Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus with substrate spreading device and method for operating same

1. A processing apparatus for processing a flexible substrate, comprising:

a vacuum chamber;

a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction;

a deposition or etch station adjacent the processing drum;

a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm; and

a substrate transport arrangement including one or more rollers, wherein the heating device is positioned between the processing drum and a roller of the one or more rollers, wherein the roller is a first roller to touch the substrate upstream or downstream of the processing drum.

2. The processing apparatus according to claim 1 , wherein the substrate transport arrangement guides the flexible substrate from an un-winding roller to a re-winding roller.

3. The processing apparatus according to claim 2 , wherein the substrate transport arrangement includes a spreader roller.

4. The processing apparatus according to claim 1 , wherein the substrate transport arrangement includes a spreader roller.

5. The processing apparatus according to claim 4 , wherein the first roller is the spreader roller.

6. The processing apparatus according to claim 1 , further comprising:

a heat adjustment unit, wherein the heat adjustment unit is positioned opposing a first side of the heating device, and wherein the heat adjustment unit and the heating device form a gap or a tunnel providing a path for the flexible substrate.

7. The processing apparatus according to claim 6 , wherein the heat adjustment unit is a further heating device, a heat reflector plate, or a combination thereof.

8. The processing apparatus according to claim 1 , wherein the heating device is at least one of an infrared heating device and an inductive heating device.

9. The processing apparatus according to claim 1 , wherein contact between the substrate transport arrangement and a backside of the substrate occurs only in the vacuum chamber.

10. The processing apparatus according to claim 1 , further comprising:

a cooling unit provided between the heating device and the first roller, wherein the cooling unit is configured to protect the first roller from heat radiation generated by the heating device.

11. The processing apparatus according to claim 1 , wherein a distance from the heating device to the processing drum is 20 cm or below.

12. The processing apparatus according to claim 1 , wherein a distance from the heating device to the processing drum is 10 cm or below.

13. The processing apparatus according to claim 1 , wherein a distance along a transport path of the flexible substrate from the first roller to the processing drum is 100 cm or below.

14. The processing apparatus according to claim 1 , wherein a distance along a transport path of the flexible substrate from the roller to the processing drum is 50 cm or below.

15. The processing apparatus for processing a flexible substrate of claim 1 , wherein the substrate transport arrangement guides the flexible substrate from a un-winding roller to a re-winding roller, wherein the first roller to touch the substrate is a spread roller.

16. The processing apparatus according to claim 15 , further comprising:

a heat adjustment unit, wherein the heat adjustment unit is positioned opposing a first side of the heating device, and wherein the heat adjustment unit and the heating device form a gap or a tunnel providing a path for the flexible substrate.