Semiconductor device, method of manufacturing the same, method of manufacturing display unit, and method of manufacturing electronic apparatus

1. A semiconductor device comprising:

a wiring;

a transistor including

a gate electrode;

a first insulating film covering the gate electrode and the wiring, and

a semiconductor film opposed to the gate electrode with the first insulating film in between; and

a first electrically-conductive film,

wherein a first concave section is located in the first insulating film in a position directly adjacent to a side surface the semiconductor film, and extends below a lower surface of the of the semiconductor film,

wherein a connection hole is provided in the first insulating film, the connection hole reaching the wiring, and

wherein the first electrically-conductive film is electrically connected to the wiring through the connection hole, and the first electrically-conductive film being buried in the first concave section to cover the side surface of the semiconductor film.

2. The semiconductor device according to claim 1 , further comprising a second insulating film that covers a channel region of the semiconductor film.

3. The semiconductor device according to claim 2 , wherein the second insulating film is provided outside the semiconductor film as well, and the connection hole penetrates through the second insulating film and the first insulating film.

4. The semiconductor device according to claim 3 , wherein part or all of each of side walls of the connection hole configures the same plane from the first insulating film to the second insulating film.

5. The semiconductor device according to claim 1 , wherein the connection hole is separated from the first concave section.