Debris Removal in High Aspect Structures
A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.
1 . A system for removing debris from a surface of a photolithographic mask, comprising:
an atomic force microscope, including:
a cantilever, and
a tip supported by the cantilever, the tip including a surface and a nanometer-scaled coating disposed thereon, the nanometer-scaled coating having a surface energy lower than a surface energy of the photolithographic mask.
2 . The system of claim 1 , further comprising a pallet attached to a stage that supports the photolithographic mask, and a material disposed on the pallet, wherein the material is softer than the tip.
3 . The system of claim 1 , wherein the nanometer-scaled coating is polytetrafluoroethylene.
4 . The system of claim 1 , wherein the tip further includes at least one fibril extending therefrom.
5 . The system of claim 4 , wherein the at least one fibril consists of a plurality of fibrils.
6 . The system of claim 4 , wherein the at least one fibril is configured to coil around a particle.
7 . The system of claim 4 , wherein the at least one fibril is attached to a distal end of the tip.
8 . The system of claim 2 , wherein the tip includes a metallic material disposed between the surface and the nanometer-scaled coating.
9 . The system of claim 2 , wherein the tip includes an oxide material disposed between the surface and the nanometer-scaled coating.
10 . The system of claim 2 , wherein the tip includes a metal oxide material disposed between the surface and the nanometer-scaled coating.
11 . A system for removing debris from a surface of a substrate, comprising:
an atomic force microscope, including:
a cantilever, and
a tip supported by the cantilever, the tip including a surface and a nanometer-scaled coating disposed thereon, the nanometer-scaled coating having a surface energy lower than a surface energy of the substrate.
12 . The system of claim 11 , further comprising a patch attached to a stage that supports the substrate, and a material disposed on the patch, wherein the material is softer than the tip.
13 . The system of claim 11 , wherein the nanometer-scaled coating is polytetrafluoroethylene.
14 . The system of claim 11 , wherein the tip further includes at least one fibril extending therefrom.
15 . The system of claim 14 , wherein the at least one fibril consists of a plurality of fibrils.
16 . The system of claim 14 , wherein the at least one fibril is configured to coil around a particle.
17 . The system of claim 14 , wherein the at least one fibril is attached to a distal end of the tip.
18 . The system of claim 12 , wherein the tip includes a metallic material disposed between the surface and the nanometer-scaled coating.
19 . The system of claim 12 , wherein the tip includes an oxide material disposed between the surface and the nanometer-scaled coating.
20 . The system of claim 12 , wherein the tip includes a metal oxide material disposed between the surface and the nanometer-scaled coating.