IP Library Granted Patent US 9,677,940
Granted Patent B2
US 9,677,940 · App. 14/184,233 · Granted Jun 13, 2017

Apparatus for analyzing elements in liquid with controlled amount of gas supply for plasma generation

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Quick Facts
Patent No.
US 9,677,940
App. No.
14/184,233
Granted
Jun 13, 2017
Kind
B2
Abstract

An elemental analysis apparatus 101 includes a treatment vessel 108 of which at least a part is optically transparent, a first electrode 104 covered by insulator 103 , a second electrode 102 , a bubble-generating part which generates a bubble 106 , a gas-supplying apparatus 105 which supplies gas to the bubble-generating part in an amount necessary for generating the bubble 106 , a power supply 101 which applies voltage between the first electrode 104 and the second electrode 102 , and an optical detection device 110 which determines an emission spectrum of plasma that is generated by application of the voltage, and the apparatus conducts qualitatively or quantitatively analysis of a component contained in the liquid 109 based on the emission spectrum determined by the optical detection device 110.

Claims (32)

1. An elemental analysis apparatus for analyzing a liquid, comprising:

first and second electrodes adapted to at least partially be placed in the liquid, respectively;

a flow path through which a gas passes for generating a bubble in the liquid;

an insulator covering the first electrode and the flow path, the insulator having an opening from which the first electrode and the flow path are exposed;

a gas supply which supplies the gas to the flow path, an amount of the gas to be supplied being so determined to generate the bubble which is able to cover the first electrode exposed through the opening for generation of plasma in the bubble;

a power supply which supplies voltage between the first electrode and the second electrode to generate the plasma in the bubble, and

a first optical detector which detects an emission spectrum of the plasma.

2. The elemental analysis apparatus according to claim 1 , wherein

the first electrode has the opening of the flow path, and

the flow path, connected between the opening and the gas supply, runs inside the first electrode.

3. The elemental analysis apparatus according to claim 1 , wherein

the first electrode has a cylindrical shape having the opening of the flow path,

the flow path, connected between the opening and the gas supply, runs inside the first electrode, and

the insulator is in direct contact with an outer surface of the first electrode.

4. The elemental analysis apparatus according to claim 1 , further comprising a treatment vessel to be filled with the liquid, a part of the treatment vessel being optically transparent.

5. The elemental analysis apparatus according to claim 1 , wherein the gas supply includes gas sources respectively containing gases to be selectively supplied to the flow path, types of the gases being different from each other.

6. The elemental analysis apparatus according to claim 1 , wherein the first optical detector is disposed on a side opposite to a side to which the bubble grows.

7. The elemental analysis apparatus according to claim 1 , wherein the insulator is optically transparent.

8. The elemental analysis apparatus according to claim 7 , wherein the insulator comprises quartz.

9. The elemental analysis apparatus according to claim 1 , further comprising a second optical detector that monitors the bubble, wherein

the first optical detector is activated to detect the emission spectrum of the plasma, in response to a result of monitoring the bubble by the second optical detector.

10. The elemental analysis apparatus according to claim 1 , further comprising:

a second optical detector which detects an emission spectrum of the plasma, and

a third optical detector that monitors the bubble, wherein

at least one of the first and second optical detectors is activated to detect the emission spectrum of the plasma, in accordance with a result of monitoring the bubble by the third optical detector.

11. The elemental analysis apparatus according to claim 1 , wherein the power supply supplies the voltage between the first electrode and the second electrode when the bubble covers the first electrode exposed through the opening.

12. The elemental analysis apparatus according to claim 1 , wherein

the first electrode projects from the opening, and

the amount of the gas to be supplied to the flow path is so determined to generate the bubble which is able to cover the first electrode projecting from the opening.

13. The elemental analysis apparatus according to claim 1 , wherein

no portion of the first electrode projects from the opening, and

the amount of the gas to be supplied to the flow path is so determined to generate the bubble which is able to occupy the opening.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE ERRONEOUSLY FILED APPLICATION NUMBERS 13/384239, 13/498734, 14/116681 AND 14/301144 PREVIOUSLY RECORDED ON REEL 034194 FRAME 0143. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Dec 24, 2020
From: PANASONIC CORPORATION
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 056788/0362 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 10, 2014
From: PANASONIC CORPORATION
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 034194/0143 →