Titanium nano-scale etching on an implant surface
View Patent ↗A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises the act of immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution to produce a nanoscale roughened surface consisting of nanopitting superimposed on the microscale roughened surface. The nanoscale roughened surface has a property that promotes osseointegration.
1. A method of forming an implant to be implanted into living bone, the method comprising the acts of:
roughening at least a portion of the implant surface to produce a first topography;
further roughening the implant surface to produce a second topography superimposed on the first topography; and
providing a nanoscale topography superimposed on the first and second topographies.
2. The method of claim 1 , wherein the implant is made of a metal selected from the group consisting of tantalum, cobalt, chromium, titanium, stainless steel, or alloys thereof.
3. The method of claim 1 , wherein the implant is a dental implant.
4. The method of claim 3 , wherein the portion of the implant surface is a threaded bottom portion for facilitating bonding with bone.
5. The method of claim 1 , wherein the act of roughening the implant surface to produce the first topography comprises grit blasting the surface.
6. The method of claim 5 , wherein the first topography includes peak-to-valley irregularity distances of about 10 microns to about 30 microns.
7. The method of claim 1 , wherein the implant is made of titanium and the act of roughening the implant surface to produce the second topography comprises:
removing a native oxide layer from the implant surface; and
acid etching the resulting surface.
8. The method of claim 7 , wherein the act of acid etching the surface includes using a solution including sulfuric acid and hydrochloric acid.
9. The method of claim 7 , wherein the second topography includes peak-to-valley heights of less than about 10 microns and peak-to-peak distances of less than about 3 microns.
10. The method of claim 1 , wherein the act of providing a nanoscale topography includes immersing the implant in a solution including a basic solution to produce a nanoscale roughened surface including nanopitting.
11. The method of claim 10 , wherein the solution further comprises hydrogen peroxide.
12. The method of claim 10 , wherein the basic solution is a sodium hydroxide solution.
13. The method of claim 10 , wherein the basic solution is a potassium hydroxide solution.
14. The method of claim 13 , wherein the potassium hydroxide solution has a concentration of about 3-5% w/w and the hydrogen peroxide has a concentration of about 13-22% w/w.
15. The method of claim 13 , wherein the potassium hydroxide solution has a concentration of about 1-6% w/w and the hydrogen peroxide has a concentration of about 1-6% w/w.
16. The method of claim 10 , wherein the basic solution has a pH between about 7 to about 14.
17. The method of claim 10 , wherein the nanopitting is in the range of about 1-100 nanometers.
18. The method of claim 10 , further comprising the acts of:
rinsing the nanoscale roughened surface in deionized water;
passivating the nanoscale roughened surface with nitric acid;
re-rinsing the nanoscale roughened surface in deionized water; and
drying the nanoscale roughened surface.
19. The method of claim 1 , wherein the act of providing a nanoscale topography includes the act of depositing discrete nanoparticles on the first and second topographies.
20. The method of claim 1 , further comprising the act of applying a sodium lactate coating on the nanoscale topography.
21. A method of forming an implant to be implanted into living bone, the method comprising the acts of:
grit blasting at least the portion of the implant surface to produce a first roughened surface including peak-to-valley heights of about 10 microns to about 30 microns;
acid etching the grit blasted surface to produce a second roughened surface having peak-to-valley heights of less than about 10 microns superimposed on the first roughened surface; and
providing a nanoscale topography superimposed on the second roughened surface.
22. The method of claim 21 , wherein the acid etching includes etching the implant surface with a solution including sulfuric acid and hydrochloric acid.
23. The method of claim 21 , wherein the implant is made of a metal selected from the group consisting of tantalum, cobalt, chromium, titanium, stainless steel, or alloys thereof.
24. The method of claim 21 , wherein the implant is a dental implant.
25. The method of claim 21 , wherein the act of providing a nanoscale topography includes immersing the implant in a solution including hydrogen peroxide and a basic solution to produce a nanoscale roughened surface including nanopitting.
26. The method of claim 25 , wherein the solution further comprises hydrogen peroxide.
27. The method of claim 25 , wherein the basic solution is a sodium hydroxide solution.
28. The method of claim 25 , wherein the basic solution is a potassium hydroxide solution having a concentration of about 3-5% w/w and the hydrogen peroxide has a concentration of about 13-22% w/w.
29. The method of claim 25 , wherein the basic solution is a potassium hydroxide solution having a concentration of about 1-6% w/w and the hydrogen peroxide has a concentration of about 1-6% w/w.
30. The method of claim 21 , wherein the act of providing a nanoscale topography includes depositing discrete nanoparticles on the second roughened surface.
31. The method of claim 21 , further comprising the act of applying a sodium lactate coating on the nanoscale topography.