Liquid crystal display device
View Patent ↗In a liquid crystal display (LCD) device having a thin film transistor (TFT), the TFT includes a source electrode, a drain electrode and a semiconductor layer. At least one of the source electrode and drain electrode includes a first layer including copper and a second layer forming an oxide layer and covering the first layer. The semiconductor layer has a substantially linear current-voltage relationship with said source electrode or drain electrode including said first and second layers, when a voltage is applied between the semiconductor layer and said source electrode or drain electrode.
1. A transistor comprising:
a semiconductor layer;
a first electrode, wherein one or more first oxide layers are located between the semiconductor layer and the first electrode, wherein the first electrode comprises a copper-manganese alloy, and wherein the one or more first oxide layers comprise manganese oxide; and
a second electrode, wherein one or more second oxide layers are located between the semiconductor layer and the second electrode,
wherein the semiconductor layer is configured such that, in response to a voltage applied to the semiconductor layer, the semiconductor layer has a substantially linear current-voltage relationship with the first and second electrodes.
2. The transistor of claim 1 , wherein the one or more first oxide layers further comprise a silicon oxide layer on a surface of the semiconductor layer.
3. The transistor of claim 2 , wherein the one or more second oxide layers comprise the silicon oxide layer on the surface of the semiconductor layer.
4. The transistor of claim 2 , wherein the one or more first oxide layers further comprise a metallic oxide layer on a surface of the first electrode.
5. The transistor of claim 4 , wherein the metallic oxide layer is merged with at least a portion of the silicon oxide layer.
6. The transistor of claim 5 , wherein the merged metallic oxide layer and silicon oxide layer comprises copper and manganese diffused from the first electrode and silicon diffused from the semiconductor layer.
7. The transistor of claim 1 , wherein the semiconductor layer comprises an amorphous silicon layer doped with an impurity at a high concentration (n+a-Si layer) adjacent to the silicon oxide layer.
8. The transistor of claim 7 , wherein the semiconductor layer further comprises an amorphous silicon layer (a-Si layer) adjacent to the n+a-Si layer.
9. The transistor of claim 1 , wherein the manganese oxide of the one or more first oxide layers is formed from the copper-manganese alloy.
10. The transistor of claim 1 , wherein the one or more first oxide layers further comprise copper.
11. A method of forming a transistor comprising:
forming a semiconductor layer;
forming a first electrode on the semiconductor layer, wherein the first electrode comprises a copper-manganese alloy;
forming a second electrode on the semiconductor layer; and
heat treating the semiconductor layer, the first electrode, and the second electrode to form one or more first oxide layers between the semiconductor layer and the first electrode and to form one or more second oxide layers between the semiconductor layer and the second electrode, wherein the one or more first oxide layers comprise manganese oxide,
wherein the semiconductor layer is configured such that, in response to a voltage applied to the semiconductor layer, the semiconductor layer has a substantially linear current-voltage relationship with the first and second electrodes.
12. The method of claim 11 , wherein the one or more first oxide layers further comprise a silicon oxide layer on a surface of the semiconductor layer.
13. The method of claim 12 , wherein the one or more second oxide layers comprise the silicon oxide layer on the surface of the semiconductor layer.
14. The method of claim 12 , wherein the one or more first oxide layers further comprise a metallic oxide layer on a surface of the first electrode.
15. The method of claim 14 , wherein the metallic oxide layer is merged with at least a portion of the silicon oxide layer.
16. The method of claim 15 , wherein the merged metallic oxide and silicon oxide layer comprises copper and manganese diffused from the first electrode and silicon diffused from the semiconductor layer.
17. The method of claim 11 , wherein the semiconductor layer comprises an amorphous silicon layer doped with an impurity at a high concentration (n+a-Si layer) adjacent to the silicon oxide layer.
18. The method of claim 17 , wherein the semiconductor layer further comprises an amorphous silicon layer (a-Si layer) adjacent to the n+a-Si layer.
19. The method of claim 11 , wherein the manganese oxide of the one or more first oxide layers is formed from the copper-manganese alloy.
20. The method of claim 11 , wherein the one or more first oxide layers further comprise copper.