Method of forming resist pattern
View Patent ↗A method of forming a resist pattern using a resist composition containing a base component (A) which exhibits reduced solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, the base component (A) including a resin component (A1) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below and a structural unit (a2) containing a lactone-containing cyclic group or the like (in formula (a0-1), Ra 1 represents a monovalent substituent having a polymerizable group, La 1 represents O, S or a methylene group, R 1 represents a linear or branched hydrocarbon group of 2 to 20 carbon atoms which may have a substituent, or a cyclic hydrocarbon group which may have a hetero atom, and n represents an integer of 0 to 5).
1. A method of forming a resist pattern, comprising:
forming a resist film on a substrate using a resist composition comprising a base component (A) which exhibits reduced solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure;
selectively exposing the resist film; and
patterning the resist film by development using a developing solution comprising an organic solvent, so as to remove unexposed portions, thereby forming a negative-tone contact hole resist pattern,
the base component (A) comprising a resin component (A1) comprising a structural unit (a0) derived from a compound represented by general formula (a0-1-1) shown below and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group represented by any one of general formula (a2-r-1) to (a2-r-7) shown below, an —SO 2 —containing cyclic group represented by any one of general formula (a5-r-1) to (a5-r-4) shown below or a carbonate-containing cyclic group represented by any one of general formula (ax3-r-1) to (ax3-r-3) shown below, provided that the structural units that fall under the definition of structural unit (a0) are excluded:
wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; V 1 represents a divalent hydrocarbon group which may have an ether bond, an urethane bond or an amide bond; n 1 represents an integer of 0 to 2; La 1 represents an oxygen atom, a sulfur atom or a methylene group; R 1 represents a linear or branched hydrocarbon group of 2 to 20 carbon atoms which may have a substituent, or a cyclic hydrocarbon group which may have a hetero atom; and n represents an integer of 0 to 5, provided that R 1 is an acid decomposable group that exhibits increased polarity by the action of acid,
wherein “*” represents a valence bond; each Ra′ 21 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group; R″ represents a hydrogen atom or an alkyl group; A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; n′ represents an integer of 0 to 2; and m′ represents 0 or 1,
wherein “*” represents a valence bond; each Ra′ 51 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group; R″ represents a hydrogen atom or an alkyl group; A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; and n′ represents an integer of 0 to 2,
wherein “*” represents a valence bond; each Ra′ x31 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group; R″ represents a hydrogen atom or an alkyl group; A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; and q′ represents 0 or 1.
2. The method according to claim 1 , wherein the resin component (A1) further comprises a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid.
3. The method according to claim 1 , wherein the resin component (A1) further comprises a structural unit (a3) containing a polar group-containing aliphatic hydrocarbon group.
4. The method according to claim 1 , wherein R 1 represents an aliphatic cyclic hydrocarbon group which may have a hetero atom.
5. The method according to claim 1 , wherein R 1 is a group represented by general formula (a1-r-1) or (a1-r-2) shown below:
wherein Ra′ 1 and Ra′ 2 represents a hydrogen atom or an alkyl group; and Ra′ 3 represents a hydrocarbon group, provided that Ra′ 3 may be bonded to Ra′ 1 or Ra′ 2 ; and
wherein Ra′ 4 to Ra′ 6 each independently represents a hydrocarbon group, provided that Ra′ 5 and Ra′ 6 may be mutually bonded to form a ring.
6. The method according to claim 1 , wherein R 1 is a group represented by general formula (a1-r2-1) or (a1-r2-2) shown below:
wherein Ra′ 10 represents an alkyl group of 1 to 10 carbon atoms; Ra′ 11 is a group which forms an aliphatic cyclic group together with a carbon atom having Ra′ 10 bonded thereto; and Ra′ 12 to Ra′ 14 each independently represents a hydrocarbon group.
7. The method according to claim 6 , wherein R 1 is a group represented by general formula (a1-r2-1).
8. The method according to claim 1 , wherein the structural unit (a2) is a structural unit derived from an acrylate ester containing an —SO 2 — containing cyclic group.