Ion implantation-assisted etch-back process for improving spacer shape and spacer width control
View Patent ↗Disclosed herein is a semiconductor device including a first dielectric disposed over a channel region of a transistor formed in a substrate and a gate disposed over the first dielectric. The semiconductor device further includes a second dielectric disposed vertically, substantially perpendicular to the substrate, at an edge of the gate, and a spacer disposed proximate to the second dielectric. The spacer includes a cross-section with a perimeter that includes a top curved portion and a vertical portion that is substantially perpendicular to the substrate. Further, disclosed herein, are methods associated with the fabrication of the aforementioned semiconductor device.
1. A method of fabricating a semiconductor device, comprising:
disposing a dielectric layer of material on a substrate, the dielectric layer of material conformal to features patterned on the substrate;
disposing a layer of material over the dielectric layer of material;
implanting dopants into the layer of material using a substantially 0-degree tilt ion implantation step to create a doped portion of the layer of material which overlays at least an undoped portion of the layer of material; and
etching the layer of material to form one or more spacers, wherein etching removes at least an entirety of the doped portion which overlays the undoped portion, wherein the one or more spacers are disposed proximate to sidewalls of the features patterned on the substrate.
2. The method of claim 1 , wherein disposing the layer of material comprises disposing polycrystalline silicon.
3. The method of claim 1 , wherein implanting the dopants comprises using n-type dopants.
4. The method of claim 1 , wherein implanting the dopants comprises adjusting an energy or dosage of dopant ions to control a thickness of the doped portion.
5. The method of claim 4 , wherein the thickness of the doped portion is substantially equal to a thickness of the layer of material.
6. A method of fabricating a semiconductor device, comprising:
disposing a gate structure on a substrate, the gate structure comprising: a gate, a first dielectric disposed beneath the gate, and a second dielectric at least on sidewalls of the gate and over the gate;
disposing a layer of material over the second dielectric;
implanting dopants into the layer of material using a substantially 0-degree tilt ion implantation step, to create a doped portion of the layer of material which overlays at least an undoped portion of the layer of material; and
etching the layer of material to form one or more spacers, wherein etching removes at least an entirety of the doped portion which overlays the undoped portion, and wherein the one or more spacers are disposed proximate to the sidewalls of the gate.
7. The method of claim 6 , wherein disposing the layer of material comprises disposing polycrystalline silicon.
8. The method of claim 6 , wherein implanting the dopants comprises using n-type dopants.
9. The method of claim 6 , wherein implanting the dopants comprises adjusting an energy or dosage of dopant ions to control a thickness of the doped portion.
10. The method of claim 6 , wherein disposing the gate structure, comprises disposing the first dielectric by sequentially depositing oxide, nitride, and oxide (ONO) layers.
11. The method of claim 6 , wherein disposing the gate structure, comprises disposing the second dielectric by sequentially depositing oxide, nitride, and oxide (ONO) layers.
12. The method of claim 1 , wherein implanting the dopants comprises adjusting a doping concentration to control an etch rate of the doped portion.
13. The method of claim 1 , further comprising annealing the semiconductor device, wherein annealing comprises adjusting an annealing temperature to control a concentration of activated dopants in the doped portion, wherein an increase in the concentration of activated dopants increases an etch rate of the doped portion.
14. The method of claim 1 , wherein the doped portion has a greater etch rate than the undoped portion.
15. The method of claim 6 , wherein implanting dopants comprises adjusting a doping concentration to control an etch rate of doped portion.
16. The method of claim 6 , further comprising annealing the semiconductor device, wherein annealing comprises adjusting an annealing temperature to control a concentration of activated dopants in the doped portion, wherein an increase in the concentration of activated dopants increases an etch rate of the doped portion.
17. The method of claim 6 , wherein the doped portion has a faster etch rate than the undoped portion.