Substrate treating apparatus

1. A substrate treating apparatus comprising:

an indexer section;

a treating section disposed adjacent the indexer section for treating substrates; and

an interface section disposed adjacent the treating section and adjacent an exposing machine provided separately from the apparatus;

the treating section including:

a first treating-section transport mechanism for transporting the substrates between the indexer section and the interface section;

a first treating unit to and from which the substrates are transported solely by the first treating-section transport mechanism;

a second treating-section transport mechanism for transporting the substrates between the indexer section and the interface section; and

a second treating unit to and from which the substrates are transported solely by the second treating-section transport mechanism;

the interface section including:

a first treating-section-side transport mechanism;

a second treating-section-side transport mechanism; and

an exposing-machine-side transport mechanism;

wherein the first treating-section-side transport mechanism is arranged to receive the substrates from the first treating-section transport mechanism, pass the substrates to the exposing-machine-side transport mechanism, receive the substrates from the exposing-machine-side transport mechanism and pass the substrates to the first treating-section transport mechanism without passing through the second treating-section-side transport mechanism;

the second treating-section-side transport mechanism is arranged to receive the substrates from the second treating-section transport mechanism, pass the substrates to the exposing-machine-side transport mechanism, receive the substrates from the exposing-machine-side transport mechanism and pass the substrates to the second treating-section transport mechanism without passing through the first treating-section-side transport mechanism, and

the exposing-machine-side transport mechanism is arranged to receive the substrates from the first and second treating-section-side transport mechanisms, transport the substrates to the exposing machine, receive the substrates after exposing treatment from the exposing machine, and pass the substrates to the first and second treating-section-side transport mechanisms;

the first and second treating-section transport mechanisms are arranged one over the other in a vertical direction;

the first and second treating-section-side transport mechanisms are arranged side by side in a horizontal direction;

the treating section is shaped rectangular in plan view;

the interface section is shaped rectangular in plan view;

the interface section is disposed rearward of the treating section;

the first and second treating-section-side transport mechanisms are juxtaposed along a front face of the interface section adjacent the treating section; and

the first treating-section-side transport mechanism is located in the same height position as the second treating-section-side transport mechanism.

2. The substrate treating apparatus according to claim 1 wherein

the interface section includes post-exposure baking units arranged in the interface section for heating the substrates after the exposing treatment;

the first treating-section-side transport mechanism transports the substrates to and from the post-exposure baking units without passing through the second treating-section-side transport mechanism;

the second treating-section-side transport mechanism transports the substrates to and from the post-exposure baking units without passing through the first treating-section-side transport mechanism; and

the post-exposure baking units adjoin the first and second treating-section-side transport mechanisms.

3. The substrate treating apparatus according to claim 2 wherein

the exposing-machine-side transport mechanism and the post-exposure baking units are arranged rearward of the first and second treating-section-side transport mechanisms;

the post-exposure baking units are arranged above or below the exposing-machine-side transport mechanism; and

the post-exposure baking units and the exposing-machine-side transport mechanism are arranged vertically in side view.

4. The substrate treating apparatus according to claim 2 wherein

the post-exposure baking units include:

first post-exposure baking units to and from which the substrates are transported solely by the first treating-section-side transport mechanism; and

second post-exposure baking units to and from which the substrates are transported solely by the second treating-section-side transport mechanism; and

wherein the first post-exposure baking units adjoin the first treating-section-side transport mechanism;

the second post-exposure baking units adjoin the second treating-section-side transport mechanism; and

the first post-exposure baking units are located in the same height position as the second post-exposure baking units.

5. The substrate treating apparatus according to claim 1 wherein

the interface section includes a cleaning portion disposed in the interface section for cleaning the substrates;

the first treating-section-side transport mechanism transports the substrates to and from the cleaning portion without passing through the second treating-section-side transport mechanism;

the second treating-section-side transport mechanism transports the substrates to and from the cleaning portion without passing through the first treating-section-side transport mechanism;

the first treating-section-side transport mechanism receives the substrates from the exposing-machine-side transport mechanism without passing through the cleaning portion;

the second treating-section-side transport mechanism receives the substrates from the exposing-machine-side transport mechanism without passing through the cleaning portion;

the exposing-machine-side transport mechanism passes the substrates to the first and second treating-section-side transport mechanisms without passing through the cleaning portion; and

the cleaning portion adjoins the first and second treating-section-side transport mechanisms.

