Programmable diode array for high density OTP application
View Patent ↗A device for one-time-programmable (OTP) memory may include a capacitor formed by a conductive layer, an oxide layer, and a semiconductor well, and a diode that is formed after programing the device. The device may be programmable by applying a voltage between the conductive layer and the semiconductor well. The applied voltage may be capable of rupturing the oxide layer at one or more points. The conductive layer, the oxide layer, and the semiconductor well may be native CMOS process formations.
1. A device for one-time-programmable (OTP) memory, the device comprising:
a capacitor formed by a conductive layer, an oxide layer, and a semiconductor well; and
a diode that is formed after programing the device,
wherein the device is programmable without using a select transistor by applying a voltage, between the conductive layer and the semiconductor well, that is capable of rupturing, at least at one point, the oxide layer, and wherein the conductive layer, the oxide layer, and the semiconductor well are native CMOS process formations.
2. The device of claim 1 , wherein the device is compatible with advanced technology nodes including FinFet technology, and wherein the formed diode comprises a schottky diode formed between the conductive layer and single crystalline silicon.
3. The device of claim 1 , wherein a programmed device is readable without using a select device when used in a cross-point OTP array.
4. The device of claim 1 , wherein conductive layer comprises a P-metal or an N-metal, and wherein the semiconductor well comprises an N-well or a P-well.
5. The device of claim 1 , wherein the device is formed with no special design-rule checking (DRC) rules.
6. The device of claim 1 , wherein conductive layer comprises an N-metal, and wherein the semiconductor well comprises a P-well embedded in a deep N-well.
7. The device of claim 1 , wherein conductive layer comprises a P-metal, and wherein the semiconductor well comprises an N-well that is formed on a buried oxide layer.
8. A programmable diode array, comprising:
a plurality of memory cells;
a plurality of row lines; and
a plurality of column lines,
wherein:
each memory cell of the plurality of memory cells comprises a capacitor formed by a conductive layer, an oxide layer, and a semiconductor well and a diode that is formed after programing a memory cell, and
the memory cell is programmable without using a select transistor by applying a voltage, between the conductive layer and the semiconductor well, that is capable of rupturing, at least at one point, the oxide layer, wherein each of the plurality of row lines is formed by coupling contacts incorporated into the semiconductor well, and wherein each column of the plurality of column lines is formed by coupling the conductive layers associated with a number of memory cells.
9. The programmable diode array of claim 8 , wherein each memory cell of the plurality of memory cells is configured to be selectable for programing by applying a first voltage to a corresponding row and a second voltage to a corresponding column associated with that memory cell, wherein the semiconductor well comprises an N-well and the first and the second voltages comprise a low voltage and a program-high voltage, respectively.
10. The programmable diode array of claim 8 , wherein each memory cell of the plurality of memory cells is configured to be selectable for reading by applying a first voltage to a corresponding row and a second voltage to a corresponding column associated with that memory cell, wherein the semiconductor well comprises an N-well and the first and the second voltages comprise a low voltage and a read-high voltage, respectively.
11. A method for providing one-time-programmable (OTP) memory, the method comprising:
providing a device by forming a capacitor by employing a conductive layer, an oxide layer, and a semiconductor well; and
programming the device to form a diode by applying a voltage, between the conductive layer and the semiconductor well, that is capable of rupturing, at least at one point, the oxide layer,
wherein programming the device is performed without using a select transistor.
12. The method of claim 11 , wherein providing the device comprises providing a device that is compatible with advanced technology nodes including FinFet technology, and wherein the formed diode comprises a schottky diode formed between the conductive layer and single crystalline silicon.
13. The method of claim 11 , further comprising reading the programmed device, when used in a cross-point OTP array, without using a select device.
14. The method of claim 11 , wherein employing the conductive layer comprises employing a P-metal or an N-metal, and wherein employing the semiconductor well comprises employing an N-well or a P-well.
15. The method of claim 11 , wherein providing the device is achieved without special design-rule checking (DRC) rules.
16. The method of claim 11 , wherein conductive layer comprises an N-metal, and wherein the employing semiconductor well comprises employing a P-well embedded in a deep N-well.
17. The method of claim 11 , wherein employing the conductive layer comprises employing a P-metal, and wherein employing the semiconductor well comprises forming an N-well on a buried oxide layer.
18. A method for providing a programmable diode array, comprising:
providing a plurality of memory cells, wherein each memory cell of the plurality of memory cells comprises a capacitor formed by a conductive layer, an oxide layer, and a semiconductor well;
forming a diode through programing each memory cell by applying a voltage, between the conductive layer and the semiconductor well, that is capable of rupturing, at least at one point, the oxide layer, wherein programming each memory cell is performed without a select transistor;
forming a plurality of row lines, wherein each of the plurality of row lines is formed by coupling contacts incorporated into the semiconductor well; and
forming a plurality of column lines, wherein each column of the plurality of column lines is formed by coupling the conductive layers associated with a number of memory cells.
19. The method of claim 18 , further comprising configuring each memory cell of the plurality of memory cells to be selectable for programing by applying a first voltage to a corresponding row line and a second voltage to a corresponding column line associated with that memory cell, wherein the semiconductor well comprises an N-well and the first and the second voltages comprise a low voltage and a program-high voltage, respectively.
20. The method of claim 18 , further comprising configuring each memory cell of the plurality of memory cells to be selectable for reading by applying a first voltage to a corresponding row line and a second voltage to a corresponding column line associated with that memory cell, wherein the semiconductor well comprises an N-well and the first and the second voltages comprise a low voltage and a read-high voltage, respectively.