Process for making PMR writer with non-conformal side gaps
View Patent ↗A process for manufacturing a PMR writer main pole with non-conformal side gaps is provided. The process may include depositing a stitch layer comprising a magnetic material and a second stitch layer material over a substrate, forming an air-bearing surface (ABS) region in a first damascene material, and forming a yoke region in a second damascene material. The first damascene material may include Aluminum Oxide (Al2O3). The second damascene material may include Silicon Dioxide (SiO2). Side gap regions may include SiO2.
1. A method for manufacturing a perpendicular magnetic recording (PMR) writer main pole with non-conformal side gaps, comprising:
depositing a stitch layer comprising a magnetic material and a second stitch layer material over a substrate;
forming an air-bearing surface (ABS) region in a first damascene material;
forming a yoke region in a second damascene material comprising a different material than the first damascene material;
wet etching the first damascene material to remove the first damascene material in a side shield region; and
plating the side shield regions to form side shields;
wherein the first damascene material comprises Aluminium Oxide (Al 2 O 3 ) and the second damascene material comprises Silicon Dioxide (SiO 2 );
wherein the non-conformal side gap comprises SiO 2 and increases with the side shield throat height.
2. The method of claim 1 , further comprising wet etching the magnetic material to remove it in a side shield region.
3. The method of claim 2 , wherein the yoke region is between 100 nm and 600 nm behind the ABS.
4. The method of claim 1 , wherein the magnetic material comprises Nickel-Iron (NiFe) and the second stitch layer material comprises Ruthenium (Ru).
5. The method of claim 1 , wherein the ABS region and yoke region are formed by performing a reactive ion etch (RIE) on the Aluminium Dioxide (AL 2 O 3 ) and Silicon-Dioxide (SiO2).
6. The method of claim 1 , wherein the side gap varies in width between 10 nm and 80 nm from the ABS region to the yoke region.
7. A PMR writer main pole created by a process, the process comprising:
depositing a stitch layer comprising a magnetic material and a second stitch layer material over a substrate;
forming an air-bearing surface (ABS) region in a first damascene material;
forming a yoke region in a second damascene material;
wet etching the first damascene material to remove the first damascene material in a side shield region; and
plating the side shield regions to form side shields;
wherein the writer main pole has non-conformal side gaps;
wherein the first damascene material comprises Aluminium Oxide (Al 2 O 3 ) and the second damascene material comprises Silicon Dioxide (SiO 2 );
wherein the non-conformal side gap comprises SiO 2 and increases with the side shield throat height.
8. The PMR writer main pole of claim 7 , the process further comprising wet etching the magnetic material to remove it in a side shield region.
9. The PMR writer main pole of claim 8 , wherein the yoke region is between 100 nm and 600 nm behind the ABS.
10. The PMR writer main pole of claim 7 , wherein the magnetic material comprises Nickel-Iron (NiFe) and the second stitch layer material comprises Ruthenium (Ru).
11. The PMR writer main pole of claim 7 , wherein the ABS region and yoke region are formed by performing a reactive ion etch (RIE) on the Alumina (AL 2 O 3 ).
12. The PMR writer main pole of claim 7 , wherein the side gap varies in width between 10 nm and 80 nm from the ABS region to the yoke region.