IP Library Patent Application 14128182
Patent Application
App. No. 14/128,182

STABILIZED NANOCRYSTALS

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Patent No.
US None
App. No.
14/128,182
Abstract

Fluorescent semiconductor nanocrystals and quantum dots having an inorganic coating on the outermost surface of the nanocrystal are described herein as well as methods for preparing and using such nanocrystals and quantum dots. Devices in which such nanocrystals and quantum dots are used are also described.

Claims (34)

1 . A nanoparticle comprising:

1 . a semiconductor nanocrystal defining an outermost surface; and

an inorganic coating substantially covering the outermost surface of the semiconductor nanocrystal, said inorganic coating comprising less than about 30% organic components.

2 . The nanoparticle of claim 1 , wherein the inorganic coating comprises silicon dioxide, silicon monoxide, silicon nitride, zirconium oxide, tantalum oxide, lanthanum oxide, cerium oxide, hafnium oxide, or a combination thereof.

3 . The nanoparticle of claim 1 , wherein the inorganic coating comprises silicon dioxide.

4 . The nanoparticle of claim 1 , wherein the inorganic coating directly contacts the outermost surface of the semiconductor nanocrystal.

5 . The nanoparticle of claim 1 , wherein the inorganic coating forms a passivation layer on the outermost surface of the semiconductor nanocrystal.

6 . The nanoparticle of claim 1 , wherein the inorganic coating is substantially free of organic components.

7 . The nanoparticle of claim 1 , wherein the inorganic coating comprises less than about 20% organic components.

8 . The nanoparticle of claim 1 , wherein the inorganic coating comprises less than about 10% organic components.

9 . The nanoparticle of claim 1 , wherein the inorganic coating comprises less than about 5% organic components.

10 . The nanoparticle of claim 1 , wherein the inorganic coating comprises less than about 1% organic components.

11 . The nanoparticle of claim 1 , wherein the semiconductor nanocrystal comprises a mean particle diameter of from about 1 nm to about 500 nm.

12 . The nanocrystal of claim 1 , wherein the semiconductor nanocrystal comprises a mean particle diameter of from about 1 nm to about 100 nm.

13 . The nanoparticle of claim 1 , wherein the semiconductor nanocrystal comprises a mean particle diameter of from about 5 nm to about 15 nm.

14 . The nanoparticle of claim 1 , wherein the semiconductor nanocrystal comprises a core nanocrystal.

15 . The nanoparticle of claim 1 , wherein the semiconductor nanocrystal comprises a core-shell nanocrystal.

16 . The nanoparticle of claim 1 , wherein the semiconductor nanocrystal comprises an alloy-gradient nanocrystal.

17 . The nanoparticle of claim 16 , wherein the alloy-gradient nanocrystal is homogenous.

18 . The nanoparticle of claim 16 , wherein the alloy-gradient nanocrystal is non-homogeneous.

19 . The nanoparticle of claim 16 , wherein the alloy-gradient nanocrystal comprises at least one Group II element and two or more different Group VI elements.

20 . The nanoparticle of claim 1 , further comprising at least one secondary inorganic passivation material.

21 . The nanoparticle of claim 20 , wherein the secondary inorganic passivation material comprises aluminum oxide (Al 2 O 3 ).

22 . A powder comprising a plurality of the nanoparticles of claim 1 .

23 . An optoelectronic device comprising at least one nanoparticle of claim 1 .

24 . An light emitting device (LED) comprising at least one nanoparticle of claim 1 .

25 . A method for preparing a nanoparticle comprising:

providing a suspension of nanocrystals in pyridine; and

adding an inorganic coating material to the suspension of nanocrystals in pyridine suspension.

26 . The method of claim 25 , wherein the inorganic coating comprises silicon dioxide, silicon monoxide, silicon nitride, zirconium oxide, tantalum oxide, lanthanum oxide, cerium oxide, hafnium oxide, or a combination thereof.

27 . The method of claim 25 , wherein the inorganic coating comprises silicon dioxide.

28 . The method of claim 25 , further comprising contacting the outermost surface of the semiconductor nanocrystal with the inorganic coating.

29 . The method of claim 25 , further comprising forming a passivation layer on the outermost surface of the semiconductor nanocrystal with the inorganic coating.

30 . The method of claim 25 , wherein the inorganic coating is substantially free of organic components.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 2, 2022
From: CRYSTALPLEX CORPORATION
To: TECTUS CORPORATION
Reel/Frame 060702/0462 →
CORRECTIVE ASSIGNMENT TO CORRECT THE APPLICATION NO 14725685 PREVIOUSLY RECORDED ON REEL 042010 FRAME 0858. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT. Recorded Jun 20, 2017
From: CRYSTALPLEX CORP
To: DAVIS, PATRICIA
Reel/Frame 043113/0083 →
SECURITY INTEREST Recorded Apr 14, 2017
From: CRYSTALPLEX CORP
To: DAVIS, PATRICIA
Reel/Frame 042010/0858 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 14, 2014
From: QU, LIANHUA; BOOTMAN, MATTHEW W.
To: CRYSTALPLEX CORPORATION
Reel/Frame 032438/0566 →