Non-toxic water-based frit slurry paste, and assembly incorporating the same
View Patent ↗Certain example embodiments of this invention relate to a frit slurry paste for use in assemblies (e.g., a vacuum insulated glass unit or a plasma display panel), and methods of making the same. Frit powder, binder material, and a water-based solvent are mixed together to form an intermediate mixture. The frit powder is substantially lead free, and the water-based solvent is provided at a first temperature. Additional water-based solvent is added to the intermediate mixture to form a frit slurry paste. The additional water-based solvent is provided at a second temperature, with the second temperature being lower than the first temperature. The binder material is provided at a concentration of 0.001%-20% by weight with respect to the frit slurry paste or the frit slurry paste absent the frit powder. The frit slurry paste has a bulk viscosity of 2,000-200,000 cps.
1. A frit slurry paste, comprising:
a water-based solvent;
a bismuth- or ceramic-based frit powder, the frit powder being substantially free from lead; and
a binder comprising methylcellulose at a concentration of 0.25%-5% by weight,
wherein the frit slurry paste has a bulk viscosity of 2,000-200,000 cps, and
wherein the frit slurry paste has annealing, softening, and working temperatures less than about 470 degrees C. with all lying within a range of about 120 degrees C. of each other.
2. The frit slurry paste of claim 1 , wherein the binder is provided at a concentration of 0.5-1.5% by weight.
3. The frit slurry paste of claim 2 , wherein the binder is methylcellulose 400 cps 2% aqueous solution.
4. The frit slurry paste of claim 1 , further comprising a surfactant.
5. The frit slurry paste of claim 1 , further comprising non-lead additives capable of absorbing 800-2000 nm infrared radiation.
6. The frit slurry paste of claim 1 , wherein the binder is substantially free from hydrocarbons.
7. The frit slurry paste of claim 1 , wherein the frit powder is a Bi 2 O 3 —B 2 O 3 inclusive system.