Optoelectronic semiconductor component
View Patent ↗An optoelectronic semiconductor component includes at least one radiation-emitting semiconductor chip including a radiation-outcoupling face through which at least some of electromagnetic radiation generated in the semiconductor chip leaves the semiconductor chip; and at least one radiation-transmissive body arranged at least in places downstream of the semiconductor chip on its radiation-outcoupling face, which body is in at least indirect contact with the semiconductor chip, wherein the radiation-transmissive body is formed with at least one polymer or contains at least one polymer, and one monomer of the polymer is formed with at least one silazane.
1. An optoelectronic semiconductor component comprising:
at least one radiation-emitting semiconductor chip comprising a radiation-outcoupling face, through which at least some of electromagnetic radiation generated in the semiconductor chip leaves the semiconductor chip; and
at least one radiation-transmissive body arranged at least in places downstream of the semiconductor chip on its radiation-outcoupling face, which body is in at least indirect contact with the semiconductor chip, wherein
the radiation-transmissive body is a lamina or a foil,
at least one radiation-transmissive adhesion layer is arranged between the radiation-transmissive body and the radiation-outcoupling face,
the radiation-transmissive adhesion layer consists of a polysilazane,
the radiation-transmissive body is formed with at least one polymer or contains at least one polymer,
one monomer of the polymer is formed with at least one silazane,
at least one luminescence conversion material is introduced into the radiation-transmissive body, which absorbs electromagnetic radiation of one wavelengths range and reemits absorbed electromagnetic radiation in another wavelength range with larger wavelengths than wavelengths of the absorbed electromagnetic radiation, and
the radiation-transmissive adhesion layer is free of the luminescence conversion material and other foreign particles within the context of manufacturing tolerance.
2. The optoelectronic semiconductor component according to claim 1 , wherein the radiation-transmissive body comprises traces of physical and/or mechanical material removal.
3. The optoelectronic semiconductor component according to claim 1 , wherein the polymer is formed with at least one polysilazane or comprises at least one polysilazane.
4. The optoelectronic semiconductor component according to claim 1 , wherein the radiation-transmissive body comprises traces of material removal.
5. The optoelectronic semiconductor component according to claim 1 , wherein the radiation-transmissive body contains at least one solvent and/or at least one thixotroping agent.
6. The optoelectronic semiconductor component according to claim 1 , wherein the radiation-transmissive body and/or the adhesion layer exhibits a layer thickness (D 1 ) of at least 5 μm and at most 50 μm.
7. The optoelectronic semiconductor component according to claim 1 , wherein the polymer is formed with at least one polysilazane or comprises at least one polysilazane.
8. An optoelectronic semiconductor component comprising:
at least one radiation-emitting semiconductor chip comprising a radiation-outcoupling face, through which at least some of electromagnetic radiation generated in the semiconductor chip leaves the semiconductor chip; and
at least one radiation-transmissive body arranged at least in places downstream of the semiconductor chip on its radiation-outcoupling face, which body is in at least indirect contact with the semiconductor chip, wherein
the radiation-transmissive body comprises traces of physical and/or mechanical material removal,
the radiation-transmissive body is a lamina of self-supporting construction, at least one radiation-transmissive adhesion layer is arranged between the radiation-transmissive body and the radiation-outcoupling face having a layer thickness of at least 5 um and at most 50 um, the radiation-transmissive adhesion layer consists of a polysilazane,
the radiation-transmissive body is formed with at least one polymer or contains at least one polymer, and one monomer of the polymer is formed with at least one silazane,
the radiation-transmissive adhesion layer is in direct contact with the radiation-outcoupling face and the radiation-transmissive body,
the radiation-transmissive body does not cover side surfaces of the semiconductor chip extending obliquely to the radiation-outcoupling face,
the radiation-transmissive body does not exceed the at least one radiation-emitting semiconductor chip in a lateral direction parallel to the radiation-outcoupling face,
at least one luminescence conversion material is introduced into the radiation-transmissive body, which absorbs electromagnetic radiation of one wavelength range and reemits absorbed electromagnetic radiation in another wavelength range with larger wavelengths than wavelengths the radiation-transmissive adhesion layer is free of the luminescence conversion material and other foreign particles.