Methanofullerenes
The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.
1. A negative-tone photoresist composition comprising:
a. At least one methanofullerene comprising the general formula:
wherein x is at least 10, y is 1-6, n is 0-1, alkyl is a branched or unbranched, substituted or unsubstituted divalent alkyl chain of 1-16 carbon atoms having no heteroatoms substituted into the alkyl chain, aryl is a substituted or unsubstituted divalent phenyl group, divalent heteroaromatic group, or divalent fused aromatic or fused heteroaromatic group, and wherein R is a photoacid labile group comprising —C═O—OR′, wherein OR′ is t-alkoxy, cycloketal, acetal, or oxy-vinyl
b. at least one photoacid generator,
c. at least one crosslinker, and
d. at least one solvent;
wherein the crosslinker crosslinks at least with the methanofullerene when processed.
2. The photoresist composition of claim 1 , wherein the divalent alkyl chain comprises a methylene, an ethylene, a 1,2-propylene or a 1,3-propylene, and wherein the divalent alkyl chain optionally comprises fluorine atoms.
3. The photoresist composition of claim 2 , wherein the at least one photoacid generator comprises an onium salt compound, a triphenylsulfonium salt, a sulfone imide compound, a halogen-containing compound, a sulfone compound, a sulfonate ester compound, a quinone-diazide compound, a diazomethane compound, an iodonium salt, an oxime sulfonate, or a dicarboxyimidyl sulfate.
4. The photoresist composition of claim 2 , wherein the at least one crosslinker comprises an acid sensitive monomer or polymer.
5. The photoresist composition of claim 2 , further comprising at least one of a novolac, a polyhydroxystyrene, a polyacrylate, or a maleic anhydride ester-acid polymer crosslinking additive.
6. The photoresist composition of claim 2 , wherein the crosslinker comprises at least one of a glycidyl ether, glycidyl ester, glycidyl amine, a methoxymethyl group, an ethoxy methyl group, a butoxymethyl group, a benzyloxymethyl group, dimethylamino methyl group, diethylamino methyl group, a dibutoxymethyl group, a dimethylol amino methyl group, diethylol amino methyl group, a dibutylol amino methyl group, a morpholino methyl group, acetoxymethyl group, benzyloxy methyl group, formyl group, acetyl group, vinyl group or an isopropenyl group.
7. The photoresist composition of claim 2 , wherein the crosslinker comprises one or more glycidyl ether groups attached to a novolac resin.
8. The photoresist composition of claim 2 , wherein the solvent comprises esters, ethers, ether-esters, ketones, keto-esters, hydrocarbons, aromatics, and halogenated solvents.
9. The photoresist of claim 2 , further comprising at least one methanofullerene comprising the general formula:
C 2x (>C—(COO—(CH 2 CH 2 —O) a —R) 2 ) y
wherein x is at least 10, y is 1-6, a is 1-10 and wherein each R is the same or different and is H or an acid photoacid labile group and wherein the —CH 2 CH 2 —O— may be optionally substituted with fluorine atoms.
10. A method of forming a patterned resist layer on a substrate comprising the steps of:
a. providing a substrate,
b. applying the photoresist composition of claim 2 to a desired wet thickness,
c. heating the coated substrate to form a dried coating to obtain a desired thickness,
d. imagewise exposing the coated substrate to actinic radiation,
e. optionally heating the imagewise exposed coated substrate, and
f. removing the unexposed areas of the coating using an aqueous or non-aqueous developer composition to form a photoimage;
wherein the remaining coating photoimage is optionally heated.
11. The method of claim 10 , wherein the actinic radiation is ultraviolet, deep ultraviolet, extreme ultraviolet, x-ray, ion beam or electron beam.
12. The photoresist composition of claim 1 , wherein the photoacid labile group comprises a tertiary alkoxycarbonyl group.
13. A methanofullerene comprising the general formula:
wherein x is at least 10, y is 1-6, n is 0-1, alkyl is a branched or unbranched, substituted or unsubstituted divalent alkyl chain of 1-16 carbon atoms having no heteroatoms substituted into the alkyl chain, aryl is a substituted or unsubstituted divalent phenyl group, divalent heteroaromatic group, or divalent fused aromatic or fused heteroaromatic group, and wherein R is a photoacid labile group comprising —C═O—OR′, wherein OR′ is t-alkoxy, cycloketal, acetal, oxy-vinyl.
14. The methanofullerene of claim 13 , wherein the divalent alkyl chain comprises a methylene, an ethylene, a 1,2-propylene or 1,3-propylene, and wherein the divalent alkyl chain optionally comprises fluorine atoms.
15. The methanofullerene of claim 14 , wherein the photoacid labile group comprises a tertiary alkoxycarbonyl group.