method of claim 12 , wherein the notched part is formed in a region including an interface between the first substrate and the second adhesive layer.
17. The method of claim 16 , wherein the notched part is formed without removing the second adhesive layer between the notched part and the second substrate.
18. The method of claim 12 , wherein the notched part comprises a groove having an outer perimeter positioned inside of the outer perimeter of the second adhesive layer.
19. The method of claim 18 , wherein the notched part is formed without removing the second adhesive layer between the notched part and the second substrate.
20. A manufacturing method for a semiconductor device comprising:
forming a first adhesive layer on a first major surface of a first substrate;
adhering the first substrate and a second substrate using a second adhesive layer that has thermosetting properties and covers the first adhesive layer, wherein a bonding strength between the second substrate is greater than a bonding strength between the second substrate and the first adhesive layer;
thinning the second major surface of the first substrate;
applying physical force to peripheral parts of the second adhesive layer to form a circumferential notched part along an outer perimeter of the second adhesive layer; and
affixing a peeling member to the second major surface of the first substrate side to separate the first substrate and the second substrate along an interface between the first adhesive layer and the second adhesive layer; wherein
the notched part has an outer perimeter that is positioned inside of the outer perimeter of the second adhesive layer, and an inner perimeter that is positioned inside of an outer perimeter of the first adhesive layer, and is formed by leaving the second adhesive layer between the notched part and the second substrate.