Photoelectric conversion device and method for producing same
View Patent ↗This photoelectric conversion device ( 10 ) is provided with: an n-type monocrystalline silicon substrate ( 21 ); an IN layer ( 25 ) and an IP layer ( 26 ) formed on the back surface of the n-type monocrystalline silicon substrate ( 21 ); an n-side electrode ( 40 ) containing an n-side underlayer ( 43 ), an n-side primary conductive layer ( 44 ), and an n-side protective layer ( 45 ); and a p-side electrode ( 50 ) containing a p-side underlayer ( 53 ), a p-side primary conductive layer ( 54 ), and a p-side protective layer ( 55 ). The n-side primary conductive layer ( 44 ) is formed in a manner so as not to cover the lateral surface of the n-side underlayer ( 43 ), and is covered at the lateral surface by the n-side protective layer ( 45 ). The p-side electrode ( 50 ) is formed in such a manner the lateral surface of the p-side underlayer ( 53 ) is not covered, and the lateral surface is covered by the p-side protective layer ( 55 ).
1. A method for producing a photoelectric conversion device, comprising the steps of:
forming a p-type region and an n-type region on one surface of a semiconductor substrate; and
forming a p-side electrode and an n-side electrode which are isolated by an isolation trench, the p-side electrode being formed on the p-type region and the n-side electrode being formed on the n-type region, respectively, wherein
the electrode forming step includes the steps of:
forming an underlayer and a first primary conductive layer on the p-type region and the n-type region;
forming a resist film on an area of the first primary conductive layer corresponding to the isolation trench;
forming a p-side second primary conductive layer and an n-side second primary conductive layer, respectively, so as to be isolated from each other, by electrolytic plating using the first primary conductive layer for which the resist film is formed as a seed layer;
removing the resist film and etching the first primary conductive layer and the underlayer to form a p-side first primary conductive layer and an n-side first primary conductive layer, and a p-side underlayer and an n-side underlayer, respectively; and
forming a p-side protective layer and an n-side protective layer, respectively, by electrolytic plating so as to cover the p-side second primary conductive layer and the n-side second primary conductive layer.
2. A method for producing a photoelectric conversion device, comprising the steps of:
forming a p-type region and an n-type region on one surface of a semiconductor substrate a p-type region and an n-type region; and
forming a p-side electrode and an n-side electrode which are isolated by an isolation trench, the p-side electrode being formed on the p-type region and the n-side electrode being formed on the n-type region, respectively, wherein
the electrode forming step includes the steps of:
forming an underlayer and a first primary conductive layer on the p-type region and the n-type region;
forming a second primary conductive layer by electrolytic plating, using the first primary conductive layer as a seed layer;
forming a resist film on the second primary conductive layer with an area corresponding to the isolation trench being left;
etching the second primary conductive layer in an area not protected by the resist film, the first primary conductive layer, and the underlayer, respectively, and forming a p-side second primary conductive layer and an n-side second primary conductive layer, a p-side first primary conductive layer and an n-side first primary conductive layer, a p-side underlayer and an n-side underlayer, respectively; and
removing the resist film, and forming a p-side protective layer and an n-side protective layer by electrolytic plating to cover the p-side second primary conductive layer and the n-side second primary conductive layer.
3. The method for producing a photoelectric conversion device according to claim 1 wherein
after etching the first primary conductive layer to form the p-side first primary conductive layer and the n-side first primary conductive layer, the underlayer is etched to form the p-side underlayer and the n-side underlayer under a condition different from that for etching the first primary conductive layer.
4. The method for producing a photoelectric conversion device according to claim 2 wherein
after etching the first primary conductive layer to form the p-side first primary conductive layer and the n-side first primary conductive layer, the underlayer is etched to form the p-side underlayer and the n-side underlayer under a condition different from that for etching the first primary conductive layer.
5. The method for producing a photoelectric conversion device according to claim 1 wherein
the underlayer is a transparent conductive oxide layer, the first primary conductive layer and the second primary conductive layer are Cu layers, and
the p-side protective layer and the n-side protective layer are Sn layers.
6. The method for producing a photoelectric conversion device according to claim 2 wherein
the underlayer is a transparent conductive oxide layer, the first primary conductive layer and the second primary conductive layer are Cu layers, and
the p-side protective layer and the n-side protective layer are Sn layers.
7. The method for producing a photoelectric conversion device according to claim 3 wherein
the underlayer is a transparent conductive oxide layer, the first primary conductive layer and the second primary conductive layer are Cu layers, and
the p-side protective layer and the n-side protective layer are Sn layers.
8. The method for producing a photoelectric conversion device according to claim 4 wherein
the underlayer is a transparent conductive oxide layer, the first primary conductive layer and the second primary conductive layer are Cu layers, and
the p-side protective layer and the n-side protective layer are Sn layers.
9. The method for producing a photoelectric conversion device according to claim 1 wherein
the semiconductor substrate is a crystalline semiconductor substrate, and
the p-type region and the n-type region are configured to include a layer of a p-type amorphous semiconductor and an n-type amorphous semiconductor.
10. The method for producing a photoelectric conversion device according to claim 2 wherein
the semiconductor substrate is a crystalline semiconductor substrate, and
the p-type region and the n-type region are configured to include a layer of a p-type amorphous semiconductor and an n-type amorphous semiconductor.