Micropattern generation with pulsed laser diffraction
View Patent ↗Methods and devices for preparing microscale polymer relief structures from a thin polymer layer on an absorbing substrate are described. The described methods are ultrafast (about 8 nanoseconds) and allow formation of patterned microstructures having complex morphologies and narrow line widths that are an order of magnitude smaller than the masks used in the methods.
1. A device for preparing periodic microscale polymer relief structures on a substrate coated with at least one polymer, the device comprising:
a source of electromagnetic radiation;
a periodic aperture arranged to allow electromagnetic radiation from the source of electromagnetic radiation to pass through the periodic aperture, wherein the periodic aperture comprises a plurality of apertures arranged in a grid, wherein a shape of each of the plurality of apertures is one or more of squares, rectangles, hexagons, or combinations thereof;
a stage configured and arranged to allow the substrate positioned on the stage to be separated by a distance from the periodic aperture and irradiated by electromagnetic radiation from the source after the electromagnetic radiation has passed through the periodic aperture, whereby a near-field diffraction pattern of electromagnetic radiation intensity maxima and minima is created on the substrate; and
a substrate conveyor configured to support the substrate.
2. The device of claim 1 , wherein the source of electromagnetic radiation is a laser.
3. The device of claim 1 , wherein the source of electromagnetic radiation is a pulsed laser.
4. The device of claim 1 , further comprising at least one additional optic selected from non-linear optics, optical parametric amplifiers, dichroic mirrors, diffraction gratings, collimators, convergent optics, divergent optics, and combinations thereof.
5. The device of claim 1 , wherein the source of electromagnetic radiation is configured to produce light having a wavelength of about 355 nm.
6. The device of claim 1 , wherein the source of electromagnetic radiation is configured to produce electromagnetic radiation having a fluence of about 100 mJ/cm 2 to 400 mJ/cm 2 .
7. The device of claim 1 , wherein at least one of the periodic aperture and the stage are movably adjustable to adjust the distance between the substrate and the stage.
8. The device of claim 1 , further comprising at least one additional component configured to apply a polymer layer to the substrate.
9. The device of claim 1 , further comprising:
a polymer supply reel configured to hold an unstructured polymer film, the polymer supply reel being configured and arranged to allow the polymer film to contact the substrate while the substrate is irradiated with electromagnetic energy; and
a polymer winding reel configured to hold structured polymer film, the polymer winding reel being configured and arranged to collect the polymer film after contacting the substrate.
10. The device of claim 1 , further comprising:
a substrate supply reel configured to hold a non-irradiated substrate, the substrate supply reel being configured and arranged to allow the non-irradiated substrate to be irradiated with electromagnetic energy; and
a substrate winding reel configured to hold an irradiated substrate, the substrate winding reel being configured and arranged to collect the irradiated substrate after irradiation.
11. The device of claim 1 , the substrate conveyor is configured and arranged to transport the substrate through at least a portion of the device.
12. The device of claim 3 , wherein the pulsed laser is configured to produce electromagnetic energy having a pulse width of about 1 femtosecond to about 100 nanoseconds.
13. The device of claim 3 , wherein the pulsed laser is configured to produce electromagnetic energy having a pulse width of about 8 nanoseconds.
14. The device of claim 1 , wherein the source of the electromagnetic radiation is a neodymium-doped yttrium aluminum garnet laser.
15. The device of claim 1 , wherein the source of electromagnetic radiation is configured to produce electromagnetic radiation having a fluence of about 250 mJ/cm 2 .
16. The device of claim 1 , wherein the periodic aperture comprises a transmission electron microscopy grid.
17. The device of claim 1 , further comprising a housing operably coupled one or more of the source of electromagnetic radiation, the periodic aperture, and the substrate.
18. The device of claim 1 , wherein the shape of each of the plurality of apertures is different from an adjacent aperture.
19. The device of claim 1 , wherein the shape of each of the plurality of apertures overlaps to an adjacent aperture.