IP Library Granted Patent US 9,450,167
Granted Patent B2
US 9,450,167 · App. 14/040,469 · Granted Sep 20, 2016

Temperature compensated acoustic resonator device having an interlayer

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Quick Facts
Patent No.
US 9,450,167
App. No.
14/040,469
Granted
Sep 20, 2016
Kind
B2
Abstract

An acoustic resonator comprises: an acoustic resonator device comprises: a composite first electrode disposed over a substrate, the composite first electrode comprising: a first electrically conductive layer provided over the substrate; a first interlayer disposed on the first electrical conductive layer; a buried temperature compensation layer disposed over the first interlayer; a second interlayer disposed over the temperature compensation layer; a second electrically conductive layer disposed over the second interlayer, a piezoelectric layer disposed over the composite first electrode; and a second electrode disposed over the piezoelectric layer.

Claims (31)

1. An acoustic resonator device comprising:

a composite first electrode disposed over a substrate, the composite first electrode comprising: a first electrically conductive layer provided over the substrate; a first interlayer disposed on the first electrically conductive layer; a buried temperature compensation layer disposed over the first interlayer; a second interlayer disposed over the temperature compensation layer, and a second electrically conductive layer disposed over the second interlayer;

a piezoelectric layer disposed over the composite first electrode, the piezoelectric layer having a negative temperature coefficient; and

a second electrode disposed over the piezoelectric layer.

2. An acoustic resonator device as claimed in claim 1 , wherein the piezoelectric layer has a negative temperature coefficient and at least one of the first electrically conductive layer, the second electrically conductive layer and the second electrode has a positive temperature coefficient that offsets at least a portion of the negative temperature coefficient of the piezoelectric layer.

3. An acoustic resonator device as claimed in claim 1 , wherein at least one of the first and second interlayers has a positive temperature coefficient.

4. An acoustic resonator as claimed in claim 1 , wherein the second interlayer comprises a seed layer that fosters growth of highly textured piezoelectric material.

5. An acoustic resonator device as claimed in claim 1 , wherein the first interlayer is an etch-stop layer.

6. An acoustic resonator as claimed in claim 1 , wherein the first interlayer comprises a same material as the piezoelectric layer.

7. An acoustic resonator as claimed in claim 6 , wherein the material comprises aluminum nitride (AlN).

8. An acoustic resonator as claimed in claim 1 , wherein the second interlayer comprises a same material as the piezoelectric layer, or a material having a hexagonal crystal structure, or composition of interlayer from same piezoelectric layer (AlN) and hexagonal crystal structure materials.

9. An acoustic resonator as claimed in claim 8 , wherein the piezoelectric layer comprises aluminum nitride (AlN).

10. An acoustic resonator as claimed in claim 8 , wherein the material has a thickness in the range of approximately 10 1 Å to approximately 10 3 Å.

11. An acoustic resonator as claimed in claim 8 , wherein the material has a thickness in the range of approximately 60 Å to approximately 150 Å.

12. An acoustic resonator device as claimed in claim 5 , wherein the first interlayer comprises one of: Aluminum (Al), Silicon Carbide (SiC), Titanium Tungsten (TiW), or titanium oxynitride (TiO x N y ).

13. An acoustic resonator device comprising:

a composite first electrode disposed over a substrate, the composite first electrode comprising: a first electrically conductive layer provided over the substrate; an interlayer disposed on the first electrical conductive layer; a buried temperature compensation layer disposed over the interlayer; and a second electrically conductive layer disposed over the buried temperature compensation layer;

a piezoelectric layer disposed over the composite first electrode; and

a second electrode disposed over the piezoelectric layer.

14. An acoustic resonator device as claimed in claim 13 , wherein the piezoelectric layer has a negative temperature coefficient and at least one of the first electrically conductive layer, the second electrically conductive layer and the second electrode has a positive temperature coefficient that offsets at least a portion of the negative temperature coefficient of the piezoelectric layer.

15. An acoustic resonator device as claimed in claim 13 , wherein the interlayer has a positive temperature coefficient.

16. An acoustic resonator as claimed in claim 13 , wherein the interlayer comprises a same material as the piezoelectric layer.

17. An acoustic resonator as claimed in claim 13 , wherein the material comprises aluminum nitride (AlN).

18. An acoustic resonator as claimed in claim 16 , wherein the material has a thickness in the range of approximately 10 1 Å to approximately 10 3 Å.

19. An acoustic resonator comprising:

a first electrode disposed over a substrate;

a piezoelectric layer disposed over the first electrode; and

a composite second electrode comprising disposed over the piezoelectric layer, the second electrode comprising: a first electrically conductive layer provided over the piezoelectric layer; a second electrically conductive layer disposed over the first electrically conductive layer; a buried temperature compensating layer provided between the first and second electrically conductive layers; and an interlayer disposed beneath the buried temperature compensating layer and over the first electrically conductive layer.

20. An acoustic resonator as claimed in claim 19 , wherein the piezoelectric layer has a negative temperature coefficient and at least one of the first electrically conductive layer, the second electrically conductive layer and the second electrode has a positive temperature coefficient that offsets at least a portion of the negative temperature coefficient of the piezoelectric layer.

21. An acoustic resonator as claimed in claim 19 , wherein the interlayer is an etch-stop layer.

22. An acoustic resonator as claimed in claim 21 , wherein the interlayer comprises one of: Aluminum Nitride (AlN), Aluminum (Al), Silicon Carbide (SiC), Titanium Tungsten (TiW), or titanium oxynitride (TiO x N y ).

Assignments (7)
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 047422 FRAME: 0464. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Mar 6, 2019
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 048883/0702 →
MERGER Recorded Oct 5, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047422/0464 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Recorded Feb 3, 2017
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 041710/0001 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2016
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 037808/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001) Recorded Feb 2, 2016
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 037689/0001 →
PATENT SECURITY AGREEMENT Recorded May 8, 2014
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 032851/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 27, 2013
From: ZOU, QIANG; LEE, DONALD; SMALL, MARTHA K.; BI, FRANK; LAMERS, TINA L.; RUBY, RICHARD C.
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 031303/0498 →