IP Library Granted Patent US 9,153,525
Granted Patent B2
US 9,153,525 · App. 14/073,059 · Granted Oct 6, 2015

Semiconductor device

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Quick Facts
Patent No.
US 9,153,525
App. No.
14/073,059
Granted
Oct 6, 2015
Kind
B2
Abstract

A semiconductor device includes: a semiconductor element that includes an electrode layer on a surface of the semiconductor element; a low-strength layer that is provided on a surface of the electrode layer; a bonding layer that is provided on a surface of the low-strength layer; and a conductive plate that is provided on a surface of the bonding layer. Strength of the bonding layer is higher than strength of the electrode layer, and strength of the low-strength layer is lower than the strength of the electrode layer.

Claims (10)

1. A semiconductor device comprising:

a semiconductor element that includes an electrode layer on a surface of the semiconductor element;

a first low-strength layer that is directly provided on a surface of the electrode layer;

a first bonding layer that is provided on a surface of the first low-strength layer; and

a conductive plate that is provided on a surface of the first bonding layer,

a second low-strength that is on bottom side of the semiconductor element; and

a second bonding layer that is on the bottom side of the semiconductor element,

wherein strength against stress acting upon the first bonding layer is higher than strength against stress acting upon the electrode layer, and strength against stress acting upon the first low-strength layer is lower than the strength against stress acting upon the electrode layer.

2. The semiconductor device according to claim 1 ,

wherein the electrode layer is made of AlSi, and the first low-strength layer is made of Al.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 1, 2020
From: TOYOTA JIDOSHA KABUSHIKI KAISHA
To: DENSO CORPORATION
Reel/Frame 052285/0419 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2013
From: TANAKA, TORU
To: TOYOTA JIDOSHA KABUSHIKI KAISHA
Reel/Frame 031655/0143 →