DEVICES AND METHODS FOR PASSIVATING A FLEXIBLE SUBSTRATE IN A COATING PROCESS
An apparatus for passivating a coating of a flexible substrate includes a coating chamber for coating the flexible substrate, a chamber separation element, the chamber separation element being arranged for separating the coating chamber from a further chamber, a coating drum, the coating drum and the chamber separation element forming a gap, and a gas inlet, the gas inlet being arranged within the chamber separation element for supplying oxygen into the gap.
1 . Apparatus for passivating a coating at a flexible substrate, comprising:
a coating chamber for coating the flexible substrate;
a chamber separation element, the chamber separation element being arranged for separating the coating chamber from a further chamber; and
a coating drum, the coating drum and the chamber separation element forming a gap;
a gas inlet, the gas inlet being arranged within the chamber separation element for supplying oxygen into the gap.
2 . Apparatus of claim 1 , wherein the gas inlet is arranged within the chamber separation element closer to the coating chamber than to the further chamber.
3 . Apparatus of claim 1 , the gas inlet being arranged such that during operation stacked layers comprising a layer of a first material and an oxide layer of the reactively oxidized first material are formed on the flexible substrate.
4 . Apparatus of claim 1 , the coating chamber comprising a support for an evaporation source, the evaporation source providing vapor of the first material for coating the flexible substrate in a deposition region of the coating drum, the deposition region being arranged adjacent to the chamber separation element.
5 . Apparatus of claim 1 , comprising a further chamber separation element, the further chamber separation element being arranged between the coating chamber and the further chamber, wherein a further gas inlet is arranged within the further chamber separation element.
6 . Apparatus of claim 4 , the coating drum being arranged between the chamber separation element and the further chamber separation element, the coating drum and the further separation element forming a further gap.
7 . Apparatus of claim 1 , the gap length is at least ten times more than the gap width.
8 . Apparatus of claim 1 , the gas inlet being arranged at least five times nearer to the coating chamber than to the further chamber.
9 . Apparatus of claim 1 , the chamber separation element being formed as a bracket.
10 . Apparatus of claim 1 , the further chamber comprising a winding device for winding the flexible substrate.
11 . Apparatus of claim 1 , the flexible substrate being a web.
12 . A method for passivating a coating of a flexible substrate in an apparatus comprising a coating chamber for coating the flexible substrate; a chamber separation element, the chamber separation element being arranged for separating the coating chamber from a further chamber; a coating drum, the coating drum and the chamber separation element forming a gap; and a gas inlet, the gas inlet being arranged within the chamber separation element; comprising:
supplying oxygen through the as inlet into the gap.
13 . Method of claim 12 , further comprising the steps of
evaporating a first material from an evaporation source for coating the flexible substrate in a deposition region of the coating drum, the deposition region being arranged adjacent to the chamber separation element.
14 . Method of claim 12 , further comprising the steps of
determining the thickness of the formed oxide layer of reactively oxidized first material on the flexible substrate;
comparing the determined thickness with a default thickness; and
controlling the amount of oxygen supplied to the gas inlet.
15 . Method of claim 12 , the first material comprising aluminium.
16 . Method of claim 13 , further comprising the steps of
determining the thickness of the formed oxide layer of oxidized first material on the flexible substrate;
comparing the determined thickness with a default thickness; and
controlling the amount of oxygen supplied to the gas inlet.
17 . Apparatus of claim 2 , the gas inlet being arranged such that during operation stacked layers comprising a layer of a first material and an oxide layer of the reactively oxidized first material are formed on the flexible substrate.
18 . Apparatus of claim 2 , the coating chamber comprising a support for an evaporation source, the evaporation source providing vapor of the first material for coating the flexible substrate in a deposition region of the coating drum, the deposition region being arranged adjacent to the chamber separation element.
19 . Apparatus of claim 3 , the coating chamber comprising a support for an evaporation source, the evaporation source providing vapor of the first material for coating the flexible substrate in a deposition region of the coating drum, the deposition region being arranged adjacent to the chamber separation element.