Compound of phosphor and the manufacturing method thereof

1. A metal oxonitridosilicate phosphor of a general formula M 5−z−a−b Al 3+x Si 23−x N 37−x−2a O x+2a :Eu z ,Mn b ,

wherein M is one or more alkaline earth metals; 0≦x≦7; 0≦a≦1; 0<z≦0.3; and 0<b≦0.3, and

wherein the metal oxonitridosilicate phosphor is configured to emit a light with a CIEx between 0.2753 and 0.2917 and a CIEy between 0.5103 and 0.5203.

2. The metal oxonitridosilicate phosphor according to claim 1 , wherein M 5−z−a−b Al 3+x Si 23−x N 37−x−2a O x+2a in the general formula is a host lattice, Eu is a first active center and Mn is a second active center.

3. The metal oxonitridosilicate phosphor according to claim 1 , emitting a fluorescence with a wavelength ranging from 480 nm to 700 nm when excited by a light source with a wavelength ranging from 300 nm to 460 nm.

4. The metal oxonitridosilicate phosphor according to claim 3 , wherein the light source with the wavelength ranging from 300 nm to 460 nm is from a light-emitting diode or plasma.

5. The metal oxonitridosilicate phosphor according to claim 3 , emitting a green fluorescence when excited by the light source with the wavelength ranging from 300 nm to 460 nm.

6. A manufacturing method of the metal oxonitridosilicate phosphor according to claim 1 , comprising the steps of:

mixing a first reactant comprising a material selected from the group consisting of strontium oxide and strontium nitride, a second reactant comprising Al, a third reactant comprising Si, a fourth reactant comprising Eu, and a fifth reactant comprising Mn to form a mixture; and

forming the mixture into a metal oxonitridosilicate phosphor with a general formula M 5−z−a−b Al 3+x Si 23−x N 37−x−2a O x+2a :Eu z ,Mn b by solid-state reaction at a pressure ranging from 0.5 MPa to 1.5 MPa, wherein 0≦x≦7; 0≦a≦1; 0<z≦0.3; and 0<b≦0.3, and the phosphor emits a fluorescence with a wavelength ranging from 480 nm to 700 nm when excited by a light source with a wavelength ranging from 300 nm to 460 nm.

7. The manufacturing method of a metal oxonitridosilicate phosphor according to claim 6 , wherein M 5−z−a−b Al 3+x Si 23−x N 37−x−2a O x+2a in the general formula is a host lattice, Eu is a first active center and Mn is a second active center.

8. The manufacturing method of a metal oxonitridosilicate phosphor according to claim 6 , wherein the second reactant comprising Al, the third reactant comprising Si, the fourth reactant comprising Eu, and the fifth reactant comprising Mn respectively comprise a material selected from the group consisting of oxides and nitrides.

9. The manufacturing method of a metal oxonitridosilicate phosphor according to claim 6 , wherein forming the mixture into a metal oxonitridosilicate phosphor by solid-state reaction at high pressure comprises forming the mixture into a metal oxonitridosilicate phosphor under nitrogen atmosphere, at a temperature ranging from 1700° C. to 2300° C. for 3 to 8 hours.

10. The manufacturing method of a metal oxonitridosilicate phosphor according to claim 6 , further comprising grinding the mixture after forming the mixture into the metal oxonitridosilicate phosphor by solid-state reaction.

11. The metal oxonitridosilicate phosphor according to claim 1 , wherein z>b.