6. The substrate treating apparatus according to claim 5 wherein the cleaning portion is disposed laterally of the first and second treating-section-side transport mechanisms.

7. The substrate treating apparatus according to claim 5 wherein

the cleaning portion includes:

pre-exposure cleaning units for cleaning the substrates before the exposing treatment; and

post-exposure cleaning units for cleaning the substrates after the exposing treatment; and

wherein the pre-exposure cleaning units and the post-exposure cleaning units are arranged vertically.

8. The substrate treating apparatus according to claim 5 wherein

the cleaning portion includes:

a first cleaning portion to and from which the substrates are transported solely by the first treating-section-side transport mechanism; and

a second cleaning portion to and from which the substrates are transported solely by the second treating-section-side transport mechanism; and

wherein the first cleaning portion, the first and second treating-section-side transport mechanisms and the second cleaning portion are juxtaposed in the stated order along a front face of the interface section.

9. The substrate treating apparatus according to claim 1 wherein

the interface section includes:

post-exposure baking units for heating the substrates after the exposing treatment; and

a cleaning portion for cleaning the substrates; and

wherein each of the first and second treating-section-side transport mechanisms transports the substrates to and from the post-exposure baking units and the cleaning portion;

the cleaning portion includes post-exposure cleaning units for cleaning the substrates after the exposing treatment; and

the post-exposure cleaning units are arranged in substantially the same height position as the post-exposure baking units.

10. The substrate treating apparatus according to claim 1 comprising:

treating-section-side receivers for allowing the first and second treating-section-side transport mechanisms to receive the substrates from the treating section and pass the substrates to the treating section;

wherein the treating-section-side receivers are arranged between the treating section and the interface section, and in positions substantially equidistant from the first and second treating-section-side transport mechanisms.

11. The substrate treating apparatus according to claim 1 wherein

the interface section includes intermediate receivers for allowing the first and second treating-section-side transport mechanisms and the exposing-machine-side transport mechanism to transfer the substrates between each other; and

the intermediate receivers are arranged in positions substantially equidistant from the first and second treating-section-side transport mechanisms.

12. The substrate treating apparatus according to claim 1 wherein

the interface section includes:

post-exposure baking units arranged in the interface section for heating the substrates after the exposing treatment; and

intermediate receivers arranged in the interface section for allowing the first and second treating-section-side transport mechanisms and the exposing-machine-side transport mechanism to transfer the substrates between each other;

the post-exposure baking units include:

first post-exposure baking units to and from which the substrates are transported solely by the first treating-section-side transport mechanism; and

second post-exposure baking units to and from which the substrates are transported solely by the second treating-section-side transport mechanism; and

wherein the first post-exposure baking units and the intermediate receivers are arranged around the first treating-section-side transport mechanism, so that the first treating-section-side transport mechanism, by rotating, can face the first post-exposure baking units and the intermediate receivers; and

the second post-exposure baking units and the intermediate receivers are arranged around the second treating-section-side transport mechanism, so that the second treating-section-side transport mechanism, by rotating, can face the second post-exposure baking units and the intermediate receivers.

13. The substrate treating apparatus according to claim 12 wherein:

the first post-exposure baking units are arranged rearward of the first treating-section-side transport mechanism; and

the second post-exposure baking units are arranged rearward of the second treating-section-side transport mechanism;

the intermediate receivers are arranged rearward of the first and second treating-section-side transport mechanisms;

both the first treating-section-side transport mechanism and the first post-exposure baking units are arranged on one side of a perpendicular bisector of a horizontal line segment extending between the first treating-section-side transport mechanism and the second treating-section-side transport mechanism in plan view;

both the second treating-section-side transport mechanism and the second post-exposure baking units are arranged on the other side of the perpendicular bisector in plan view; and

the intermediate receivers are arranged on the perpendicular bisector in plan view.

