SUBSTRATE TREATING APPARATUS
A substrate treating apparatus for drying substrates with a solvent vapor after treating the substrates with a treating liquid. The apparatus includes a treating tank for storing the treating liquid, a holder for holding the substrates in the treating tank, a chamber enclosing the treating tank, a solvent vapor supply device for supplying the solvent vapor into the chamber, an exhaust device for exhausting gas from the chamber through an exhaust pipe connected at one end thereof to the chamber, a drain pipe connected at one end thereof to the chamber for draining the treating liquid from the chamber, a gas-liquid separator having the other end of the exhaust pipe connected thereto for receiving the gas exhausted by the exhaust device, and having the other end of the drain pipe connected thereto for receiving the treating liquid drained through the drain pipe, the gas-liquid separator separating the gas and the liquid, and a mixer mounted on the exhaust pipe for mixing deionized water into the gas exhausted by the exhaust device.
1 . A substrate treating apparatus for drying substrates with a solvent vapor after treating the substrates with a treating liquid, said apparatus comprising:
a treating tank for storing the treating liquid;
a holding device for holding the substrates in the treating tank;
a chamber enclosing the treating tank;
a solvent vapor supply device for supplying the solvent vapor into the chamber;
an exhaust device for exhausting gas from the chamber through an exhaust pipe connected at one end thereof to the chamber;
a drain pipe connected at one end thereof to the chamber for draining the treating liquid from the chamber;
a gas-liquid separating device having the other end of the exhaust pipe connected thereto for receiving the gas exhausted by the exhaust device, and having the other end of the drain pipe connected thereto for receiving the treating liquid drained through the drain pipe, the gas-liquid separating device separating the gas and the liquid; and
a mixing device mounted on the exhaust pipe for mixing deionized water into the gas exhausted by the exhaust device.
2 . The apparatus according to claim 1 , wherein the mixing device includes a static mixer for mixing the gas and the deionized water, and an injection portion for injecting the deionized water into an upstream position of the static mixer.
3 . The apparatus according to claim 2 , further comprising:
a solvent concentration measuring device for measuring a concentration of solvent in the gas-liquid separating device;
a control valve for adjusting a flow rate of the deionized water injected to the injection portion; and
a control device for controlling the control valve to increase the flow rate of the deionized water when the concentration of the solvent measured by the solvent concentration measuring device is high, and controlling the control valve to decrease the flow rate of the deionized water when the concentration of the solvent measured by the solvent concentration measuring device is low.
4 . The apparatus according to claim 1 , further comprising:
a discharge portion for discharging the gas through a discharge pipe from the gas-liquid separating device; and
a liquefying device mounted on the discharge pipe for liquefying the gas discharged from the discharge portion by compressing and cooling the gas.
5 . The apparatus according to claim 2 , further comprising:
a discharge portion for discharging the gas through a discharge pipe from the gas-liquid separating device; and
a liquefying device mounted on the discharge pipe for liquefying the gas discharged from the discharge portion by compressing and cooling the gas.
6 . The apparatus according to claim 3 , further comprising:
a discharge portion for discharging the gas through a discharge pipe from the gas-liquid separating device; and
a liquefying device mounted on the discharge pipe for liquefying the gas discharged from the discharge portion by compressing and cooling the gas.
7 . The apparatus according to claim 4 , wherein the liquefying device includes an orifice for narrowing a flow passage through the discharge pipe, and a cooling device for cooling the gas from peripheral surfaces of the orifice, wherein the solvent liquefied by the liquefying device is allowed to flow downstream of the orifice.
8 . The apparatus according to claim 5 , wherein the liquefying device includes an orifice for narrowing a flow passage through the discharge pipe, and a cooling device for cooling the gas from peripheral surfaces of the orifice, wherein the solvent liquefied by the liquefying device is allowed to flow downstream of the orifice.
9 . The apparatus according to claim 6 , wherein the liquefying device includes an orifice for narrowing a flow passage through the discharge pipe, and a cooling device for cooling the gas from peripheral surfaces of the orifice, wherein the solvent liquefied by the liquefying device is allowed to flow downstream of the orifice.
10 . The apparatus according to claim 4 , wherein the liquefying device includes a cooling device disposed in a flow passage through the discharge pipe, and a drain pipe disposed downstream of the cooling device, wherein the solvent liquefied by the liquefying device is allowed to flow down through the drain pipe.
11 . The apparatus according to claim 5 , wherein the liquefying device includes a cooling device disposed in a flow passage through the discharge pipe, and a drain pipe disposed downstream of the cooling device, wherein the solvent liquefied by the liquefying device is allowed to flow down through the drain pipe.
12 . The apparatus according to claim 6 , wherein the liquefying device includes a cooling device disposed in a flow passage through the discharge pipe, and a drain pipe disposed downstream of the cooling device, wherein the solvent liquefied by the liquefying device is allowed to flow down through the drain pipe.
13 - 20 . (canceled)