High Haze Underlayer For Solar Cell
A solar cell has a substrate and an undercoating formed over at least a portion of the substrate. The undercoating includes a continuous first layer of tin oxide and a second layer having oxides of Sn, P, and Si. A transparent conductive coating is formed over at least a portion of the undercoating. The second layer includes protrusions on an upper surface that cause uneven crystal growth of the conductive coating.
1 . A solar cell, comprising:
a substrate;
an undercoating formed over at least a portion of the substrate, the undercoating comprising:
a continuous first layer comprising tin oxide; and
a second layer comprising oxides of Sn, P, and Si; and
a transparent conductive coating formed over at least a portion of the undercoating, wherein the second layer includes protrusions on an upper surface that cause uneven crystal growth of the conductive coating.
2 . The solar cell of claim 1 , wherein the substrate is glass.
3 . The solar cell of claim 1 , wherein the first layer consists of a continuous layer of undoped tin oxide.
4 . The solar cell of claim 1 , wherein the first layer has a thickness in the range of 10 nm to 25 nm.
5 . The solar cell of claim 1 , wherein the second layer comprises 50 to 60 atomic percent silicon, 12 to 16 atomic percent tin, and 25 to 30 atomic percent phosphorous.
6 . The solar cell of claim 1 , wherein the second layer has a thickness less than 40 nm.
7 . The solar cell of claim 1 , wherein the transparent conductive coating comprises fluorine doped tin oxide.
8 . The solar cell of claim 1 , wherein the substrate is glass, the first layer comprises a continuous layer of undoped tin oxide having a thickness in the range of 10 nm to 25 nm, the second layer comprises a mixture of silica, tin oxide, and phosphorous oxide having a thickness less than or equal to 37 nm, and wherein the second layer includes less than or equal to 20 weight percent tin oxide.
9 . The solar cell of claim 1 , wherein the transparent conductive coating has a thickness in the range of 500 nm to 700 nm.
10 . The solar cell of claim 1 , wherein the transparent conductive coating has a sheet resistance of less than 10Ω/□.
11 . The solar cell of claim 1 , wherein the transparent conductive coating has a surface roughness in the range of 10 nm to 15 nm.
12 . The solar cell of claim 1 , wherein the underlayer has a surface roughness less than the surface roughness of the transparent conductive coating.
13 . The solar cell of claim 3 , wherein the first layer has a thickness in the range of 10 nm to 25 nm.
14 . The solar cell of claim 13 , wherein the second layer comprises 50 to 60 atomic percent silicon, 12 to 16 atomic percent tin, and 25 to 30 atomic percent phosphorous.
15 . The solar cell of claim 14 , wherein the second layer has a thickness less than 40 nm.
16 . The solar cell of claim 15 , wherein the transparent conductive coating comprises fluorine doped tin oxide.
17 . The solar cell of claim 3 , wherein the substrate is glass, the first layer comprises a continuous layer of undoped tin oxide having a thickness in the range of 10 nm to 25 nm, the second layer comprises a mixture of silica, tin oxide, and phosphorous oxide having a thickness less than or equal to 37 nm, and wherein the second layer includes less than or equal to 20 weight percent tin oxide.
18 . The solar cell of claim 16 , wherein the transparent conductive coating has a thickness in the range of 500 nm to 700 nm and a sheet resistance of less than 10Ω/□.
19 . The solar cell of claim 18 , wherein the underlayer has a surface roughness less than the surface roughness of the transparent conductive coating.
20 . A coated article, comprising:
a glass substrate;
an undercoating formed over at least a portion of the substrate, the undercoating comprising:
a continuous first layer consisting of undoped tin oxide having a thickness in the range of 10 nm to 25 nm; and
a second layer comprising oxides of Sn, P, and Si, wherein the second layer comprises 50 to 60 atomic percent silicon, 12 to 16 atomic percent tin, and 25 to 30 atomic percent phosphorous; and
a transparent conductive coating comprising fluorine doped tin oxide formed over at least a portion of the undercoating, wherein the second layer includes protrusions on an upper surface that cause uneven crystal growth of the conductive coating.