Electric pulse generation systems using capacitive coupling
View Patent ↗In accordance with the present disclosure, exposure of a sample to one or more electric pulses via capacitive coupling is described. In certain embodiments, the sample may be a biological sample to be treated or modified using the pulsed electric fields. In certain embodiments, the electric pulses may be delivered to a load using capacitive coupling. In other embodiments, the electric pulses may be bipolar pulses.
1. An electric pulse generation system comprising:
a memory;
a display;
a user input device;
a sample holder comprising a first electrode and a second electrode disposed on opposite sides of the sample holder, wherein the sample holder is configured to receive a sample container;
pulse generating circuitry configured to supply a pulse to the first electrode and the second electrode;
a capacitive element disposed in series between the pulse generating circuitry and the first electrode; and
a processor configured to execute instructions stored on the memory to control the pulse generating circuitry, wherein the pulse generating circuitry is configured to capacitively couple to the sample container.
2. The electric pulse generation system of claim 1 , wherein the capacitive element comprises a capacitor disposed between the pulse generating circuitry and the first electrode.
3. The electric pulse generation system of claim 1 , wherein the capacitive element comprises a capacitor disposed between the first electrode and the sample holder.
4. The electric pulse generation system of claim 3 , wherein the capacitor is removable.
5. The electric pulse generation system of claim 1 , wherein the capacitive element comprises the sample container, when present, and wherein the sample container is made of a nonconductive material.
6. The electric pulse generation system of claim 1 , wherein the memory stores instructions that specify one or more characteristics of the pulse.
7. The electric pulse generation system of claim 1 , wherein the processor is configured to receive an input from the user input device that specifies one or more characteristics of the pulse.
8. The electric pulse generation system of claim 1 , wherein the pulse has a pulse duration between about 1 nanosecond and about 100 microseconds.
9. The electric pulse generation system of claim 1 , wherein the pulse has an electric field strength between 0.1 kV/cm and 350 kV/cm.
10. An electric pulse generation system comprising:
a memory;
a display;
a user input device;
a sample holder comprising a first electrode and a second electrode disposed on opposite sides of the sample holder, wherein the sample holder is configured to receive a sample container;
pulse generating circuitry configured to supply a pulse to the first and second electrodes;
a capacitive element disposed in series between the pulse generating circuitry and the first electrode, wherein the capacitive element may be removable or may be bypassed during operation; and
a processor configured to execute instructions stored on the memory to control the pulse generating circuitry, wherein the pulse generating circuitry may be directly or capacitively coupled to the sample.
11. The electric pulse generation system of claim 10 , wherein the capacitive element comprises a removable capacitor disposed between the first electrode and the sample container.
12. The electric pulse generation system of claim 10 , wherein the capacitive element comprises the sample container, when present, and wherein the sample container is made of a nonconductive material.
13. The electric pulse generation system of claim 10 , wherein the pulse generating circuitry comprises the capacitive element and circuitry coupled to the first and second electrodes allowing the pulse to bypass the capacitive element.
14. The electric pulse generation system of claim 13 , wherein the processor is configured to receive an input from the user input device to control the pulse generating circuitry to either allow the pulse to bypass the capacitive element or route the pulse through the capacitive element.
15. The electric pulse generation system of claim 10 , wherein the memory comprises instructions that specify one or more characteristics of the pulse.
16. The electric pulse generation system of claim 10 , wherein the processor is configured to receive an input from the user input device that specifies one or more characteristics of the pulse.
17. The electric pulse generation system of claim 10 , wherein the pulse has a pulse duration between about 1 nanosecond and about 100 microseconds.
18. The electric pulse generation system of claim 10 , wherein the pulse has an electric field strength between 0.1 kV/cm and 350 kV/cm.
19. An electric pulse generation system comprising:
a memory;
a display;
a user input device;
a sample holder comprising a first electrode and a second electrode disposed on opposite sides of the sample holder, wherein the sample holder is configured to receive a sample container;
pulse generating circuitry coupled to a capacitive element configured to supply a bipolar pulse using the capacitive element, wherein the bipolar pulse comprises a first pulse and a second pulse to the first and second electrodes,
wherein the first pulse has a pulse duration and a first electric field strength and the second pulse has the pulse duration and a second electric field strength, and wherein the first electric field strength and the second electric field strength are additive inverses; and
a processor configured to execute instruction stored on the memory to control the pulse generating circuitry.
20. The electric pulse generation system of claim 19 , wherein the memory stores instructions that specify one or more characteristics of the first and second pulses.
21. The electric pulse generation system of claim 19 , wherein the processor is configured to receive an input from the user input device that specifies one or more characteristics of the first and second pulses.
22. The electric pulse generation system of claim 19 wherein the pulse duration is between about 1 nanosecond and about 100 microseconds.
23. The electric pulse generation system of claim 19 , wherein the first or second pulse has an electric field strength between 0.1 kV/cm and 350 kV/cm.