Substrate processing apparatus and substrate processing system
A substrate processing apparatus includes a processing section and an exposure transport section. The exposure transport section includes a horizontal transport region and a plurality of vertical transport regions in a casing. The horizontal transport region is provided at the upper portion of the casing to extend in the X direction. A plurality of exposure devices are arranged below the horizontal transport region to be lined up in the X direction. A transport mechanism is provided in the horizontal transport region. The transport mechanism is configured to be capable of transporting a substrate between the processing section and the plurality of exposure devices.
1. A substrate processing apparatus provided to be adjacent to a plurality of exposure devices,
the plurality of exposure devices being arranged in one direction relative to one another,
the substrate processing apparatus comprising:
a processing section that performs processing on a substrate; and
an exposure transport section for transporting the substrate between the processing section and the plurality of exposure devices, wherein
the processing section and the exposure transport section are arranged in the one direction relative to each other, and
the exposure transport section includes
a first transport path provided vertically above the plurality of exposure devices to extend in the one direction along the plurality of exposure devices,
a first transport mechanism configured to transport the substrate in the one direction in the first transport path such that the substrate can be received from and transferred to the plurality of exposure devices and the substrate can be received from and transferred to the processing section,
a first interface section, for receiving the substrate from and transferring the substrate to the processing section, provided at one end of the first transport path, and
a plurality of second interface sections, for receiving the substrate from and transferring the substrate to the plurality of exposure devices, arranged along the first transport path,
a plurality of second transport mechanisms that are provided to be vertically movable so as to transport the substrate between the plurality of second interface sections and the plurality of exposure devices, respectively, and
the first transport mechanism includes a mover configured to be movable in the one direction and transporting the substrate between the first interface section and the plurality of second interface sections.
2. The substrate processing apparatus according to claim 1 , wherein
the processing section includes
a processing region that performs processing on the substrate, and
a transport region provided between the processing region and the exposure transport section, and
the transport region includes
a second transport mechanism that transports the substrate between the processing region and the exposure transport section.
3. The substrate processing apparatus according to claim 2 , wherein the processing region, the transport region, and the exposure transport section are arranged in the one direction relative to one another.
4. The substrate processing apparatus according to claim 1 , wherein
the first interface section includes an orientation adjustor for adjusting an orientation of the substrate.
5. The substrate processing apparatus according to claim 1 , wherein
the plurality of exposure devices are arranged to form a plurality of rows in the one direction,
the plurality of first transport paths are provided to respectively extend along the plurality of rows, and
the plurality of first transport mechanisms are provided to respectively transport the substrates in the plurality of first transport paths.
6. A substrate processing system, comprising:
the plurality of substrate processing apparatuses according to claim 1 , and
a transport section between apparatuses for transporting a substrate among the plurality of substrate processing apparatuses.
7. The substrate processing system according to claim 6 , wherein
the transport section between apparatuses are configured to transport the substrate between the exposure transport sections of the plurality of substrate processing apparatuses and the processing sections of the plurality of substrate processing apparatuses.
8. The substrate processing system according to claim 6 , wherein
each substrate processing apparatus includes a carry-in/carry-out region for carrying in the substrate from outside and carrying out the substrate to the outside, and
the transport section between apparatuses is configured to transport the substrate among the carry-in/carry-out regions in the plurality of substrate processing apparatuses.
9. The substrate processing apparatus according to claim 1 , wherein the exposure transport section includes a plurality of up-down transport regions that are provided respectively to be adjacent to the plurality of second interface sections in the one direction, and the plurality of second transport mechanisms are provided respectively to be vertically movable in the plurality of up-down transport regions.
10. The substrate processing apparatus according to claim 9 , wherein the mover has a first holder that holds the substrate,
the second transport mechanism has a second holder that holds the substrate, the mover is configured to advance and retreat the first holder in a second direction intersecting with the first direction, to place the substrate on each second interface section and receive the substrate from each second interface section, and the second transport mechanism is configured to advance and retreat the second holder in the first direction, to place the substrate on each second interface section and receive the substrate from each second interface section.