Pellicle for lithography, pellicle-mounted photomask, and exposure treatment method
View Patent ↗To provide a pellicle for lithography having a pellicle membrane excellent in light resistance against light with a wavelength of at most 250 nm, particularly at most 200 nm, a pellicle-mounted photomask using it, and an exposure treatment method. A pellicle for lithography having a multilayer pellicle membrane including a membrane made of a fluoropolymer (A) which contains, as the main component, repeating units obtained by cyclopolymerization of a pertluorodiene having one etheric oxygen atom, and a membrane made of a fluoropolymer (B) which has fluorinated alicyclic ring structures each containing, in the ring structure, two or three etheric oxygen atoms not being adjacent to one another, wherein the total thickness of the membrane made of the fluoropolymer (B) is at most 40% of the total thickness of the membrane made of the fluoropolymer (A).
1. A pellicle for lithography having a multilayer pellicle membrane including a membrane made of a fluoropolymer (A) which contains, as the main component, repeating units obtained by cyclopolymerization of a perfluorodiene having one etheric oxygen atom, and a membrane made of a fluoropolymer (B) which has fluorinated alicyclic ring structures each containing, in the ring structure, two or three etheric oxygen atoms not being adjacent to one another, wherein the total thickness of the membrane made of the fluoropolymer (B) is at most 40% of the total thickness of the membrane made of the fluoropolymer (A).
2. The pellicle for lithography according to claim 1 , wherein the multilayer pellicle membrane is a multilayer pellicle membrane having a membrane made of the fluoropolymer (B) laminated on one side or each side of the membrane made of the fluoropolymer (A).
3. The pellicle for lithography according to claim 1 , wherein the multilayer pellicle membrane has a two-layer structure having a membrane made of the fluoropolymer (B) laminated on one side of the membrane made of the fluoropolymer (A).
4. The pellicle for lithography according to claim 1 , wherein the multilayer pellicle membrane has a three-layer structure having a membrane made of the fluoropolymer (B) laminated on each side of the membrane made of the fluoropolymer (A).
5. The pellicle for lithography according to claim 1 , wherein the entire thickness of the multilayer pellicle membrane is from 0.101 to 14 μm.
6. The pellicle for lithography according to claim 1 , wherein the fluoropolymer (B) contains repeating units of at least one type selected from repeating units derived from a fluorinated compound represented by the following formula (b1) and repeating units derived from a fluorinated compound represented by the following formula (b2):
wherein W 1 is a fluorine atom, a C 1-3 perfluoroalkyl group or a C 1-3 perfluoroalkoxy group, each of W 2 and W 3 which are independent of each other, is a fluorine atom or a C 1-6 perfluoroalkyl group which may contain oxygen atoms, provided that W 2 and W 3 may be bonded to each other to form a ring structure, and each of W 4 and W 5 which are independent of each other, is a fluorine atom or a C 1-8 perfluoroalkyl group which may contain oxygen atoms, provided that W 4 and W 5 may be bonded to each other to form a ring structure.
7. The pellicle for lithography according to claim 1 , wherein the perfluorodiene is a fluorinated compound represented by the following formula (a1):
wherein W 6 is a fluorine atom or a C 1-3 perfluoroalkyl group, and n is 0 or 1.
8. A pellicle-mounted photomask which comprises a photomask and the pellicle for lithography as defined in claim 1 mounted on one side or each side of the photomask.
9. A pellicle-mounted photomask which comprises a photomask and the pellicle for lithography as defined in claim 1 mounted on one side or each side of the photomask so that the outermost layer on the incidence side of exposure light of the multilayer pellicle membrane is the membrane made of the fluoropolymer (B).
10. An exposure treatment method which comprises carrying out exposure treatment using a light source with an irradiation wavelength of at most 250 nm by means of the pellicle-mounted photomask as defined in claim 8 .