14. The substrate treating apparatus according to claim 12 wherein:

the interface section includes a cleaning portion disposed in the interface section for cleaning the substrates;

the cleaning portion includes:

a first cleaning portion to and from which the substrates are transported solely by the first treating-section-side transport mechanism; and

a second cleaning portion to and from which the substrates are transported solely by the second treating-section-side transport mechanism; and

wherein the first post-exposure baking units, the intermediate receivers and the first cleaning portion are arranged around the first treating-section-side transport mechanism, so that the first treating-section-side transport mechanism, by rotating, can face the first post-exposure baking units, the intermediate receivers and the first cleaning portion; and

the second post-exposure baking units, the intermediate receivers and the second cleaning portion are arranged around the second treating-section-side transport mechanism, so that the second treating-section-side transport mechanism, by rotating, can face the second post-exposure baking units, the intermediate receivers and the second cleaning portion.

15. The substrate treating apparatus according to claim 14 wherein:

the first post-exposure baking units are arranged rearward of the first treating-section-side transport mechanism; and

the second post-exposure baking units are arranged rearward of the second treating-section-side transport mechanism;

the intermediate receivers are arranged rearward of the first and second treating-section-side transport mechanisms;

the first cleaning portion is disposed laterally of the first treating-section-side transport mechanism;

the second cleaning portion is disposed laterally of the second treating-section-side transport mechanism;

the first treating-section-side transport mechanism, the first post-exposure baking units and the first cleaning portion are arranged on one side of a perpendicular bisector of a horizontal line segment extending between the first treating-section-side transport mechanism and the second treating-section-side transport mechanism in plan view;

the second treating-section-side transport mechanism, the second post-exposure baking units and the second cleaning portion are arranged on the other side of the perpendicular bisector in plan view; and

the intermediate receivers are arranged on the perpendicular bisector in plan view.

16. The substrate treating apparatus according to claim 14 wherein:

the first cleaning portion includes first post-exposure cleaning units for cleaning the substrates after the exposing treatment;

the second cleaning portion includes second post-exposure cleaning units for cleaning the substrates after the exposing treatment;

the first post-exposure cleaning units are arranged in the same height position as the first post-exposure baking units;

the first post-exposure baking units and the first post-exposure cleaning units are arranged adjacent each other circumferentially about the first treating-section-side transport mechanism;

the second post-exposure cleaning units are arranged in the same height position as the second post-exposure baking units; and

the second post-exposure baking units and the second post-exposure cleaning units are arranged adjacent each other circumferentially about the second treating-section-side transport mechanism.

17. The substrate treating apparatus according to claim 16 wherein:

the intermediate receivers are arranged forward of the exposing-machine-side transport mechanism;

the intermediate receivers are arranged in the same height position as the exposing-machine-side transport mechanism; and

the post-exposure baking units and the exposing-machine-side transport mechanism are arranged vertically in side view.

18. The substrate treating apparatus according to claim 1 wherein:

the interface section includes:

a cleaning portion disposed in the interface section for cleaning the substrates; and

intermediate receivers arranged in the interface section for allowing the first and second treating-section-side transport mechanisms and the exposing-machine-side transport mechanism to transfer the substrates between each other;

the cleaning portion includes:

a first cleaning portion to and from which the substrates are transported solely by the first treating-section-side transport mechanism; and

a second cleaning portion to and from which the substrates are transported solely by the second treating-section-side transport mechanism; and

wherein the first cleaning portion and the intermediate receivers are arranged around the first treating-section-side transport mechanism, so that the first treating-section-side transport mechanism, by rotating, can face the first cleaning portion and the intermediate receivers; and

the second cleaning portion and the intermediate receivers are arranged around the second treating-section-side transport mechanism, so that the second treating-section-side transport mechanism, by rotating, can face the second cleaning portion and the intermediate receivers.

19. The substrate treating apparatus according to claim 18 wherein:

the first cleaning portion is disposed laterally of the first treating-section-side transport mechanism; and

the second cleaning portion is disposed laterally of the second treating-section-side transport mechanism;

the intermediate receivers are arranged rearward of the first and second treating-section-side transport mechanisms;

both the first treating-section-side transport mechanism and the first cleaning portion are arranged on one side of a perpendicular bisector of a horizontal line segment extending between the first treating-section-side transport mechanism and the second treating-section-side transport mechanism in plan view;

both the second treating-section-side transport mechanism and the second cleaning portion are arranged on the other side of the perpendicular bisector in plan view; and

the intermediate receivers are arranged on the perpendicular bisector in plan view.