IP Library Patent Application 14150005
Patent Application
App. No. 14/150,005

FLUE GAS TREATMENT METHOD

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Quick Facts
Patent No.
US None
App. No.
14/150,005
Abstract

The present invention relates to a method and system for cleaning a process gas containing carbon dioxide and contaminants, by bringing the process gas into direct contact with an alkaline solution or slurry, and capturing in the alkaline solution or slurry at least a part of the contaminants of the process gas; and bringing the process gas, depleted in contaminants, into direct contact with a cooling liquid to form a cooled process gas; wherein said alkaline solution or slurry is separate from the cooling liquid.

Claims (25)

1 . A method of cleaning a process gas containing carbon dioxide and contaminants, said method comprising:

bringing the process gas into direct contact with an alkaline solution or slurry, and capturing in the alkaline solution or slurry at least a part of the contaminants of the process gas; and

bringing the process gas, depleted in contaminants, into direct contact with a cooling liquid to form a cooled process gas;

wherein said alkaline solution or slurry is separate from the cooling liquid.

2 . The method according to claim 1 , further comprising:

bringing the cooled process gas into direct contact with an ammoniated solution or slurry to remove, at least partly, carbon dioxide from the process gas, and to form a process gas containing ammonia; and

bringing the process gas containing ammonia into direct contact with a wash liquid to remove, at least partly, ammonia from the process gas.

3 . The method according to claim 1 , wherein the alkaline solution or slurry comprises NaOH or Ca(OH) 2 .

4 . The method according to claim 1 , wherein the alkaline solution or slurry has a pH-value of 8 or higher.

5 . The method according to claim 1 , wherein the step of bringing the process gas into direct contact with an alkaline solution or slurry is performed at a temperature above the dew point of the process gas.

6 . The method according to claim 1 , wherein the contaminants include sulfur dioxide, heavy metals and particulate material.

7 . The method according to claim 1 , wherein the process gas is generated by a cement production facility or a steel production facility.

8 . The method according to claim 1 , wherein the alkaline solution or slurry containing contaminants captured from the process gas is, at least partly, returned to the process in which the process gas was generated.

9 . The method according to claim 8 , wherein particulate material captured from the process gas or formed in the alkaline solution or slurry is, at least partly, separated from the alkaline solution or slurry.

10 . A gas cleaning system for cleaning a process gas containing carbon dioxide and contaminants, said gas cleaning system comprising:

an alkaline cleaning system comprising a gas-liquid contacting device operative for removing, at least partly, contaminants from the process gas, by bringing the process gas into direct contact with an alkaline solution or slurry, and capturing in the alkaline solution or slurry at least a part of the contaminants of the process gas; and

a cooling system comprising a gas-liquid contacting device operative for cooling the process gas depleted in contaminants by bringing the process gas depleted in contaminants into direct contact with a cooling liquid;

wherein said alkaline solution or slurry is separate from the cooling liquid.

11 . The gas cleaning system according to claim 10 , further comprising:

a CO 2 -absorber comprising a gas-liquid contacting device operative for removing, at least partly, carbon dioxide from the process gas by bringing cooled process gas into contact with an ammoniated solution absorbing at least a part of the carbon dioxide; and

an ammonia removal system comprising a gas-liquid contacting device operative for removing, at least partly, ammonia from the process gas, which has been treated in the CO 2 -absorber and which comprises ammonia, by bringing the process gas containing ammonia into direct contact with a wash liquid.

12 . The gas cleaning system according to claim 10 , wherein the contaminants include sulfur dioxide, heavy metals and particulate material.

13 . The gas cleaning system according to claim 10 , wherein said gas cleaning system is integrated with a cement production facility or a steel production facility.

14 . The gas cleaning system according to claim 10 , wherein the alkaline cleaning system is configured to return, at least partly, alkaline solution or slurry containing contaminants absorbed from the process gas to the process in which the process gas was generated.

15 . The gas cleaning system according to claim 14 , wherein said alkaline cleaning system further comprises a liquid/solid separator operative for separating, at least partly, solids formed in the alkaline solution or slurry from the solution.

Assignments (2)
CHANGE OF NAME Recorded Aug 17, 2016
From: ALSTOM TECHNOLOGY LTD
To: GENERAL ELECTRIC TECHNOLOGY GMBH
Reel/Frame 039714/0578 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 25, 2014
From: BALFE, MICHAEL CHARLES; KNIESBURGES, PETER
To: ALSTOM TECHNOLOGY LTD
Reel/Frame 032516/0009 →