IP Library Granted Patent US 9,583,273
Granted Patent B2
US 9,583,273 · App. 14/184,057 · Granted Feb 28, 2017

Solid electrolytic capacitor and method of manufacturing a solid electrolytic capacitor

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Quick Facts
Patent No.
US 9,583,273
App. No.
14/184,057
Granted
Feb 28, 2017
Kind
B2
Abstract

Provided is a method for forming a capacitor. The method includes: providing an anode with a dielectric thereon and a conductive node in electrical contact with the anode; applying a conductive seed layer on the dielectric; forming a conductive bridge between the conductive seed layer and the conductive node; applying voltage to the anode; electrochemically polymerizing a monomer thereby forming an electrically conducting polymer of monomer on the conductive seed layer; plating a metal layer on said conductive polymer; and disrupting the conductive bridge between the conductive seed layer and the conductive node.

Claims (29)

1. A method for forming a capacitor comprising:

providing an anode;

forming a dielectric on said anode;

forming a conductive bridge between an external electrical connection and an active cathode region wherein said active cathode region is on said dielectric;

applying voltage to said external electrical connection;

electrochemically forming at least one cathode layer on said active cathode region; and

disrupting said conductive bridge between said external electrical connection and said active cathode region.

2. The method for forming a capacitor of claim 1 wherein said at least one cathode layer is a manganese dioxide layer.

3. The method for forming a capacitor of claim 1 wherein said at least one cathode layer is an intrinsically conducting polymer.

4. The method for forming a capacitor of claim 1 wherein said at least one cathode layer is a metal layer.

5. The method for forming a capacitor of claim 4 further comprising forming a carbon containing layer prior to forming said metal layer.

6. The method for forming a capacitor of claim 4 further comprising forming a carbon containing layer prior to forming said metal layer.

7. The method for forming a capacitor of claim 1 wherein said electrochemically forming at least one cathode layer comprises elecrolytically forming a metal layer on said cathode region.

8. The method for forming a capacitor of claim 7 wherein said elecrolytically forming of said metal layer comprises electroplating of metal through said conductive bridge.

9. The method for forming a capacitor of claim 8 wherein said metal layer comprises a metal selected from the group consisting of silver, nickel, copper and gold.

10. The method for forming a capacitor of claim 9 wherein said metal layer comprises a metal selected from the group consisting of silver and nickel.

11. The method for forming a capacitor of claim 1 wherein said electrochemically forming at least one cathode layer comprises elecrolytically forming a manganese dioxide layer on said cathode region.

12. The method for forming a capacitor of claim 1 wherein said active cathode region is at least partially covered by a conductive seed layer.

13. The method for forming a capacitor of claim 12 wherein said conductive seed layer comprises a material selected from manganese dioxide and a conductive polymer.

14. The method for forming a capacitor of claim 1 wherein said conductive bridge comprises a conductive seed layer.

15. The method for forming a capacitor of claim 1 further comprising:

forming an insulator on said dielectric.

16. The method for forming a capacitor of claim 15 wherein said conductive bridge extends over said insulator.

17. The method for forming a capacitor of claim 1 wherein said conductive bridge is electrically connected to a process carrier.

18. The method for forming a capacitor of claim 1 wherein said disrupting said conductive bridge comprises laser ablation.

19. The method for forming a capacitor of claim 1 wherein said conductive bridge comprises a material selected from manganese dioxide and conductive polymer.

20. The method for forming a capacitor of claim 1 wherein said disrupting said electrical conductivity comprises disrupting conductivity of said conductive bridge.

21. The method for forming a capacitor of claim 1 wherein said anode is selected from the group consisting of a valve metal and a conductive oxide of a valve metal.

22. The method for forming a capacitor of claim 21 wherein said anode is selected from the group consisting of aluminum, tantalum, niobium and NbO.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Nov 8, 2018
From: BANK OF AMERICA, N.A.
To: KEMET CORPORATION,; KEMET ELECTRONICS CORPORATION; KEMET BLUE POWDER CORPORATION
Reel/Frame 047450/0926 →
SECURITY AGREEMENT Recorded May 22, 2017
From: KEMET CORPORATION; KEMET ELECTRONICS CORPORATION; KEMET BLUE POWDER CORPORATION
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 042523/0639 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2014
From: POLTORAK, JEFFREY; SUMMEY, BRANDON; CHACKO, ANTONY P.
To: KEMET ELECTRONICS CORPORATION
Reel/Frame 032790/0230 →