IP Library Granted Patent US 10,103,343
Granted Patent B2
US 10,103,343 · App. 14/109,637 · Granted Oct 16, 2018

Vertical organic transistor, circuit configuration and arrangement with vertical organic transistors and method of manufacturing

Inventors: Axel Fischer (Dresden, DE); Bjoern Luessem (Dresden, DE); Karl Leo (Dresden, DE)
Assignee: NOVALED GMBH
H01L51/057H01L27/283H01L51/0001H01L51/0026H01L51/0074
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Quick Facts
Patent No.
US 10,103,343
App. No.
14/109,637
Granted
Oct 16, 2018
Kind
B2
Abstract

The application relates to a vertical organic transistor having a layer structure on a substrate. The layer structure includes an electrode, a counter-electrode, and an electronically active layer arrangement which is disposed between the electrode and the counter-electrode. The application further relates to a method for fabricating a vertical organic transistor and a circuit arrangement.

Claims (31)

1. A vertical organic transistor comprising a layer structure on a substrate, said layer structure comprising:

an electrode,

a counter-electrode, and

an electronically active layer arrangement which is disposed between the electrode and the counter-electrode; wherein the electronically active layer arrangement comprises the following layers:

a middle electrode which is designed to allow a passage of electric charge carriers injected by the electrode into the electronically active layer arrangement through the middle electrode so that during operation the injected electric charge carriers can be transported from the electrode through the electronically active layer arrangement to the counter-electrode,

a first organic layer of a first organic semiconductor material disposed between the middle electrode and the electrode,

a second organic layer of a second organic semiconductor material disposed between the middle electrode and the counter-electrode, and

one or more functional layers which in the electronically active layer arrangement, at least in sections, structure an active region in which during operation an operating current can flow between electrode and counter-electrode through the electronically active layer arrangement as well as a non-active region which is disposed outside the active region, wherein the surface area of each of the one or more functional layers is less than the surface area of the electronically active layer arrangement.

2. The transistor according to claim 1 , wherein an electrical operating current in the active region is at least three orders of magnitude greater than a fault current in the non-active region.

3. The transistor according to claim 1 , wherein the one or more functional layers comprise an electrically insulating layer which extends at least in the non-active region.

4. The transistor according to claim 3 , wherein the electrically insulating layer is disposed adjacent to the middle electrode.

5. The transistor according to claim 3 , wherein the electrically insulating layer is disposed adjacent to the electrode or the counter-electrode.

6. The transistor according to claim 1 , wherein the one or more functional layers have a patterned injection layer which extends at least in the active region.

7. The transistor according to claim 6 , wherein the patterned injection layer comprises an electrically doped semiconductor material in which an electrical dopant is embedded in a matrix material.

8. The transistor according to claim 6 , wherein the patterning injection layer comprises a dopant layer region consisting of a doping material, wherein the doping material is an electrical dopant for the first organic semiconductor material of the first organic layer, or an electrical dopant for the second organic semiconductor material of the second organic layer.

9. The transistor according to claim 1 , wherein the electronically active layer arrangement comprises a functional layer inhibiting charge carrier injection which extends at least in the non-active region.

10. The transistor according to claim 1 wherein at least one of the following layers is multilayered: the electrode, the counter-electrode, the first organic layer, the second organic layer, and the one or more functional layers.

11. The transistor according to claim 1 , wherein the middle electrode has one or more openings through which a touching contact can be formed between a region of the electronically active layer arrangement on one side of the middle electrode and a region of the electronically active layer arrangement on an opposite side of the middle electrode.

12. A circuit arrangement comprising one or a plurality of vertical organic transistors according to claim 1 .

13. An arrangement comprising a vertical organic transistor according to claim 1 and an organic device which is disposed as an additional layer structure on the vertical organic transistor and is functionally connected therewith.

14. A method for fabricating a vertical organic transistor in which a layer structure having the following layers is fabricated on a substrate:

an electrode,

a counter-electrode, and

an electronically active layer arrangement which is disposed between the electrode and the counter-electrode, wherein the electronically active layer arrangement comprises the following layers:

a middle electrode which is designed to allow a passage of electric charge carriers injected by the electrode into the electronically active layer arrangement through the middle electrode so that during operation the injected electric charge carriers can be transported from the electrode through the electronically active layer arrangement to the counter-electrode,

a first organic layer of a first organic semiconductor material disposed between the middle electrode and the electrode,

a second organic layer of a second organic semiconductor material disposed between the middle electrode and the counter-electrode, and

one or more functional layers which in the electronically active layer arrangement, at least in sections, structure an active region in which during operation an operating current can flow between electrode and counter-electrode through the electronically active layer arrangement as well as a non-active region which is disposed outside the active region, wherein the surface area of each of the one or more functional layers is less than the surface area of the electronically active layer arrangement.

15. The circuit arrangement according to claim 12 , wherein the circuit arrangement comprises an inverter.

16. The circuit arrangement according to claim 12 , wherein the circuit arrangement comprises a logic gate.

17. The circuit arrangement according to claim 16 , wherein the logic gate is an OR or NAND gate.

Assignments (3)
CHANGE OF NAME Recorded Oct 11, 2016
From: NOVALED AG
To: NOVALED GMBH
Reel/Frame 040315/0818 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 11, 2016
From: TECHNISCHE UNIVERSITÄT DRESDEN
To: NOVALED GMBH
Reel/Frame 039988/0210 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 2, 2014
From: FISCHER, AXEL; LUESSEM, BJOERN; LEO, KARL
To: NOVALED AG; TECHNISCHE UNIVERSITAET DRESDEN
Reel/Frame 032578/0182 →
Priority Claims (1)
DE 10 2012 112 796 · Dec 20, 2012 · national
Continuity (1)
Related Publication 20140284567A1 · Sep 25, 2014