IP Library Granted Patent US 9,147,530
Granted Patent B2
US 9,147,530 · App. 14/018,001 · Granted Sep 29, 2015

Hermetically sealed polymer capacitors with high stability at elevated temperatures

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Quick Facts
Patent No.
US 9,147,530
App. No.
14/018,001
Granted
Sep 29, 2015
Kind
B2
Abstract

A process for providing an improved hermetically sealed capacitor which includes the steps of applying a solder and a flux to an interior surface of a case; flowing the solder onto the interior surface; remove flux thereby forming a flux depleted solder; inserting the capacitive element into the casing; reflowing the flux depleted solder thereby forming a solder joint between the case and the solderable layer; and sealing the case.

Claims (31)

1. A process for forming a capacitor comprising:

providing a case;

a solder including a flux to an interior surface of said case;

reflowing said solder onto said interior surface to form an electrically conductive bond between said solder and said case;

washing to remove said flux thereby forming a flux depleted solder;

providing a capacitive element comprising:

an anode of a valve metal;

an anode lead in electrical contact with said anode;

a dielectric on said anode; and

a cathode layer on said dielectric wherein said cathode layer comprises a doped conductive polymeric cathode and a solderable layer;

inserting said capacitive element into said case;

reflowing said flux depleted solder thereby forming a solder joint between said case and said solderable layer; and

sealing said case.

2. The process for forming a capacitor of claim 1 wherein said solder comprises lead and tin.

3. The process for forming a capacitor of claim 2 wherein said solder comprises 30-50 wt % lead, 45-69 wt % Sn and 1-5 wt % Ag.

4. The process for forming a capacitor of claim 1 wherein said solder comprises of Pb/Sn/Ag in 36/62/2 wt. % ratio.

5. The process for forming a capacitor of claim 1 wherein said solder and said flux are provided in a flux cored solder.

6. The process for forming a capacitor of claim 1 wherein said flux is an organic acid based flux.

7. The process for forming a capacitor of claim 6 wherein said flux is a rosin mildly activated (RMA) flux.

8. The process for forming a capacitor of claim 1 wherein said washing is with a solvent and further comprising reclaiming and analyzing said solvent after said washing.

9. The process for forming a capacitor of claim 8 wherein said analyzing is by chromatography.

10. The process for forming a capacitor of claim 8 comprising repeating said washing until said reclaimed solvent comprises less than 1 wt % flux.

11. The process for forming a capacitor of claim 10 comprising repeating said washing until said reclaimed solvent comprises less than 0.1 wt % flux.

12. The process for forming a capacitor of claim 1 wherein said doped conductive polymeric cathode comprises a conductive polymer selected from the group consisting of polypyrrole, polyaniline, polythiophene and their derivatives.

13. The process for forming a capacitor of claim 12 wherein said doped conductive polymeric cathode comprises polythiophene.

14. The process for forming a capacitor of claim 13 wherein said doped conductive polymeric cathode comprises poly 3,4-ethylenedioxypolythiophene.

15. The process for forming a capacitor of claim 1 wherein said doped conductive polymeric cathode comprises a dopant selected from the group consisting of polystyrene sulfonate.

16. The process for forming a capacitor of claim 1 further comprising attaching an external anode lead to said anode lead.

17. The process for forming a capacitor of claim 1 further comprising electrically attaching an external cathode lead to said cathode.

18. The process for forming a capacitor of claim 1 wherein said washing is with a solvent is selected from the group consisting of alcohol, glycol, ketone, ether, ester, dimethyl-formamide, dimethyl sulfoxide, methylene chloride and N-methyl-2-pyrrolidinone.

19. The process for forming a capacitor of claim 18 wherein said solvent is selected from the group consisting of isopropyl alcohol and acetone.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Nov 8, 2018
From: BANK OF AMERICA, N.A.
To: KEMET CORPORATION,; KEMET ELECTRONICS CORPORATION; KEMET BLUE POWDER CORPORATION
Reel/Frame 047450/0926 →
SECURITY AGREEMENT Recorded May 22, 2017
From: KEMET CORPORATION; KEMET ELECTRONICS CORPORATION; KEMET BLUE POWDER CORPORATION
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 042523/0639 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 4, 2013
From: HUSSEY, STEVEN C.; FREEMAN, YURI; LESSNER, PHILIP M.; CHEN, QINGPING; QAZI, JAVAID
To: KEMET ELECTRONICS CORPORATION
Reel/Frame 031137/0320 →