Methods and apparatus for use with extreme ultraviolet light having contamination protection
An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.
1. An apparatus for use in an extreme ultraviolet (EUV) mask inspection system or an EUV lithographic system, the apparatus having contamination protection and comprising:
a duct having a first end opening, a second end opening and an intermediate opening disposed intermediate the first end opening the second end opening;
an optical component disposed so as 1) to receive EUV light from the first end opening after the light has passed through the second end opening or 2) to send light through the first end opening to the second end opening; and
a source of low pressure gas at a first pressure, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening, the first end opening and the second end opening maintained at a lower pressure than the first pressure.
2. The apparatus of claim 1 , wherein one of the duct and the optical component are thermally coupled to a heat control unit, to maintain the duct at a lower temperature than the optical component.
3. The apparatus of claim 2 , wherein the duct is thermally coupled to the heat control unit, and the heat control unit is adapted to maintain the duct at a cooler temperature than the optical component.
4. The apparatus of claim 1 , wherein a first portion of the duct is thermally coupled to a heat control unit, to maintain a temperature gradient between the first portion of the duct and a second portion of the duct.
5. The apparatus of claim 1 , further comprising a gas permeable material disposed at the intermediate opening.
6. The apparatus of claim 1 , wherein the intermediate opening is disposed closer to the first end opening than the second end opening.
7. The apparatus of claim 1 , wherein the optical component comprises one of a mirror, a reticle, a sensor, a lens or a filter.
8. The apparatus of claim 1 , wherein the optical component is disposed remote from the first end opening.
9. The apparatus of claim 1 , wherein the low pressure gas has a transmission rate of greater than 70% for the EUV light.
10. The apparatus of claim 1 , wherein the first pressure is less than 0.01 atmospheres.
11. The apparatus of claim 1 , wherein the gas comprises molecular Hydrogen or Helium.
12. The apparatus of claim 1 , wherein the length of the duct is at least two times greater than the maximum width dimension of a duct cross section.
13. The apparatus of claim 1 , in a combination with at least one second duct having a second-duct first end opening, a second-duct second end opening and a second-duct intermediate opening,
the second-duct intermediate opening disposed intermediate the second-duct first end opening and the second-duct second end opening;
the optical component disposed so as 1) to receive light from the second-duct first end opening after the light has passed through the second-duct second end opening or 2) to send light through the second-duct first end opening to the second-duct second end opening; and
a second-duct source of low pressure gas at a second-duct first pressure, the second-duct gas having a high transmission of EUV light, fluidly coupled to the second-duct intermediate opening, the second-duct first end opening and the second-duct second end opening maintained at a lower pressure than the second-duct first pressure.
14. The apparatus of claim 13 , wherein the source of low pressure gas and the second-duct source of low pressure are the same source, and the gas and the second-duct gas are the same gas.
15. The apparatus of claim 1 , further comprising a voltage device adapted to generate a voltage between a first portion of the duct and a second portion of the duct with a grounded electrically-insulative portion therebetween.
16. An apparatus for use in an extreme ultraviolet (EUV) mask inspection system or an EUV lithographic system, the apparatus having contamination protection and comprising:
a duct having a first end opening, a second end opening and an intermediate opening disposed intermediate the first end opening the second end opening;
an optical component disposed so as 1) to receive light from the first end opening after the light has passed through the second end opening or 2) to send light through the first end opening to the second end opening; and
a heat control unit thermally coupled to the duct, the heat control unit being adapted to maintain the duct at a cooler temperature than the optical component.
17. The apparatus of claim 16 , wherein an average temperature gradient between the duct and the optical component is at least 10 degrees Celsius per centimeter.
18. An apparatus for use in an extreme ultraviolet (EUV) mask inspection system or an EUV lithographic system, the apparatus having contamination protection and comprising:
a duct having a first end opening, a second end opening and an intermediate opening disposed intermediate the first end opening the second end opening;
an optical component disposed so as 1) to receive light from the first end opening after the light has passed through the second end opening or 2) to send light through the first end opening to the second end opening; and
a heat control unit thermally coupled to the duct,
a first portion of the duct being thermally coupled to the heat control unit to maintain a temperature gradient between the first portion of the duct and a second portion of the duct.
19. The apparatus of claim 18 , wherein an average temperature gradient between the first portion and the second portion is at least 10 degrees Celsius per centimeter.
20. The apparatus of claim 18 , wherein the first portion and the second portion are disposed on opposing lateral sides of the duct.
21. An apparatus for use in an extreme ultraviolet (EUV) mask inspection system or an EUV lithographic system, the apparatus having contamination protection and comprising:
a duct having a first end opening, and a second end opening;
an optical component disposed so as 1) to receive light from the first end opening after the light has passed through the second end opening or 2) to send light through the first end opening to the second end opening; and
a voltage device adapted to generate a voltage between a first portion of the duct and a second portion of the duct with a grounded insulative portion therebetween.
22. A method of contamination protection for use in an extreme ultraviolet (EUV) mask inspection system or an EUV lithographic system, comprising:
flowing a low pressure gas at a first pressure in a duct having A) a first end opening and a second end opening and B) an intermediate opening disposed intermediate the first end opening and the second end opening, the gas flowing into the duct through the intermediate opening;
maintaining the first end opening and the second end opening at a lower pressure than the first pressure; and
projecting EUV light through the duct, the EUV light A) traveling from the first end opening then through the second end opening to an optical element or B) traveling from the optical component, then through the first end opening to the second end opening, the gas having a high transmission of EUV light.
23. The method of claim 22 , wherein the optical component comprises one of a mirror, a reticle, a sensor, a lens or a filter.
24. The method of claim 22 , wherein the optical component is disposed remote from the second end opening.
25. The method of claim 22 , wherein the low pressure gas has a transmission rate greater than 70% for the EUV light.
26. The method of claim 22 , wherein the first pressure is less than 0.01 atmospheres.
27. The method of claim 22 , wherein the gas comprises molecular Hydrogen or Helium.
28. A method of contamination protection for use in an extreme ultraviolet (EUV) mask inspection system or an EUV lithographic system, comprising:
maintaining a voltage difference between a first portion of a duct and a second portion of the duct with a grounded insulative portion disposed between the first portion and the second portion, the duct having A) a first end opening and a second end opening, the first portion and the second portion both being disposed between the first end opening and the second end opening; and
projecting EUV light through the duct, the EUV light 1) traveling from the first end opening then through the second end opening to an optical element or 2) traveling from the optical component, then through the first end opening to the second end opening.
29. The method of claim 28 , further comprising providing a gas in the duct, the gas having a high transmission of EUV light.