Method of forming light-emitting diode
View Patent ↗A method of forming a light-emitting diode includes: providing a substrate having one or more first openings passing through the substrate; forming a sacrificial layer on the substrate; forming an epitaxial layer on the sacrificial layer; connecting a supporting substrate with the epitaxial layer; and separating the substrate from the epitaxial layer by selectively etching the sacrificial layer.
1. A method of forming light-emitting diode comprising steps of:
providing a substrate having one or more first openings passing entirely through the substrate;
forming a sacrificial layer on the substrate having the one or more first openings;
forming an epitaxial layer on the sacrificial layer;
connecting a supporting substrate with the epitaxial layer; and
separating the substrate from the epitaxial layer by selectively etching the sacrificial layer.
2. The method of claim 1 , wherein the step of forming the sacrificial layer comprises: forming one or more second openings that are passing through the sacrificial layer.
3. The method of claim 2 ,
wherein one or more third openings pass through the epitaxial layer,
and
wherein at least one third opening is connected with at least one second opening.
4. The method of claim 3 , wherein at least one third opening is connected with at least one first opening through at least one second opening.
5. The method of claim 2 , wherein at least one second opening is connected with at least one first opening.
6. The method of claim 2 , wherein the sacrificial layer surrounds the second opening.
7. The method of claim 2 , wherein the one or more second openings are discretely distributed within the sacrificial layer.
8. The method of claim 1 ,
wherein one or more third openings pass through the epitaxial layer.
9. The method of claim 8 , wherein the one or more third openings are discretely distributed within the epitaxial layer.
10. The method of claim 8 , wherein the third openings are formed in a matrix configuration.
11. The method of claim 8 , wherein the third openings are formed in a random configuration.
12. The method of claim 1 , wherein the step of selectively etching the sacrificial layer comprises: providing an etchant to etch the sacrificial layer through the one or more first openings and the one or more second openings.
13. The method of claim 12 , wherein an etching rate of the etchant to the sacrificial layer is higher than that to the epitaxial layer.
14. The method of claim 1 , wherein the growth substrate surrounds the one or more first openings.
15. The method of claim 1 , wherein the one or more first openings are discretely distributed within the growth substrate.
16. The method of claim 1 , wherein the growth substrate comprises a material selected from the group consisting of nitrogen, aluminum, gallium, arsenic, zinc, silicon, and oxygen.
17. The method of claim 1 , wherein the sacrificial layer comprises a material selected from the group consisting of aluminum and arsenic.
18. The method of claim 1 , wherein the supporting substrate comprises a material selected from the group consisting of glass, metal, semiconductor, plastics, and ceramics.
19. The method of claim 1 , wherein the sacrificial layer has a thickness of between 3000 Å and 5000 Å.