Method for fabricating a liquid crystal display device comprising an alignment film that includes polyamide acid ester with 80% or more of which is polyamide ester including cyclobutane
View Patent ↗A method for fabricating a liquid crystal display device having a TFT substrate in which an alignment film is formed over a pixel including a pixel electrode and a TFT, an opposing substrate which faces the TFT substrate, and liquid crystals sandwiched between the TFT substrate and the opposing substrate, the alignment film on the TFT substrate including a first and a second alignment film. The method includes depositing a mixture liquid of polyamide acid ester, 80 percent or more of which is polyamide acid ester including cyclobutane, and polyamide acid not including cyclobutane onto the TFT substrate and the opposing substrate, and after drying and firing the TFT substrate and the opposing substrate to harden the alignment film, irradiating the alignment film with ultraviolet light for photo-alignment of the alignment film and, thereafter, heating the TFT substrate and the opposing substrate, thereby forming the alignment film.
1. A method for fabricating a liquid crystal display device including a TFT substrate in which an alignment film is formed over a pixel including a pixel electrode and a TFT; an opposing substrate which faces the TFT substrate; and liquid crystals sandwiched between the TFT substrate and the opposing substrate;
wherein the alignment film on the TFT substrate includes a first alignment film adjoining a liquid crystal layer and a second alignment film formed underlying the first alignment film;
the method comprising the steps of:
depositing a mixture liquid of polyamide acid ester, 80 percent or more of which is polyamide acid ester including cyclobutane, and polyamide acid not including cyclobutane onto the TFT substrate and the opposing substrate; and
after drying and firing the TFT substrate and the opposing substrate to harden the alignment film, irradiating the alignment film with ultraviolet light for photo-alignment of the alignment film and, thereafter, heating the TFT substrate and the opposing substrate, thereby forming the alignment film.
2. The method for fabricating a liquid crystal display device according to claim 1 , wherein an irradiance level of the ultraviolet light is from 2000 to 5000 mJ/cm 2 , a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 230° C., and an interval after the ultraviolet light irradiation until heating the TFT substrate and the opposing substrate is within one hour.
3. The method for fabricating a liquid crystal display device according to claim 1 , wherein an irradiance level of the ultraviolet light is from 1000 to 7000 mJ/cm 2 , a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 200° C., and an interval after the ultraviolet light irradiation until heating the TFT substrate and the opposing substrate is within 24 hours.
4. The method for fabricating a liquid crystal display device according to claim 1 , wherein an irradiance level of the ultraviolet light is from 500 to 8000 mJ/cm 2 , a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 150° C., and an interval after the ultraviolet light irradiation until heating the TFT substrate and the opposing substrate is within 168 hours.
5. The method for fabricating a liquid crystal display device according to claim 1 , further comprising forming color filters on the opposing substrate.
6. The method for fabricating a liquid crystal display device according to claim 1 , further comprising forming an alignment film over the color filters on the opposing substrate,
wherein the alignment film in the opposing substrate includes a first alignment film adjoining a liquid crystal layer and a second alignment film formed underlying the first alignment film;
the method comprising the steps of:
depositing a mixture liquid of polyamide acid ester, 80 percent or more of which is polyamide acid ester including cyclobutane, and polyamide acid not including cyclobutane onto the TFT substrate and the opposing substrate;
after drying and firing the TFT substrate and the opposing substrate to harden the alignment film, irradiating the alignment film with ultraviolet light for photo-alignment of the alignment film and, thereafter, heating the TFT substrate and the opposing substrate, thereby forming the alignment film.